Cellular response to surface with nanoscale heterogeneous rigidity

US10550365B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10550365-B2
Application numberUS-201715483754-A
CountryUS
Kind codeB2
Filing dateApr 10, 2017
Priority dateApr 2, 2008
Publication dateFeb 4, 2020
Grant dateFeb 4, 2020

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An elastomeric substrate comprises a surface with regions of heterogeneous rigidity, wherein the regions are formed by exposing the elastomeric substrate to an energy source to form the regions such that the regions include a rigidity pattern comprising spots.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for fabricating a substrate, the method comprising: forming a substrate of an elastomer, the substrate having a substrate surface; and exposing one or more selected regions of the substrate surface to an energy source, the energy source configured to modify a rigidity of the one or more selected regions, wherein the one or more selected regions form a specified pattern on the substrate surface, and wherein exposing the one or more selected regions to the energy source to modify the rigidity of the one or more selected regions forms a rigidity pattern on the substrate surface corresponding to the specified pattern, and wherein the specified pattern is selected so that the rigidity pattern provides for a differential functional response from cells cultured upon the rigidity pattern. 2. The method according to claim 1 , wherein the energy source comprises at least one of a focused electron beam or deep ultraviolet light. 3. The method according to claim 1 , wherein the energy source initiates cross-linking of the elastomer in order to increase rigidity of the elastomer in the one or more selected regions. 4. The method according to claim 1 , wherein the elastomer comprises poly(dimethylsiloxane) or a poly(dimethylsiloxane)-based polymer. 5. The method according to claim 1 , wherein each of the one or more selected regions include at least one of microscale features or nanoscale features. 6. The method according to claim 1 , wherein forming the substrate comprises forming the substrate surface to have three-dimensional structures within the one or more selected regions, and wherein exposing the one or more selected regions to the energy source comprises locally modifying a rigidity of the three-dimensional structures. 7. The method according to claim 1 , wherein the differential functional response comprises at least one of: differential focal adhesion of the cells to the substrate surface; differential cell differentiation of the cells; differential immune response; or differential growth of the cells. 8. The method according to claim 1 , wherein the cells comprise at least one of stem cells, T-cells, cancer cells, nerve cells, osteoblasts, and muscle cells. 9. The method according to claim 1 , wherein the rigidity pattern comprises a repeating feature. 10. The method according to claim 9 , wherein the repeating feature includes a lateral dimension that is greater than or equal to 250 nanometers. 11. The method according to claim 9 , wherein the repeating feature includes a lateral dimension that is less than or equal to 250 nanometers. 12. The method according to claim 9 , wherein the repeating feature includes spots.

Assignees

Inventors

Classifications

  • Patterned coating · CPC title

  • C12N5/0068Primary

    General culture methods using substrates (for specific animal cell type C12N5/06) · CPC title

  • Cross-linking · CPC title

  • Supports or coatings for cell culture characterised by topography · CPC title

  • Bone marrow mesenchymal stem cells (BM-MSC) · CPC title

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Frequently asked questions

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What does patent US10550365B2 cover?
An elastomeric substrate comprises a surface with regions of heterogeneous rigidity, wherein the regions are formed by exposing the elastomeric substrate to an energy source to form the regions such that the regions include a rigidity pattern comprising spots.
Who is the assignee on this patent?
Univ Columbia
What technology area does this patent fall under?
Primary CPC classification C12N5/0068. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 04 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).