Concave cavity for integrated microfabricated sensor

Patent metadata

Field	Value
Publication number	US-10712401-B2
Application number	US-201715457669-A
Country	US
Kind code	B2
Filing date	Mar 13, 2017
Priority date	Mar 13, 2017
Publication date	Jul 14, 2020
Grant date	Jul 14, 2020

Abstract

An integrated microfabricated sensor includes a sensor cell having a cell body, a first window attached to the cell body, and a second window attached to the cell body. The cell body laterally surrounds a cavity, so that both windows are exposed to the cavity. The sensor cell contains a sensor fluid material in the cavity. The cavity has concave profiles at cell body walls, so that the cavity is wider in a central region, approximately midway between the first window and the second window, than at the first surface and at the second surface. The cell body walls of the cell body have acute interior angles at both windows. The cell body is formed using an etch process that removes material from the cell body concurrently at the first surface and the second surface, forming the acute interior angles at both the first surface and the second surface.

First claim

What is claimed is:

1. A method, comprising:
providing a cell body substrate having a first surface, and a second surface parallel to the first surface;
forming a first etch mask on the first surface of the cell body substrate, wherein the first etch mask exposes a first area on the first surface; and
forming a second etch mask on the second surface of the cell body substrate, wherein the second etch mask exposes a second area on the second surface;
removing material from the cell body substrate to form a cavity extending through the cell body substrate from the first area to the second area, wherein:
the cavity has cell body walls extending between the first surface and the second surface; and
the cell body walls have a concave profile defining the cavity, so that the cavity is wider in a central region than at the first surface and at the second surface;

attaching a first window substrate to the cell body substrate at the first surface, the first window substrate being exposed to the cavity;
disposing a solution comprising a sensor fluid material and a solvent into the cavity on the first window substrate;
removing substantially all of the solvent; and
attaching a second window substrate to the cell body substrate at the second surface, the second window substrate being exposed to the cavity,
wherein removing the material from the cell body substrate comprises a wet etch process which concurrently removes the material from the cell body substrate in the first area exposed by the first mask and removes the material from the cell body substrate in the second area exposed by the second mask; and
wherein the first etch mask comprises a first layer of silicon dioxide formed on the first surface of the cell body substrate, and further comprises a first layer of silicon nitride formed on the first layer of silicon dioxide, and the second etch mask comprises a second layer of silicon dioxide formed on the second surface of the cell body substrate, and further comprises a second layer of silicon nitride formed on the second layer of silicon dioxide, wherein the first layer of silicon dioxide and the second layer of silicon dioxide are formed concurrently, and the first layer of silicon nitride and the second layer of silicon nitride are formed concurrently.

2. The method of claim 1 , wherein:
the cell body substrate comprises primarily crystalline silicon;
the cell body walls have a first interior angle, extending from the cavity through the cell body walls to the first surface, the first interior angle being acute around a perimeter of the cavity at the first surface; and
the cell body walls have a second interior angle, extending from the cavity through the cell body walls to the second surface, the second interior angle being acute around a perimeter of the cavity at the second surface.

3. The method of claim 1 , further comprising:
forming a first etch mask on the first surface of the cell body substrate, wherein the first etch mask exposes an area on the first surface for the cavity; and
forming a second etch mask on the second surface of the cell body substrate, wherein the second etch mask covers the second surface;
wherein removing the material from the cell body substrate comprises:
performing a deep reactive ion etch (DRIE) process which removes the material in an anisotropic manner in the area exposed by the first etch mask; and
performing a wet etch process which removes the material to form the cavity, the wet etch being performed after the DRIE process.

4. The method of claim 3 , wherein the first etch mask comprises hard mask material selected from the group consisting of silicon carbide and amorphous carbon.

5. The method of claim 1 , wherein removing the material from the cell body substrate comprises a wet etch process with an aqueous alkaline solution.

6. The method of claim 1 , wherein the sensor fluid material comprises an alkali metal salt and the solvent comprises a fluid selected from the group consisting of water and alcohol.

7. The method of claim 6 , wherein the alkali metal salt comprises cesium azide.

8. The method of claim 1 , wherein:
the first window substrate comprises a first glass layer;
attaching the first window substrate to the cell body substrate comprises a first anodic bonding process;
the second window substrate comprises a second glass layer; and
attaching the second window substrate to the cell body substrate comprises a second anodic bonding process.

9. A method, comprising:
removing material from a cell body substrate to form a cavity extending through the cell body substrate from a first surface to a second opposite surface, the cell body substrate having a first opening at the first surface, a second opening at the second surface, and walls extending between the first opening and the second opening, wherein the openings have a same first width, and the cavity between the first and second surfaces has a second width greater than the first width, and wherein the first opening is aligned with the second opening;
attaching a first window substrate to the cell body substrate at the first surface;
disposing a sensor material into the cavity; and
attaching a second window substrate to the cell body substrate at the second surface, enclosing the sensor material within the cavity.

10. The method of claim 9 , wherein the first opening is formed using a first etch mask comprising a first dielectric material, and the second opening is formed using a second etch mask comprising the first dielectric material.

11. The method of claim 10 , wherein the first etch mask is formed concurrently with the second etch mask.

12. The method of claim 10 , wherein the first etch mask and second etch mask each comprise silicon dioxide layer in contact with the cell body substrate and a silicon nitride layer in contact with the silicon dioxide layer.

13. The method of claim 9 , wherein the sensor material comprises an alkali metal.

14. The method of claim 9 , wherein the sensor material comprises cesium.

15. A method, comprising:
providing a cell body substrate having a first surface and a second surface opposite the first surface;
forming a first etch mask on the first surface of the cell body substrate, wherein the first etch mask exposes a first area having a first perimeter on the first surface;
forming a second etch mask on the second surface of the cell body substrate concurrently with forming the first etch mask, wherein the second etch mask exposes a second area having a second perimeter on the second surface, the first and second areas having a same size and shape and the first area being aligned with the second area;
removing material from the cell body substrate such that a cavity between the first and second surfaces has an interior perimeter that is larger than the first and second perimeters;
attaching a first window substrate to the cell body substrate at the first surface, the first window substrate being exposed to the cavity;
disposing a sensor material within the cavity; and
attaching a second window substrate to the cell body substrate at the second surface, the second window substrate being exposed to the cavity.

16. The method of claim 15 , further comprising removing the first and second etch masks before attaching the first and second windows.

17. A method, comprising:
providing a cell body substrate having a first surface, and a second surface parallel to the first surface;
forming a first etch mask on the first surface of the cell body substrate, the first etch mask comprises a first layer of

Assignees

• Texas Instruments Inc

Inventors

• Gabrys Ann
• Brockie Nathan
• Dyer Terry
• Parsa Roozbeh
• French William

Classifications

• G01R33/032 Primary

  using magneto-optic devices, e.g. Faraday {or Cotton-Mouton effect} · CPC title

• G04F5/14

  using atomic clocks · CPC title