Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement

Patent metadata

Field	Value
Publication number	US-10684466-B2
Application number	US-201815872974-A
Country	US
Kind code	B2
Filing date	Jan 16, 2018
Priority date	Jul 15, 2015
Publication date	Jun 16, 2020
Grant date	Jun 16, 2020

Abstract

Mirror elements (2a, 2b) include a substrate (4a, 4b) and a multilayer arrangement (5a, 5b). The multilayer arrangement includes a reflective layer system (6a, 6b) having a radiation entrance surface (7a, 7b) and a piezoelectric layer (8a, 8b) arranged between the radiation entrance surface and the substrate. Each mirror element includes an electrode arrangement (9a, 9b, 9c) associated with the piezoelectric layer. A layer thickness (tp) of the piezoelectric layer is controlled by the electric field generated. An interconnection arrangement (10) electrically interconnects adjacent electrodes of adjacent electrode arrangements. According to one formulation, the interconnection arrangement generates an electric field in a gap region (11) between the adjacent electrodes. According to another, an electric resistance (Ri) of the interconnection arrangement in the gap region is greater than an electric resistance (Rw) of the adjacent electrodes and less than an electric resistance (Rl) of the piezoelectric layers of adjacent electrode arrangements.

First claim

What is claimed is:

1. A mirror arrangement for a lithography exposure apparatus comprising:
a plurality of mirror elements adjacently arranged and jointly forming a mirror surface of the mirror arrangement,
wherein each of the mirror elements comprises a respective substrate and a respective multilayer arrangement on the respective substrate,
wherein the respective multilayer arrangements include respective reflective layer systems having respective radiation entrance surfaces forming respective portions of the mirror surface and respective piezoelectric layers are arranged between the radiation entrance surfaces and the respective substrates,
wherein each of the mirror elements comprises a respective electrode arrangement associated with the respective piezoelectric layers configured to generate an electric field, wherein layer thicknesses of the piezoelectric layers are controlled by the electric field,
wherein an interconnection arrangement electrically interconnects adjacent first and second electrodes of adjacent electrode arrangements, such that an interconnection electric field is generated in a gap region between the first and second electrodes,

wherein an electric resistance of the interconnection arrangement in the gap region between the first and second electrodes is greater than an electric resistance of the first and second electrodes and less than an electric resistance of the piezoelectric layers of the adjacent electrode arrangements with the first and second electrodes, and
wherein the interconnection electric field generates a continuous transition between a first electric field at the first electrode and a second electric field at the second electrode.

2. The mirror arrangement according to claim 1 , wherein the interconnection arrangement comprises a common interconnection layer interconnecting multiple ones or all of the mirror elements.

3. The mirror arrangement according to claim 1 , wherein the piezoelectric layers of multiple ones or all of the mirror elements form a common piezoelectric layer.

4. The mirror arrangement according to claim 1 , wherein the reflective layer systems of multiple ones or all of the mirror elements form a common reflective layer system.

5. The mirror arrangement according to claim 1 , wherein the reflective layer system is configured to reflect electromagnetic radiation in a wavelength range below 300 nanometers.

6. The mirror arrangement according to claim 1 , wherein the reflective layer system comprises a plurality of layer pairs having alternating layers of a high refractive index layer material and a low refractive index layer material.

7. The mirror arrangement according to claim 1 , wherein a thickness of a given interconnection layer of the interconnection arrangement is in a range from 50 nanometers to 500 nanometers.

8. The mirror arrangement according to claim 1 , wherein a maximum electrode diameter of the first and second electrodes is in a range from 0.5 to 50 millimeters.

9. The mirror arrangement according to claim 1 , wherein a width of the gap region between the first and second electrodes is in a range from 10 μm to 1 millimeters.

10. The mirror arrangement according to claim 1 , wherein a number of the mirror elements over a diameter of a used area of the mirror arrangement is in a range from 20 to 200.

11. An optical system comprising at least one mirror arrangement according to claim 1 .

12. The optical system according to claim 11 , configured as a projection objective of a lithography exposure apparatus.

13. The mirror arrangement according to claim 1 , wherein the respective substrates of multiple ones or all of the mirror elements form a common substrate.

14. A mirror arrangement for a lithography exposure system comprising:
a plurality of mirror elements adjacently arranged and jointly forming a mirror surface of the mirror arrangement,
wherein each of the mirror elements comprises a respective substrate and a respective multilayer arrangement on the respective substrate,
wherein the respective multilayer arrangements include respective reflective layer systems having respective radiation entrance surfaces forming respective portions of the mirror surface and respective piezoelectric layers are arranged between the radiation entrance surfaces and the respective substrates,
wherein each of the mirror elements comprises a respective electrode arrangement associated with the respective piezoelectric layers configured to generate an electric field, wherein layer thicknesses of the piezoelectric layers are controlled by the electric field,
wherein an interconnection arrangement electrically interconnects adjacent first and second electrodes of adjacent electrode arrangements, and
wherein an electric resistance of the interconnection arrangement in a gap region between the first and second electrodes is greater than an electric resistance of the first and second electrodes and less than an electric resistance of the piezoelectric layers of the adjacent electrode arrangements with the first and second electrodes.

15. The mirror arrangement according to claim 14 , wherein the electric resistance of the interconnection arrangement in the gap region between the first and second electrodes is in a range from 1 kiloohm to 10 megaohm.

16. The mirror arrangement according to claim 14 , wherein the interconnection arrangement comprises a semiconductor material.

17. The mirror arrangement according to claim 14 , wherein the electric resistance of the first and second electrodes is less than or equal to 1 kiloohm.

18. The mirror arrangement according to claim 14 , wherein the electric resistance of the piezoelectric layers of the adjacent electrode arrangements with the first and second electrodes is greater than or equal to 10 megaohm.

19. An optical system comprising at least one mirror arrangement according to claim 14 .

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Hakvoort Wouter Bernardus Johannes
• Hogervorst Richard Petrus
• Rutgers Petrus Theodorus
• Hild Kerstin
• Gruner Toralf

Classifications

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70316 Primary

  Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements · CPC title

• G03F7/70175 Primary

  Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source · CPC title

• G21K1/062

  Devices having a multilayer structure · CPC title

• G03F7/702 Primary

  Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems · CPC title