Method for correcting solder bump

US10681822B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10681822-B2
Application numberUS-201616062853-A
CountryUS
Kind codeB2
Filing dateDec 15, 2016
Priority dateDec 15, 2015
Publication dateJun 9, 2020
Grant dateJun 9, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A pattern formed on a silicon wafer is fine so that solder bumps formed on the silicon wafer are also fine and hence, when a failure occurs, the failure cannot be corrected so that an entire silicon wafer as a workpiece is discarded. Provided is a correction method where, on solder bumps formed on the silicon wafer, a mask in which holes are formed with the same pattern as the solder bumps is placed so as to cover the solder bumps and, thereafter, molten solder is caused to come into contact with the solder bumps through the mask thus filling hole portions of the mask with the molten solder.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for correcting a solder bump formed on a workpiece, the method comprising: placing a mask having a same pattern as the solder bump so as to cover the workpiece which has a defective portion having a defect of the solder bump and/or an insufficient amount of solder; heating a fluid for forming the solder bump by a first heater; and discharging the fluid for forming the solder bump from a correction head configured to discharge the fluid, which has been heated by the first heater, while the correction head is caused to scan on the mask so as to discharge the fluid into a portion of the mask which corresponds to the defective portion, and heating the fluid discharged into the mask by a second heater installed at a lower portion of the correction head. 2. The method according to claim 1 , further comprising, sucking the fluid, which has been discharged into the mask and heated by the second heater, from the mask. 3. The method according to claim 1 , further comprising, reducing a pressure of air in an opening portion of the mask before discharging the fluid for forming the solder bump. 4. A method for correcting a solder bump formed on a workpiece, the method comprising: placing a mask having a same pattern as the solder bump so as to cover the workpiece which has a defective portion having a defect of the solder bump and/or an insufficient amount of solder; heating a fluid for forming the solder bump by a first heater; discharging the fluid for forming the solder bump from a correction head configured to discharge the fluid, which has been heated by the first heater, while the correction head is caused to scan on the mask so as to discharge the fluid into a portion of the mask which corresponds to the defective portion; and reducing a pressure of air in an opening portion of the mask before discharging the fluid for forming the solder bump.

Assignees

Inventors

Classifications

  • Electricity · mapped topic

  • Electricity · mapped topic

  • Filling or covering plated through-holes or blind plated vias, e.g. for masking or for mechanical reinforcement · CPC title

  • Electricity · mapped topic

  • for shaped solder piece feeding, e.g. preforms, bumps, balls, pellets, droplets · CPC title

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What does patent US10681822B2 cover?
A pattern formed on a silicon wafer is fine so that solder bumps formed on the silicon wafer are also fine and hence, when a failure occurs, the failure cannot be corrected so that an entire silicon wafer as a workpiece is discarded. Provided is a correction method where, on solder bumps formed on the silicon wafer, a mask in which holes are formed with the same pattern as the solder bumps is p…
Who is the assignee on this patent?
Senju Metal Industry Co
What technology area does this patent fall under?
Primary CPC classification H05K3/3468. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 09 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).