Specimen preparation and inspection in a dual-beam charged particle microscope

Patent metadata

Field	Value
Publication number	US-10629409-B2
Application number	US-201816036017-A
Country	US
Kind code	B2
Filing date	Jul 16, 2018
Priority date	Jul 20, 2017
Publication date	Apr 21, 2020
Grant date	Apr 21, 2020

Abstract

A method of preparing a specimen in a dual-beam charged particle microscope having:
an ion beam column, that can produce an ion beam that propagates along an ion axis; an electron beam column, that can produce an electron beam that propagates along an electron axis,

comprising the following steps:
Providing a precursor sample on a sample holder; Using said ion beam to cut a furrow around a selected portion of said sample; Attaching a manipulator needle to said portion, severing said portion from the rest of said sample, and using the needle to perform a lift-out of the portion away from the rest of the sample,

particularly comprising:
Configuring the manipulator needle to have multiple degrees of motional freedom, comprising at least:
Eucentric tilt θ about a tilt axis that passes through an intersection point of said ion and electron axes and is perpendicular to said electron axis; Rotation φ about a longitudinal axis of the needle;
Whilst maintaining said portion on said needle, using said ion beam to machine at least one surface of said portion, so as to create said specimen; Whilst maintaining said portion on said needle, inspecting it with said electron beam, for at least two different values of said φ rotation.

First claim

The invention claimed is:

1. A method of preparing a specimen in a dual-beam charged particle microscope, the method comprising:
using an ion beam to form a furrow around a selected portion of said sample;
attaching a manipulator needle to said portion;
severing said portion from the rest of said sample;
using the needle to perform a lift-out of the portion away from the rest of the sample;
configuring the manipulator needle to have multiple degrees of motional freedom, comprising at least:
eucentric tilt θ about a tilt axis that passes through an intersection point of said ion and electron axes and is perpendicular to said electron axis;
rotation φ about a longitudinal axis of the needle;

whilst maintaining said portion on said needle, using said ion beam to machine at least one surface of said portion, so as to create said specimen; and
whilst maintaining said portion on said needle, inspecting it with said electron beam, for at least two different values of said φ rotation.

2. A method according to claim 1 , wherein said inspecting step comprises performing transmissive electron tomography on said portion, at a range of values of said rotation φ.

3. A method according to claim 2 , in which said tomography is performed at a tilt value θ=0 corresponding to a needle orientation that is substantially perpendicular to said electron beam.

4. A method according to claim 1 , wherein:
said needle holds a detachable tool comprising:
a plate; and
at least one appendage extending from said plate;

wherein said portion is adhered to said appendage.

5. A method according to claim 3 , wherein said tool comprises a TEM Grid or Lift-Out Grid.

6. A method according to claim 2 , wherein a plurality of appendages extend from the plate, in a fanned arrangement.

7. A dual-beam charged particle microscope comprising:
an ion beam column, for producing an ion beam that propagates along an ion axis;
an electron beam column, for producing an electron beam that propagates along an electron axis;
a sample holder, for holding a sample;
a manipulator needle, which can be attached to a portion of said sample;
a detector, for detecting radiation emanating from said portion in response to irradiation by said electron beam; and
a controller, for at least partially controlling operation of said microscope,
wherein said needle has multiple degrees of motional freedom, comprising at least:
eucentric tilt θ about a tilt axis that passes through an intersection point of said ion and electron axes and is perpendicular to said electron axis; and
rotation φ about a longitudinal axis of the needle.

8. A microscope according to claim 7 , wherein said controller is configured to:
select a first θ value, at which said manipulator needle is used to perform post-excision lift-out of said portion from said sample; and
select a second θ value, different from said first θ value, at which said electron beam is used to inspect said portion.

9. A microscope according to claim 8 , wherein:
said detector is configured to detect electrons transmitted through said portion during said irradiation; and
during said inspection step, said controller is configured to:
drive said needle to at least two different φ values; and
at each of said φ values, record an output from said detector.

10. A microscope according to claim 7 , further includes a TEM grid comprising:
a plate; and
a plurality of appendages extending from said plate in a fanned arrangement.

11. An apparatus comprising:
a sample stage for supporting a sample;
a manipulator needle arranged to pivot about an axis that passes through an intersection point of ion and electron column axes and is perpendicular to the electron column axis, and further arranged to rotate around a longitudinal axis of the manipulator needle; and
a controller coupled to control at least the manipulator needle during lift-out, milling and imaging operations, the controller causing the manipulator to:
during the lift-out operation, move the manipulator to a first location about the pivot point;
during the milling operation move the manipulator to a second location about the pivot point, the second location different than the first location, wherein the portion is milled by an ion beam; and
during the imaging operation, causes the manipulator to rotate around the longitudinal axis, wherein images are acquired with an electron beam.

12. The apparatus of claim 11 , wherein the first location is an intermediate location between horizontal and vertical orientations.

13. The apparatus of claim 11 , wherein the second location is a horizontal location.

14. The apparatus of claim 11 , wherein during the milling operation, the controller further causes the manipulator to rotate around the longitudinal axis.

15. The apparatus of claim 11 , wherein the imaging operation includes scanning transmission electron microscopy of the portion.

16. The apparatus of claim 11 , further including a detachable tool coupled to the end of the manipulator, the detachable tool including a plate and at least one appendage, the at least one appendage configured to couple to the portion.

17. The apparatus of claim 16 , wherein the detachable tool includes a plurality of appendages in a fanned arrangement.

18. The apparatus of claim 11 , wherein the manipulator includes an upper arm and a lower arm, the lower arm coupled to rotate around the longitudinal axis of the manipulator while the upper arm remains stationary.

19. The apparatus of claim 11 , wherein during the imaging operation, the controller causes the manipulator to rotate around to at least two locations, wherein an image of the portion is acquired at each of the two locations.

20. The apparatus of claim 11 , wherein during the imaging operation, the controller causes the manipulator to move to a horizontal location about the pivot point.

Assignees

• Fei Co

Inventors

• Vaske Frantisek
• Vystavêl Tomáŝ
• Bosák Daniel

Classifications

• H01J2237/20242

  Eucentric movement · CPC title

• H01J37/3056

  for microworking, e. g. etching of gratings or trimming of electrical components · CPC title

• H01J2237/31745

  for preparing specimen to be viewed in microscopes or analyzed in microanalysers · CPC title

• H01J2237/31749

  Focused ion beam · CPC title

• H01J37/244

  Detectors; Associated components or circuits therefor · CPC title