Solvent resistant polymeric membranes

US10626276B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10626276-B2
Application numberUS-201715403530-A
CountryUS
Kind codeB2
Filing dateJan 11, 2017
Priority dateMar 23, 2012
Publication dateApr 21, 2020
Grant dateApr 21, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligomer having at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; and c) an organic solvent for the membrane polymer and the hydrophobic monomer. A polymeric membrane and a method for manufacturing the membrane are also disclosed.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for manufacturing a polymeric membrane, the method comprising, in order, the steps of: a) preparing a radiation curable composition including: a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone, a polyether etherketone, a polyvinylchloride, a polyacrylonitrile, a polyvinylidene fluoride, a polyimide, a polyamide, and copolymers thereof; a hydrophobic monomer or oligomer including at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; an organic solvent for the membrane polymer and the hydrophobic monomer or oligomer; and an acyl phosphineoxide photoinitiator having a maximum absorption at a wavelength above 320 nm; b) coating a layer of the radiation curable composition onto a porous support; c) phase inverting the coated layer by coagulating the radiation curable composition; and d) curing the phase inverted coated layer by actinic radiation. 2. The method according to claim 1 , wherein the step b) is performed by roll to roll coating. 3. The method according to claim 1 , further comprising the step of: e) conditioning the polymeric membrane by immersing the polymeric membrane in a solution including a conditioning agent and a solvent. 4. The method according to claim 1 , wherein the polymeric membrane includes the porous support. 5. The method according to claim 1 , wherein the porous support is selected from the group consisting of a woven fabric, a non-woven fabric, polyester, polytetrafluoroethylene, polyvinyl chloride, sintered glass, glass fibres, a ceramic support, and a metal mesh.

Assignees

Inventors

Classifications

  • on to polycarbonamides, polyesteramides or polyimides {(C08F283/004 takes precedence)} · CPC title

  • characterised by the presence of specified groups, e.g. introduced by chemical after-treatment · CPC title

  • Use of radiation · CPC title

  • of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen · CPC title

  • Polysulfones; Polyethersulfones · CPC title

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What does patent US10626276B2 cover?
A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligom…
Who is the assignee on this patent?
Agfa Gevaert, Univ Leuven Kath
What technology area does this patent fall under?
Primary CPC classification C09D4/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 21 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).