One or more charging members used in the manufacture of a lapping plate, and related apparatuses and methods of making

Patent metadata

Field	Value
Publication number	US-10654146-B2
Application number	US-201815877615-A
Country	US
Kind code	B2
Filing date	Jan 23, 2018
Priority date	Jan 23, 2018
Publication date	May 19, 2020
Grant date	May 19, 2020

Abstract

The present disclosure includes charging members for charging abrasive particles into the surface of a lapping plate. The charging members include one or more channels to permit abrasive slurry to flow through when the charging member is in contact with the lapping plate.

First claim

What is claimed is:

1. An apparatus for processing a major surface of a lapping plate platen during the manufacture of an abrasive surface on the major surface of the lapping plate platen, wherein the apparatus comprises:
a) a rotatable platter configured to secure and physically support the lapping plate platen during processing of the major surface of the lapping plate platen;
b) at least one processing head mechanism that is rotatably and removably coupled to a processing head, wherein the processing head comprises:
i) a base;
ii) at least one charging member coupled to the base, wherein the at least one charging member has at least one channel opening that defines at least two land areas, wherein the processing head mechanism is configured to move the processing head in at least the z-axis direction to contact the major surface of the lapping plate platen with the at least two land areas under pressure to charge abrasive particles into the surface of the lapping plate platen, wherein the processing head mechanism is configured to rotate the processing head about its central axis in the z-axis direction while the at least two land areas of the at least one charging member are in contact with the major surface of the lapping plate platen under pressure to charge abrasive particles into the surface of the lapping plate platen, wherein the at least one channel opening is located proximal to an outer perimeter of the charging member, wherein the at least one channel opening permits abrasive slurry to flow through the channel opening from a position outside the charging member outer perimeter to a position inside the charging member outer perimeter when the at least two land areas are in contact with the major surface of the lapping plate platen.

2. The apparatus of claim 1 , wherein the at least one channel comprises a plurality of radial channels, wherein each of the plurality of channels comprises two sidewalls that extend from the outer perimeter of the charging member toward the center of the charging member.

3. The apparatus of claim 2 , wherein the two sidewalls of each channel are arc-shaped, wherein the arc is curved in the same direction that processing head mechanism is configured to rotate.

4. The apparatus of claim 1 , wherein when the processing head mechanism rotates the processing head about its central axis in the z-axis direction the at least one charging member coupled to the base rotates about the central axis of the processing head.

5. The apparatus of claim 1 , wherein the at least one charging member coupled to the base comprises three or more charging member coupled to the base.

6. The apparatus of claim 1 , wherein the at least one charging member is made of material comprising one or more metals, one or more ceramics, one or more glasses, and combinations thereof.

7. The apparatus of claim 1 , wherein the at least one charging member is made of material comprising alumina, zirconia toughened alumina (ZTA), yttria stabilized zirconia, boron nitride, aluminum nitride, aluminum silicate, magnesium oxide, and combinations thereof.

8. An apparatus for processing a major surface of a lapping plate platen during the manufacture of an abrasive surface on the major surface of the lapping plate platen, wherein the apparatus comprises:
a) a rotatable platter configured to secure and physically support the lapping plate platen during processing of the major surface of the lapping plate platen;
b) at least one processing head mechanism that is rotatably and removably coupled to a processing head, wherein the processing head comprises:
i) a base;
ii) at least one charging member coupled to the base, wherein the at least one charging member has at least one channel opening that defines at least two land areas, wherein the processing head mechanism is configured to move the processing head in at least the z-axis direction to contact the major surface of the lapping plate platen with the at least two land areas under pressure to charge abrasive particles into the surface of the lapping plate platen, wherein the processing head mechanism is configured to rotate the processing head about its central axis in the z-axis direction while the at least two land areas of the at least one charging member are in contact with the major surface of the lapping plate platen under pressure to charge abrasive particles into the surface of the lapping plate platen, wherein the at least one channel opening is located proximal to an outer perimeter of the charging member, wherein the at least one channel opening permits abrasive slurry to flow through the channel opening from a position outside the charging member outer perimeter to a position inside the charging member outer perimeter when the at least two land areas are in contact with the major surface of the lapping plate platen, and wherein the at least one channel comprises two sidewalls that extend from the outer perimeter of the charging member around the center of charging member and toward the center of the charging member in a spiral manner.

9. The apparatus of claim 8 , further comprising at least one additional annular ridge extending around an inner perimeter that is inside the outer perimeter of the charging member, wherein the at least one additional annular ridge comprises at least one channel that defines at least two land areas, wherein the at least one channel opening in the additional annular ridge permits abrasive slurry to flow through the channel opening from a position outside the inner perimeter to a position inside the inner perimeter when the at least two land areas of the additional annular ridge are in contact with the major surface of the lapping plate platen.

10. The apparatus of claim 8 , wherein the at least one channel comprises at least two concentric channels, wherein each channel comprises two sidewalls that extend from the outer perimeter of the charging member around the center of charging member and toward the center of the charging member in a spiral manner.

11. The apparatus of claim 8 , wherein when the processing head mechanism rotates the processing head about its central axis in the z-axis direction the at least one charging member coupled to the base rotates about the central axis of the processing head.

12. The apparatus of claim 8 , wherein the at least one charging member coupled to the base comprises three or more charging member coupled to the base.

13. The apparatus of claim 8 wherein the at least one charging member is made of material comprising one or more metals, one or more ceramics, one or more glasses, and combinations thereof.

14. The apparatus of claim 8 , wherein the at least one charging member is made of material comprising alumina, zirconia toughened alumina (ZTA), yttria stabilized zirconia, boron nitride, aluminum nitride, aluminum silicate, magnesium oxide, and combinations thereof.

15. An apparatus for processing a major surface of a lapping plate platen during the manufacture of an abrasive surface on the major surface of the lapping plate platen, wherein the apparatus comprises:
a) a rotatable platter configured to secure and physically support the lapping plate platen during processing of the major surface of the lapping plate platen;
b) at least one processing head mechanism that is rotatably and removably coupled to a processing head, wherein the processing head comprises:
i) a base;
ii) at least one charging member coupled to the base, wherein the at least one charging member has at least one channel opening that defines at least two land areas, wherein the processing head mechanism is configured to move the

Assignees

• Seagate Technology Llc

Inventors

• Baurceanu Mihaela Ruxandra
• Anderson Ricky Ray
• Habermas Andrew David
• Phann Chea

Classifications

• B24B57/02 Primary

  for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents · CPC title

• B24B37/10

  for single side lapping · CPC title

• B24B49/006

  taking regard of the speed · CPC title

• B24B53/017

  Devices or means for dressing, cleaning or otherwise conditioning lapping tools · CPC title

• B24B37/022

  characterised by the movement of the work between two lapping plates · CPC title