Plasma generation apparatus including measurement device and plasma thruster

Patent metadata

Field	Value
Publication number	US-10616989-B2
Application number	US-201515307482-A
Country	US
Kind code	B2
Filing date	Apr 10, 2015
Priority date	May 2, 2014
Publication date	Apr 7, 2020
Grant date	Apr 7, 2020

Abstract

A plasma generation apparatus, and a plasma thruster configured to use the plasma generation apparatus are disclosed. The plasma generation apparatus includes a discharge vessel, a light-emitting monitor, a probe measuring instrument, a control device, and an optical axis driving unit. The discharge vessel is configured to ionize gas which is introduced to an inside thereof so as to generate plasma. The light-emitting monitor is configured to measure electron density of the plasma by emission spectra of the plasma. The probe measuring instrument is configured to measure the electron density of the plasma by a probe in the discharge vessel.

First claim

The invention claimed is:

1. A plasma generation apparatus including a measurement device, comprising;
a plasma generation unit configured to ionize gas introduced to an inside thereof so as to generate plasma;
an emission spectra measurement device configured to measure a relative value of electron density of the plasma by emission spectra of the plasma;
a probe measurement device configured to measure an absolute value of the electron density of the plasma by a probe in the plasma generation unit;
a control device configured to: (i) correct the relative value of the electron density of the plasma measured by the emission spectra measurement device to a corrected absolute value based on the absolute value of the electron density of the plasma measured by the probe measurement device; and (ii) control at least one of an amount of electric power to be supplied to the plasma generation unit, magnetic field distribution, and an amount of supply gas based on measurement results of the corrected absolute value; and
an optical axis driving unit configured to change an optical axis of light from the plasma entering the emission spectra measurement device.

2. The plasma generation apparatus according to claim 1 , wherein the emission spectra measurement device is configured to classify a first emission spectrum based on a neutral particle in the plasma and a second emission spectrum based on an ion in the plasma and measure a ratio of spectral intensity between the first emission spectrum and second emission spectrum, and the control device is configured to control the at least one of the amount of the electric power to be supplied to the plasma generation unit, the magnetic field distribution, and the amount of the supply gas based on the ratio of spectral intensity between the first emission spectrum and second emission spectrum which has been measured.

3. The plasma generation apparatus according to claim 1 , wherein the probe is a high frequency probe which is at least one of a plasma absorption probe (PAP), a Langmuir probe, an antenna probe, and a probe operable at electron densities greater than 1E19 m −3 .

4. The plasma generation apparatus according to claim 1 , wherein the probe is in an area where the electron density of the plasma is equal to 1E18 m −3 or more and 1E19 m −3 or less.

5. A plasma thruster comprising the plasma generation apparatus according to claim 1 .

6. The plasma generation apparatus according to claim 2 , wherein the probe is a high frequency probe which is at least one of a plasma absorption probe (PAP), a Langmuir probe, an antenna probe, and a probe operable at electron densities greater than 1E19 m −3 .

7. The plasma generation apparatus according to claim 2 , wherein the probe is in an area where the electron density of the plasma is equal to 1E18 m −3 or more and 1E19 m −3 or less.

8. The plasma generation apparatus according to claim 3 , wherein the probe is in an area where the electron density of the plasma is equal to 1E18 m −3 or more and 1E19 m −3 or less.

9. The plasma generation apparatus according to claim 6 , wherein the probe is in an area where the electron density of the plasma is equal to 1E18 m −3 or more and 1E19 m −3 or less.

Assignees

• Mitsubishi Heavy Ind Ltd

Inventors

• Aoi Tatsufumi
• Yamaguchi Kengo
• Matsuda Ryuichi
• Ikeda Akio
• Shimizu Hirofumi
• Yamazaki Takuya
• Kimura Tatsuya

Classifications

• F03H1/0037

  Electrostatic ion thrusters · CPC title

• G01N21/718

  Laser microanalysis, i.e. with formation of sample plasma · CPC title

• G01R29/24

  Arrangements for measuring quantities of charge · CPC title

• H05H1/54 Primary

  Plasma accelerators · CPC title

• F03H1/0081

  Electromagnetic plasma thrusters · CPC title