Magnetic field measuring apparatus

US2016169989A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016169989-A1
Application numberUS-201314904460-A
CountryUS
Kind codeA1
Filing dateAug 8, 2013
Priority dateAug 8, 2013
Publication dateJun 16, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An object of the present invention is to provide a technique to improve a manufacturing yield of a gas cell included in a magnetic field measuring apparatus. A gas cell GC according to an embodiment is characterized in that, for example, a cavity CAV includes an opening OP 1 and an opening OP 2 , a plane size of the opening OP 1 becomes larger than a plane size of the opening OP 2 in the openings OP 1 and OP 2 included in the cavity CAV. Especially, according to the embodiment, the opening OP 2 is included in the opening OP 1 in plan view. Consequently, a width of the opening OP 1 coming into contact with an upper surface of the sealing substrate 1 S becomes larger than a width of the opening OP 2 coming into contact with a lower surface of the sealing substrate 2 S.

First claim

Opening claim text (preview).

1 . A magnetic field measuring apparatus, comprising a gas cell including a first cavity filled with a gas, wherein the gas cell comprises: (a) a first sealing substrate; (b) a second sealing substrate; (c) a substrate member sandwiched between the first sealing substrate and the second sealing substrate; and (d) the first cavity penetrating the substrate member, the first cavity comprises: (e 1 ) a first opening coming into contact with an upper surface of the first sealing substrate; and (e 2 ) a second opening coming into contact with a lower surface of the second sealing substrate, the first cavity is formed by which the first opening and the second opening are communicated, and a plane size of the first opening is larger than a plane size of the second opening. 2 . The magnetic field measuring apparatus according to claim 1 , wherein the second opening is included in the first opening in plan view. 3 . The magnetic field measuring apparatus according to claim 1 , wherein a first side surface of the first cavity comprises a first opening side surface of the first opening and a second opening side surface of the second opening, and a second side surface opposing to the first side surface of the first cavity comprises a first opposing side surface opposing to the first opening side surface of the first opening and a second opposing side surface opposing to the second opening side surface of the second opening. 4 . The magnetic field measuring apparatus according to claim 3 , wherein a virtual side surface provided by extending the second opening side surface on the upper surface side of the first sealing substrate is positioned closer to the first opposing side surface than the first opening side surface. 5 . The magnetic field measuring apparatus according to claim 1 , wherein the gas is an alkali metal gas. 6 . The magnetic field measuring apparatus according to claim 1 , wherein a gas production material configured to produce the gas exists on the upper surface of the first sealing substrate in the first cavity. 7 . The magnetic field measuring apparatus according to claim 6 , wherein the gas production material exists in a solid or liquid state. 8 . The magnetic field measuring apparatus according to claim 1 , wherein the first sealing substrate and the second sealing substrate are translucent to a light emitted to the gas cell. 9 . The magnetic field measuring apparatus according to claim 1 , wherein a depth of the first opening is equal to or less than 1 mm. 10 . The magnetic field measuring apparatus according to claim 1 , wherein the substrate member comprises: (f 1 ) a first substrate member; and (f 2 ) a second substrate member disposed on the first substrate member, the first opening is formed so as to penetrate the first substrate member, and the second opening is formed so as to penetrate the second substrate member. 11 . The magnetic field measuring apparatus according to claim 1 , wherein a recessed portion is formed on the upper surface of the first sealing substrate, the second opening is formed so as to penetrate the substrate member, and the first opening is formed by the recessed portion. 12 . The magnetic field measuring apparatus according to claim 11 , wherein a depth of the recessed portion is equal to or less than 1 mm. 13 . The magnetic field measuring apparatus according to claim 1 , wherein the gas cell is further a second cavity filled with the gas and comprises the second cavity formed so as to penetrate the substrate member and communicate with the first cavity, and a gas production material for producing the gas is provided on the upper surface of the first sealing substrate in the first cavity, and, on the other hand, the gas production material is not provided on the upper surface of the first sealing substrate in the second cavity. 14 . The magnetic field measuring apparatus according to claim 13 , wherein the second cavity is irradiated with a light. 15 . The magnetic field measuring apparatus according to claim 1 , further comprising: (g) a light source configured to irradiate the gas cell with a light; (h) a magnetic field production unit configured to apply a static magnetic field and an alternating magnetic field to the gas cell; and (i) a light detector configured to detect the light which has passed through the gas cell.

Assignees

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Classifications

  • G01R33/26Primary

    using optical pumping · CPC title

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What does patent US2016169989A1 cover?
An object of the present invention is to provide a technique to improve a manufacturing yield of a gas cell included in a magnetic field measuring apparatus. A gas cell GC according to an embodiment is characterized in that, for example, a cavity CAV includes an opening OP 1 and an opening OP 2 , a plane size of the opening OP 1 becomes larger than a plane size of the opening OP 2 in the ope…
Who is the assignee on this patent?
Hitachi Ltd
What technology area does this patent fall under?
Primary CPC classification G01R33/26. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jun 16 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).