Diffraction pattern detection in a transmission charged particle microscope

Patent metadata

Field	Value
Publication number	US-10651008-B2
Application number	US-201815998757-A
Country	US
Kind code	B2
Filing date	Aug 16, 2018
Priority date	Aug 17, 2017
Publication date	May 12, 2020
Grant date	May 12, 2020

Abstract

Techniques of using a Transmission Charged Particle Microscope for diffraction pattern detection are disclosed. An example method including irradiating at least a portion of a specimen with a charged particle beam, using an imaging system to collect charged particles that traverse the specimen during said irradiation, and to direct them onto a detector configured to operate in a particle counting mode, using said detector to record a diffraction pattern of said irradiated portion of the specimen, recording said diffraction pattern iteratively in a series of successive detection frames, and during recording of each frame, using a scanning assembly for causing relative motion of said diffraction pattern and said detector, so as to cause each local intensity maximum in said pattern to trace out a locus on said detector.

First claim

The invention claimed is:

1. A method of using a Transmission Charged Particle Microscope, comprising:
providing a specimen on a specimen holder;
using a charged particle beam column to produce a charged particle beam and irradiate at least a portion of the specimen therewith;
using an imaging system to collect charged particles that traverse the specimen during said irradiation, and to direct them onto a detector;
using said detector to record a diffraction pattern of said irradiated portion of the specimen, said detector configured to operate in particle counting mode;
recording said diffraction pattern iteratively in a series of successive detection frames, and summing said frames; and
during recording of each frame, using a scanning assembly for causing relative motion of said diffraction pattern and said detector, so as to cause each local intensity maximum in said pattern to trace out a locus on said detector.

2. A method according to claim 1 , wherein the scanning assembly is selected from the group comprising:
a beam deflection module located between the specimen and detector, to displace the diffraction pattern upon the detector;
an actuator module connected to the detector, to displace the detector relative to the diffraction pattern, and
a combination thereof.

3. A method according to claim 1 , wherein an amplitude of said relative motion is selected such that, for any given first and second local intensity maximum, the corresponding first and second loci do not mutually intersect.

4. A method according to claim 1 , wherein said locus is a closed curve.

5. A method according to claim 4 , wherein said locus is circular.

6. A method according to claim 1 , wherein:
said detector comprise a CMOS sensor; and
a first sensor region receiving a relatively strong signal is read out more frequently than a second sensor region receiving a relatively weak signal.

7. A transmission charged particle microscope comprising:
a specimen holder, for holding a specimen;
a charged particle beam column, for producing a charged particle beam and irradiating at least a portion of the specimen therewith;
an imaging system, for collecting charged particles that traverse the specimen during said irradiation, and directing them onto a detector configured to record a diffraction pattern of said irradiated portion of the specimen; and
a controller, for controlling at least some operational aspects of the microscope, configured to:
operate said detector in particle counting mode;
record said diffraction pattern iteratively in a series of successive detection frames, and sum said frames; and
during recording of each frame, invoke a scanning assembly to effect relative motion of said diffraction pattern and said detector so as to cause each local intensity maximum in said pattern to trace out a locus on said detector.

8. The transmission charged particle microscope of claim 7 , wherein the scanning assembly is selected from the group comprising:
a beam deflection module located between the specimen and detector, to displace the diffraction pattern upon the detector;
an actuator module connected to the detector, to displace the detector relative to the diffraction pattern, and
a combination thereof.

9. The transmission charged particle microscope of claim 7 , wherein an amplitude of said relative motion is selected such that, for any given first and second local intensity maximum, the corresponding first and second loci do not mutually intersect.

10. The transmission charged particle microscope of claim 7 , wherein said locus is a closed curve.

11. The transmission charged particle microscope of claim 10 , wherein said locus is circular.

12. The transmission charged particle microscope of claim 7 , wherein:
said detector comprise a CMOS sensor; and
a first sensor region receiving a relatively strong signal is read out more frequently than a second sensor region receiving a relatively weak signal.

13. A method comprising:
operating a detector of a charged particle microscope in a particle counting mode;
irradiating a sample with a charged particle beam;
iteratively recording, by the detector, a diffraction pattern of the irradiated sample in a series of successive detection frames, the diffraction pattern formed in response to the charged particle beam traversing the sample; and
while recording each frame of the series of successive detection frames, causing, by a scanning assembly, relative motion of the diffraction pattern and the detector to cause each local intensity maximum of the diffraction pattern to trace out a path on the detector.

14. The method of claim 13 , further comprising:
deconvolving each frame of the series of successive detection frames to nullify the effect of the motion.

15. The method of claim 14 , wherein the deconvolving restores the original diffraction pattern.

16. The method of claim 13 , further comprising:
reading out a first area of the detector during each detection frame of the series of successive detection frames at a first frequency; and
reading out a second area of the detector during each detection frame of the series of successive detection frames at a second frequency, the second frequency different than the first frequency.

17. The method of claim 16 , wherein the first frequency is higher than the second frequency.

18. The method of claim 13 , wherein causing, by a scanning assembly, relative motion of the diffraction pattern and the detector comprises one of:
deflecting the beam of charged particle to trace out the path on the detector;
displacing the detector to trace out the path on the detector; and
a combination thereof.

19. The method of claim 13 , wherein the relative motion of the diffraction pattern and the detector is such that adjacent intensity maximum of the diffraction pattern do not overlap.

20. The method of claim 13 , wherein the path is a closed curve.

Assignees

• Fei Co

Inventors

• Buijsse Bart
• Kuijper Maarten

Classifications

• H01J2237/2809

  characterised by the imaging problems involved · CPC title

• H01J2237/2802

  Transmission microscopes · CPC title

• H01J37/26

  Electron or ion microscopes; Electron or ion diffraction tubes · CPC title

• H01J37/244 Primary

  Detectors; Associated components or circuits therefor · CPC title

• H01J2237/2617

  Comparison or superposition of transmission images; Moiré · CPC title