Block copolymer

Patent metadata

Field	Value
Publication number	US-10633533-B2
Application number	US-201515514967-A
Country	US
Kind code	B2
Filing date	Sep 30, 2015
Priority date	Sep 30, 2014
Publication date	Apr 28, 2020
Grant date	Apr 28, 2020

Abstract

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

First claim

What is claimed is:

1. A block copolymer comprising a first block that comprises a structural unit represented by Structural Formula 1 below and a second block that comprises a structural unit represented by Structural Formula 3 below:

where in the Structural Formula 1,
R represents a hydrogen atom or an alkyl group;
X represents an oxygen atom, a sulfur atom, —S(═O) 2 —, a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, wherein the X 1 represents an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group;
Y represents a monovalent substituent that includes a ring structure to which a linear chain including 8 or more chain-forming atoms is connected; and
where in the Structural Formula 3,
X 2 represents a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 2 — or —X 2 —C(═O)—, wherein the X 2 ′ represents a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group; and
each of R 1 to R 5 independently represents a hydrogen atom, an alkyl group, a haloalkyl group, a halogen atom or a crosslinking functional group, wherein one or more crosslinking functional groups are included in positions marked as R 1 to R 5 , and one or more halogen atoms are included in the positions marked as R 1 to R 5 .

2. The block copolymer of claim 1 , wherein the X represents an oxygen atom, a carbonyl group, —C(═O)—O—, or —O—C(═O)—.

3. The block copolymer of claim 1 , wherein the linear chain includes 8 to 20 chain-forming atoms.

4. The block copolymer of claim 1 , wherein the chain-forming atom is carbon, oxygen, nitrogen, or sulfur.

5. The block copolymer of claim 1 , wherein the chain-forming atom is carbon or oxygen.

6. The block copolymer of claim 1 , wherein the ring structure of the Y is an aromatic ring structure or an alicyclic ring structure.

7. The block copolymer of claim 1 , wherein the crosslinking functional group is an azide-containing functional group, a sulfur-containing functional group, or a functional group containing one or more unsaturated double bonds.

8. The block copolymer of claim 1 comprising:
the second block that includes the structural unit of the Structural Formula 3 in a proportion ranging from 0.1 mol % to 5 mol %.

9. The block copolymer of claim 1 , wherein the second block further includes a structural unit represented by Structural Formula 4 below:

where in the Structural Formula 4,
X 2 represents a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, wherein the X 1 represents a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group; and
W represents an aryl group that includes at least one halogen atom.

10. The block copolymer of claim 1 , wherein the second block further includes a structural unit represented by Structural Formula 5 below:

where in the Structural Formula 5,
X 3 represents a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, wherein the X 1 represents a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group; and
each of R a to R e independently represents a hydrogen atom, an alkyl group, a haloalkyl group or a halogen atom, wherein one or more halogen atoms are included in positions marked as R a to R e .

11. The block copolymer of claim 10 , wherein 3 or more halogen atoms are included in the positions marked as R a to R e .

12. The block copolymer of claim 10 , wherein 5 or more halogen atoms are included in the positions marked as R a to R e .

13. The block copolymer of claim 10 , wherein the halogen atom is a fluorine atom.

14. A polymer film comprising the block copolymer of claim 1 , wherein the block copolymer is self-assembled.

15. The polymer film of claim 14 , wherein the second block of the block copolymer includes a crosslinked structure.

16. A method of forming a polymer film, the method comprising:
forming a polymer film that includes the block copolymer of claim 1 on a substrate, wherein the block copolymer is self-assembled.

17. The method of claim 16 , further comprising: crosslinking of the second block of the block copolymer, wherein the block copolymer is self-assembled.

18. A method of forming a pattern, the method comprising:
selectively removing any one block of the block copolymer of claim 1 from a laminate that is made up of a substrate and a polymer film, which is formed on the substrate and includes the block copolymer, wherein the block copolymer is self-assembled.

19. The method of claim 18 , wherein the second block of the block copolymer includes a crosslinked structure.

20. A block copolymer comprising a first block that comprises a structural unit represented by Structural Formula 1 below and a second block that comprises a structural unit represented by Structural Formula 3 below:

where in the Structural Formula 1,
R represents a hydrogen atom or an alkyl group;
X represents an oxygen atom, a sulfur atom, —S(═O) 2 —, a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 1 — or —X 1 —C(═O)—, wherein the X 1 represents an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group; and
Y is represented by Structural Formula 2 below:
—P-Q-Z  [Structural Formula 2]

where in the Structural Formula 2,
P represents an arylene group;
Q represents a single bond, an oxygen atom or —NR 3 —, wherein the R 3 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or an aryl group; and
Z represents a linear chain with 8 or more chain-forming atoms, and
where in the Structural Formula 3,
X 2 represents a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X 2 ′— or —X 2 ′—C(═O)—, wherein the X 2 ′—represents a single bond, an oxygen atom, a sulfur atom, —S(═O) 2 —, an alkylene group, an alkenylene group or an alkynylene group; and
each of R 1 to R 5 independently represents a hydrogen atom, an alkyl group, a haloalkyl group, a halogen atom or a crosslinking functional group, wherein one or more crosslinking functional groups are included in positions marked as R 1 to R 5 .

21. The block copolymer of claim 20 , wherein one or more halogen atoms are included in the positions marked as R 1 to R 5 of the Structural Formula 3.

Assignees

• Lg Chemical Ltd

Inventors

• Lee Mi Sook
• Kim Jung Keun
• Ku Se Jin
• Park No Jin
• Lee Je Gwon
• Choi Eun Young
• Yoon Sung Soo
• Ryu Hyung Ju

Classifications

• H10P95/066

  the removal being a selective chemical etching step, e.g. selective dry etching through a mask · CPC title

• H10P95/064

  the removal being chemical etching · CPC title

• H10P95/08

  Planarisation of organic insulating materials · CPC title

• H10P76/204

  of organic photoresist masks · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title