Retardation material-forming resin composition, orientation material, and retardation material

Patent metadata

Field	Value
Publication number	US-10590219-B2
Application number	US-201816104644-A
Country	US
Kind code	B2
Filing date	Aug 17, 2018
Priority date	Feb 28, 2014
Publication date	Mar 17, 2020
Grant date	Mar 17, 2020

Abstract

A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.

First claim

The invention claimed is:

1. A retardation material-forming resin composition being thermally curable and comprising a resin, component (A), having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group,
wherein the photo-aligning group is an organic group including a structure of Formula (1):

where R is an OH group; and X 1 is a phenylene group that is optionally substituted with an optional substituent.

2. The retardation material-forming resin composition according to claim 1 , wherein the resin of the component (A) is an acrylic copolymer.

3. The retardation material-forming resin composition according to claim 1 , wherein the resin of the component (A) further has a self-crosslinking group, or further has a group that reacts with at least one group A selected from the group consisting of a hydroxy group, a carboxy group, an amide group, an amino group, an alkoxysilyl group, and a group of Formula (2), and when an end portion of the photo-aligning group in the resin is a carboxy group or an amide group, this end portion is also included in the group A, the group of Formula (2) having the structure:

where R 5 is an alkyl group, an alkoxy group, or a phenyl group.

4. The retardation material-forming resin composition according to claim 1 , wherein the resin of the component (A) further has at least one group A selected from the group consisting of a hydroxy group, a carboxy group, an amide group, an amino group, an alkoxysilyl group, and a group of Formula (2), and when an end portion of the photo-aligning group in the resin is a carboxy group or an amide group, this end portion is also included in the group A, and the composition further includes a cross-linking agent that reacts with the at least one group A, the group of Formula (2) having the structure:

where R 5 is an alkyl group, an alkoxy group, or a phenyl group.

5. The retardation material-forming resin composition according to claim 1 , wherein the resin of the component (A) further has a group that reacts with at least one group A selected from the group consisting of a hydroxy group, a carboxy group, an amide group, an amino group, an alkoxysilyl group, and a group of Formula (2), and when an end portion of the photo-aligning group in the resin is a carboxy group or an amide group, this end portion is also included in the group A, and the group of Formula (2) having the structure:

where R 5 is an alkyl group, an alkoxy group, or a phenyl group.

6. The retardation material-forming resin composition according to claim 1 , further comprising a compound having at least two groups A selected from the group consisting of a hydroxy group, a carboxy group, an amide group, an amino group, an alkoxysilyl group, and a group of Formula (2), the group of Formula (2) having the structure:

where R 5 is an alkyl group, an alkoxy group, or a phenyl group.

7. The retardation material-forming resin composition according to claim 1 , further comprising a cross-linking catalyst.

8. The retardation material-forming resin composition according to claim 1 , further comprising:
a compound having one or more polymerizable groups and at least one group A selected from the group consisting of a hydroxy group, a carboxy group, an amide group, an amino group, an alkoxysilyl group, and a group of Formula (2), or one or more groups that react with the at least one group A, the group of Formula (2) having the structure:

where R 5 is an alkyl group, an alkoxy group, or a phenyl group.

9. The retardation material-forming resin composition according to claim 1 , further comprising a monomer having the photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group and one or more polymerizable groups.

10. An orientation material being obtained with the retardation material-forming resin composition as claimed in claim 1 .

11. A retardation material being formed of a cured film that is obtained from the retardation material-forming resin composition as claimed in claim 1 .

12. A thermally cured-film formation composition comprising a resin, component (A), having a photo-aligning group to which, a thermally reactive moiety is bonded directly or connected via a linking group,
wherein the photo-aligning group is an organic group including a structure of Formula (1):

where R is an OH group; and X 1 is a phenylene group that is optionally substituted with an optional substituent.

13. The thermally cured-film formation composition according to claim 12 , wherein the resin of the component (A) is an acrylic copolymer.

14. The thermally cured-film formation composition according to claim 12 , wherein the resin of the component (A) further has a self-crosslinking group, or further has a group that reacts with at least one group A selected from the group consisting of a hydroxy group, a carboxy group, an amide group, an amino group, an alkoxysilyl group, and a group of Formula (2) and when an end portion of the photo-aligning group in the resin is a carboxy group or an amide group, this end portion is also included in the group A, the group of Formula (2) having the structure:

where in the Formula, R 5 is an alkyl group, an alkoxy group, or a phenyl group.

15. The thermally cured-film formation composition according to claim 12 , wherein the resin of the component (A) further has at least one of group A selected from the group consisting of a hydroxy group, a carboxy group, an amide group, an amino group, an alkoxysilyl group, and a group of Formula (2), and when an end portion of the photo-aligning group in the resin is a carboxy group or an amide group, this end portion is also included in the group A, and the composition further includes a cross-linking agent that reacts with the at least, one group A, the group of Formula (2) having the structure:

where R 5 is an alkyl group, an alkoxy group, or a phenyl group.

16. The thermally cured-film formation composition according to claim 12 , wherein the resin of the component (A) further has a group that reacts with at least one group A selected from the group consisting of a hydroxy group, a carboxy group, an amide group, an amino group, an alkoxysilyl group, and a group of Formula (2), and when an end portion of the photo-aligning group in the resin is a carboxy group or an amide group, this end portion is also included in the group A, the group of Formula (2) having the structure:

where R 5 is an alkyl group, an alkoxy group, or

Assignees

• Nissan Chemical Ind Ltd

Inventors

• Yukawa Shojiro
• Ito Jun
• Goto Kohei
• Kanno Yuta
• Omura Hiroyuki
• Hatanaka Tadashi

Classifications

• G02F1/133788

  by light irradiation, e.g. linearly polarised light photo-polymerisation · CPC title

• G02B1/04

  made of organic materials, e.g. plastics (G02B1/08 takes precedence) · CPC title

• C08F220/20

  of polyhydric alcohols or phenols {, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate} · CPC title

• C08L33/02

  Homopolymers or copolymers of acids; Metal or ammonium salts thereof · CPC title

• G02B5/3083

  Birefringent or phase retarding elements (G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001) · CPC title