Mask frame assembly with alignment marks in both frame and mask plate, and evaporation apparatus

US10627714B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10627714-B2
Application numberUS-201715737220-A
CountryUS
Kind codeB2
Filing dateMay 12, 2017
Priority dateMay 13, 2016
Publication dateApr 21, 2020
Grant dateApr 21, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A mask frame assembly and an evaporation apparatus are disclosed. The mask frame assembly comprises a frame and a mask plate fixed on the frame. The mask frame assembly is provided with alignment marks, which comprise a first alignment hole arranged in the frame and a second alignment hole arranged in the mask plate. The first alignment hole is a through hole; or the first alignment hole is a blind hole, the deepest position at a bottom of the blind hole does not overlap with an orthographic projection of the second alignment hole on the frame. The mask frame assembly effectively solves a problem in which liquid residuals in alignment holes of the frame interfere with alignment.

First claim

Opening claim text (preview).

What is claimed is: 1. A mask frame assembly, comprising a frame and a mask plate fixed on the frame, wherein the mask frame assembly is provided with alignment marks, and each of the alignment marks comprises a first alignment hole which is arranged in the frame and a second alignment hole which is arranged in the mask plate, and wherein the first alignment hole is a blind hole, the deepest position at a bottom of the blind hole does not overlap with an orthographic projection of the second alignment hole from the mask plate to the frame, wherein the first alignment hole comprises a first segment, and the first segment has an inner wall which is not perpendicular with a plane in which the mask plate lies, wherein the first alignment hole further comprises a second segment of a cylinder shape, and the second segment has an axis which is perpendicular with the plane in which the mask plate lies. 2. The mask frame assembly of claim 1 , wherein the first segment has a cone shape, and the first segment has an axis which is perpendicular with the plane in which the mask plate lies. 3. The mask frame assembly of claim 2 , wherein an orthographic projection of the second alignment hole on the frame is located on the inner wall of the first segment. 4. The mask frame assembly of claim 2 , wherein the first segment has a cone angle of 60 degrees -150 degrees and a height of 1.5 mm -2.0 mm. 5. The mask frame assembly of claim 1 , wherein the second segment has a height of 0.8 mm -1.2 mm. 6. The mask frame assembly of claim 1 , wherein the second alignment hole is a through hole. 7. The mask frame assembly of claim 1 , wherein the frame and the mask plate is made from a metallic material, and the mask plate is soldered to the frame. 8. The mask frame assembly of claim 1 , comprising 4 or more alignment marks. 9. An evaporation apparatus, comprising the mask frame assembly of claim 1 .

Assignees

Inventors

Classifications

  • for Group V materials or Group III-V materials · CPC title

  • C23C14/042Primary

    using masks · CPC title

  • Preparation processes not covered by groups G03F1/20 - G03F1/50 · CPC title

  • Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof · CPC title

  • Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks · CPC title

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Frequently asked questions

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What does patent US10627714B2 cover?
A mask frame assembly and an evaporation apparatus are disclosed. The mask frame assembly comprises a frame and a mask plate fixed on the frame. The mask frame assembly is provided with alignment marks, which comprise a first alignment hole arranged in the frame and a second alignment hole arranged in the mask plate. The first alignment hole is a through hole; or the first alignment hole is a b…
Who is the assignee on this patent?
Boe Technology Group Co Ltd, Ordos Yuansheng Optoelectronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 21 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 10 related publications on this page (citations in our corpus or others sharing the same primary CPC).