Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-10656538-B2
Application number	US-201816195163-A
Country	US
Kind code	B2
Filing date	Nov 19, 2018
Priority date	Jul 16, 2003
Publication date	May 19, 2020
Grant date	May 19, 2020

Abstract

An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

First claim

The invention claimed is:

1. An adjustment system for a lithographic apparatus, the lithographic apparatus comprising a movable table, a projection system configured to project a radiation beam onto a target portion of a radiation-sensitive substrate, and a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a temperature controlled liquid, the adjustment system comprising:
instructions in a non-transitory computer-readable medium, the instructions configured, upon execution by a computer system, to cause the computer system to at least:
obtain temperature information for the substrate, the table, an optical element of the projection system, or any combination selected therefrom; and
cause adjustment of an exposeure parameter in response to a temperature-induced distortion of the substrate, the table, the optical element of the projection system, or the combination selected therefrom, caused at least in part by the liquid and determined based on the temperature information, or a parameter derived from the temperature information.

2. The system according to claim 1 , wherein the instructions are further configured to process calibration data, the calibration data representing adjustments to be applied to the exposure parameter in response to the determined or expected temperature-induced distortion.

3. The system according to claim 1 , wherein the instructions are further configured to cause introduction of an optical distortion in the projection system to compensate for the temperature-induced distortion.

4. The system according to claim 1 , wherein the instructions are further configured to adjust the exposure parameter in response to a distortion in a pattern generated on the substrate caused by a difference in temperature of an optical element of the projection system, of the substrate, of the liquid, or of a combination selected therefrom, from a respective target temperature.

5. The system according to claim 1 , wherein the instructions are further configured to cause a change in the temperature or flow rate of the liquid based on the temperature information of the substrate, the table, the optical element of the projection system, or the combination selected therefrom.

6. A non-transitory computer-readable medium comprising instructions therein, the instructions configured, upon execution by a computer system, to cause the computer system to at least:
obtain temperature information measured by a temperature sensor system provided with a movable table of a lithographic apparatus, wherein the temperature information is obtained at a plurality of locations and the lithographic apparatus comprises a projection system configured to project a radiation beam onto a target portion of a radiation-sensitive substrate, and a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid; and
cause adjustment, based on the temperature information at the plurality of locations or a parameter derived from the temperature information at the plurality of locations, of an exposure parameter.

7. The computer-readable medium according to claim 6 , wherein the instructions are further configured to cause introduction of an optical distortion in the projection system via an adjustable element to adjust the exposure parameter.

8. The computer-readable medium according to claim 6 , wherein the instructions are further configured to adjust the exposure parameter in response to a distortion in a pattern generated on the substrate caused by a difference in temperature of an optical element of the projection system, of the substrate, of the liquid, or of a combination selected therefrom, from a respective target temperature.

9. The computer-readable medium according to claim 6 , wherein the instructions are further configured to cause a change in the temperature or flow rate of the liquid based on the temperature information.

10. The computer-readable medium according to claim 6 , wherein the instructions are further configured to process calibration data, the calibration data representing adjustments to be applied to the exposure parameter in response to the temperature information or a parameter derived from the temperature information.

11. The computer-readable medium according to claim 6 , wherein the instructions are configured to enable real-time adjustment of the exposure parameter during operation of the lithographic apparatus.

12. A non-transitory computer-readable medium comprising instructions therein, the instructions configured, upon execution by a computer system, to cause the computer system to at least:
obtain temperature information, or a parameter derived from the temperature information, for a liquid in a lithographic apparatus or for a component in the lithographic apparatus that is arranged to come in contact with the liquid, the lithographic apparatus comprising a projection system configured to project a radiation beam onto a target portion of a radiation-sensitive substrate, and a liquid supply system configured to at least partly fill a space between the projection system and the substrate with the liquid; and
cause adjustment, based on the temperature information or the parameter derived from the temperature information, of a characteristic of a movable object in a path of the radiation beam.

13. The computer-readable medium according to claim 12 , wherein the projection system further comprises an adjustable optical element as the movable object and the instructions are further configured to control a characteristic of the adjustable optical element to change an imaging property of the radiation beam.

14. The computer-readable medium according to claim 12 , wherein the instructions are further configured to change the temperature or flow rate of the liquid based on the temperature information.

15. The computer-readable medium according to claim 12 , wherein the instructions are further configured to adjust the characteristic of the movable object in response to a distortion in a pattern generated on the substrate caused by a difference in temperature of an optical element of the projection system, of the substrate, of the liquid, or of a combination selected therefrom, from a respective target temperature.

16. The computer-readable medium according to claim 12 , wherein the instructions are further configured to process calibration data, the calibration data representing adjustments to be applied to the characteristic of the movable object in response to the temperature information or a parameter derived from the temperature information.

17. The computer-readable medium according to claim 12 , wherein the instructions are configured to obtain temperature information, or a parameter derived from the temperature information, for a component in the lithographic apparatus that is arranged to come in contact with the liquid and the component is the substrate, the table, an optical element of the projection system, or any combination selected therefrom.

18. The system according to claim 1 , wherein the instructions are further configured to cause a control signal to be provided to an electrical heater of the lithographic apparatus on the basis of a temperature sensed by a sensor of the lithographic apparatus.

19. The system according to claim 1 , wherein the instructions are further configured to control the exposure parameter by causing an adjustable optical element of the projection system to change an imaging property o

Assignees

• Asml Netherlands Bv

Inventors

• Streefkerk Bob
• Derksen Antonius Theodorus Anna Maria
• Lof Joeri
• Simon Klaus
• Straaijer Alexander

Classifications

• G03F7/70341

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/70716

  Stages · CPC title

• G03F7/70875 Primary

  Temperature, e.g. temperature control of masks or workpieces via control of stage temperature · CPC title

• G03F7/70891

  Temperature · CPC title

• G03F7/70258

  Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system · CPC title