Resin blend for melting process

US10655003B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10655003-B2
Application numberUS-201113879504-A
CountryUS
Kind codeB2
Filing dateOct 14, 2011
Priority dateOct 14, 2010
Publication dateMay 19, 2020
Grant dateMay 19, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a resin blend for a melting process, to a method for manufacturing a resin molding using same, and to a resin molding obtained thereby, the resin blend comprising a first resin and a second resin, wherein the second resin includes a polymer resin having at least one organic functional group selected from the group consisting of an alkyl group having 2 to 20 carbon atoms, an alicyclic ring having 5 to 40 carbon atoms and an aromatic ring having 6 to 40 carbon atoms, and has, with the first resin, a melt viscosity difference of 0.1 to 3,000 Pa*s at a shear rate of 100 to 1,000 s −1 and a processing temperature of the resin mixture, and a glass transition temperature (T g ) difference of 10° C. to 150° C.

First claim

Opening claim text (preview).

What is claimed is: 1. A resin blend for a melting process comprising a first resin and a second resin, wherein the first resin comprises an acrylate-based resin, wherein the second resin comprises a (meth)acrylate-based resin to which at least one organic functional group selected from the group consisting of tertiary butyl group, isobornyl group, cyclohexyl group, and phenyl group is introduced, and has a melt viscosity difference of 0.1 to 3,000 Pa*s at a shear rate of 100 to 1,000 s −1 at a processing temperature of the resin blend and a glass transition temperature (T g ) difference of 10° C. to 100° C. with respect to the first resin, wherein the resin blend forms a layer-separated structure in which the second resin forms on a surface of the first resin in the layer-separated structure during melt processing under shear stress, wherein the resin blend has an impact resistance of 6.7 to 8.8 kg*cm/cm in an IZOD ⅛″ test and of 6.5 to 9.1 kg*cm/cm in an IZOD ¼″ test measured according to ASTM D256, and wherein the resin blend has a pencil hardness of 2H to 3H measured according to ASTM 3363-74. 2. The resin blend of claim 1 , wherein the melt viscosity difference between the first resin and the second resin at the shear rate of 100 to 1,000 s −1 at the processing temperature of the resin blend is in a range of 0.1 to 2,000 Pa*s. 3. The resin blend of claim 1 , wherein the second resin is a (meth)acrylate-based resin having a tertiary butyl group functional group. 4. The resin blend of claim 1 , wherein the second resin is a (meth)acrylate-based resin having an isobornyl functional group. 5. The resin blend of claim 1 , wherein the second resin is a (meth)acrylate-based resin having a cyclohexyl functional group. 6. The resin blend of claim 1 , wherein the second resin is a (meth)acrylate-based resin having a phenyl functional group.

Assignees

Inventors

Classifications

  • including synthetic resin or polymer · CPC title

  • comprising polyolefins {(comprising vinyl (co)polymers or acrylic (co)polymers B32B27/30)} · CPC title

  • of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen · CPC title

  • C08L33/20Primary

    Homopolymers or copolymers of acrylonitrile (C08L55/02 takes precedence) · CPC title

  • Physical, chemical or physicochemical properties · CPC title

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Frequently asked questions

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What does patent US10655003B2 cover?
The present invention relates to a resin blend for a melting process, to a method for manufacturing a resin molding using same, and to a resin molding obtained thereby, the resin blend comprising a first resin and a second resin, wherein the second resin includes a polymer resin having at least one organic functional group selected from the group consisting of an alkyl group having 2 to 20 carb…
Who is the assignee on this patent?
Yoo Houng Sik, Ryu Jin Young, Kim Hak Shin, and 4 more
What technology area does this patent fall under?
Primary CPC classification C08L33/20. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 19 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 10 related publications on this page (citations in our corpus or others sharing the same primary CPC).