Film-forming composition and manufacturing method of laminate

US10640670B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10640670-B2
Application numberUS-201816205249-A
CountryUS
Kind codeB2
Filing dateNov 30, 2018
Priority dateJun 17, 2016
Publication dateMay 5, 2020
Grant dateMay 5, 2020

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Provided are a film-forming composition containing a hydrolysate of a siloxane compound represented by Formula (1), silica particles, a ketone-based solvent, and water, and a manufacturing method of a laminate. In Formula (1), R 1 , R 2 , R 3 , and R 4 each independently represent a monovalent organic group having 1 to 6 carbon atoms. n represents an integer of 2 to 20.

First claim

Opening claim text (preview).

What is claimed is: 1. A film-forming composition comprising: (a) a hydrolysate of a siloxane compound represented by Formula (1); (b) silica particles; (c) a ketone-based solvent; (d) at least one kind of solvent selected from the group consisting of an alcohol-based solvent, a glycol ether-based solvent, and an ether-based solvent; and (e) water, in Formula (1), R 1 , R 2 , R 3 , and R 4 each independently represent a monovalent organic group having 1 to 6 carbon atoms, and n represents an integer of 2 to 20; wherein a ratio of the total content of the (d) at least one kind of solvent selected from the group consisting of an alcohol-based solvent, a glycol ether-based solvent, and an ether-based solvent to the content of the (c) ketone-based solvent in the film-forming composition is 0.1 to 16.5 based on mass. 2. The film-forming composition according to claim 1 , further comprising: at least one kind of resin selected from the group consisting of a urethane-based resin and a (meth)acrylic resin. 3. The film-forming composition according to claim 2 , wherein the (meth)acrylic resin is a polyacrylic acid. 4. A manufacturing method of a laminate, comprising: forming a film by applying the film-forming composition according to claim 1 onto a substrate. 5. The manufacturing method of a laminate according to claim 4 , wherein the film-forming composition further comprises at least one kind of resin selected from the group consisting of a urethane-based resin and a (meth)acrylic resin. 6. The manufacturing method of a laminate according to claim 5 , wherein the (meth)acrylic resin is a polyacrylic acid. 7. The manufacturing method of a laminate according to claim 4 , wherein the substrate is a polycarbonate substrate or a polymethyl methacrylate substrate.

Assignees

Inventors

Classifications

  • Polysilicates · CPC title

  • Layered products comprising a {layer of a} particular substance not covered by groups B32B11/00 - B32B29/00 · CPC title

  • Silica · CPC title

  • of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical · CPC title

  • Sulfonic acids; Derivatives thereof · CPC title

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What does patent US10640670B2 cover?
Provided are a film-forming composition containing a hydrolysate of a siloxane compound represented by Formula (1), silica particles, a ketone-based solvent, and water, and a manufacturing method of a laminate. In Formula (1), R 1 , R 2 , R 3 , and R 4 each independently represent a monovalent organic group having 1 to 6 carbon atoms. n represents an integer of 2 to 20.
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification C09D183/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 05 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).