Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility
US-2017200601-A1 · Jul 13, 2017 · US
Sulfoxide/glycol ether based solvents for use in the electronics industry
US10731114B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10731114-B2 |
| Application number | US-201715544310-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 20, 2017 |
| Priority date | Sep 28, 2016 |
| Publication date | Aug 4, 2020 |
| Grant date | Aug 4, 2020 |
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- Title
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Abstract
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Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N,N-dimethyl propionamide, 3-methoxy-N,N-dimethyl propanamide, triethyl phosphate, N,N-dimethyl acetamide; N,N-diethyl acetamide, N,N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.
First claim
Opening claim text (preview).
What is claimed is: 1. A solvent consisting essentially of: (A) from 50 to 90 wt% of a first component consisting of a sulfoxide; (B) from 9 to 40 wt% of a second component consisting of a glycol ether; and (C) from 1 to 30 wt% of 3-methoxy-N,N-dimethyl propanamide, wherein wt % is based on the weight of the solvent. 2. The solvent of claim 1 wherein the sulfoxide is DMSO. 3. The solvent of claim 1 wherein the glycol ether is ethylene glycol monobutyl ether. 4. The solvent of claim 1 wherein the first component is DMSO and the second component is ethylene glycol monobutyl ether.
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Classifications
containing phosphorus · CPC title
Ethers · CPC title
containing oxygen · CPC title
containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides · CPC title
Heterocyclic compounds containing nitrogen in the ring · CPC title
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- What does patent US10731114B2 cover?
- Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of …
- Who is the assignee on this patent?
- Dow Global Technologies Llc
- What technology area does this patent fall under?
- Primary CPC classification C11D7/5009. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 04 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).