Coating compositions suitable for use with an overcoated photoresist

Patent metadata

Field	Value
Publication number	US-10539873-B2
Application number	US-201514605465-A
Country	US
Kind code	B2
Filing date	Jan 26, 2015
Priority date	Feb 8, 2009
Publication date	Jan 21, 2020
Grant date	Jan 21, 2020

Abstract

Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

First claim

What is claimed is:

1. A coated substrate comprising:
(a) a coating composition layer comprising a resin, the resin comprising a reaction product of an imide-containing dienophile and a polycyclic aromatic group; and
(b) a photoresist layer over the coating composition layer.

2. The substrate of claim 1 wherein the reaction component is a terpolymer, tetrapolymer or pentapolymer.

3. The substrate of claim 1 wherein the coating composition layer resin comprises a reaction product of (1) a dienophile and (2) an anthraecene or pentacene group.

4. A method for forming a photoresist relief image comprising:
(a) applying over a substrate a coating layer of a composition comprising a resin, the resin comprising a reaction product produced from reagents comprising an imide-containing dienophile and a polycyclic aromatic group;
(b) applying a photoresist layer above the coating composition layer.

5. The method of claim 4 wherein the applied photoresist layer is exposed to patterned radiation and then developed with an aqueous alkaline developer composition, whereby the developer composition selectively removes in both the photoresist layer and the underlying coating composition layer the image as defined in the photoresist layer by patterned radiation.

6. An antireflective composition for use with an overcoated photoresist, the antireflective composition comprising:
a resin comprising a reaction product of reagents comprising (1) a dienophile and (2) a compound comprising a pentacene group; and
an acid or acid generator compound.

7. The antireflective composition of claim 6 wherein the composition comprises an acid generator compound.

8. The antireflective composition of claim 6 wherein the composition comprises a photoacid generator compound.

9. The antireflective composition of claim 6 wherein the composition comprises a thermal generator compound.

Assignees

• Rohm & Haas Elect Mat

Inventors

• Cameron James F
• Sung Jin Wuk
• Amara John P
• Prokopowicz Gregory P
• Valeri David A

Classifications

• B05D5/061

  Special surface effect · CPC title

• C08F220/36

  containing oxygen in addition to the carboxy oxygen {, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate} · CPC title

• G03F7/322

  Aqueous alkaline compositions · CPC title

• B05D7/54

  No clear coat specified · CPC title

• G03F7/091 Primary

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title