Organic-inorganic complex, and composition for forming same
US-9217095-B2 · Dec 22, 2015 · US
Coating compositions suitable for use with an overcoated photoresist
US9708493B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9708493-B2 |
| Application number | US-201414537676-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 10, 2014 |
| Priority date | Jun 12, 2009 |
| Publication date | Jul 18, 2017 |
| Grant date | Jul 18, 2017 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
First claim
Opening claim text (preview).
What is claimed is: 1. A coated substrate comprising: (a) a coating composition layer comprising a resin, the resin comprising a reaction product of a diene and a dienophile, and wherein the resin comprises a hydroxyl-naphthoic group; and (b) a photoresist layer over the coating composition layer. 2. A substrate of claim 1 wherein the coating composition comprises a resin comprising a 6-hydroxy-2-naphthoic group. 3. The substrate of claim 1 wherein (i) the resin comprising a reaction product or (ii) the component that comprises a hydroxyl-naphthoic group is a terpolymer, tetrapolymer or pentapolymer. 4. The substrate of claim 1 wherein the coating composition layer is not crosslinked. 5. The substrate of claim 1 wherein the coating composition layer is crosslinked. 6. The substrate of claim 1 wherein the coating composition layer resin comprises a reaction product of an imide-containing dienophile and a polycyclic aromatic group.
Assignees
Inventors
Classifications
using an anti-reflective coating · CPC title
- C09D5/006Primary
Anti-reflective coatings · CPC title
Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title
Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring · CPC title
Finishing the coated layer, e.g. drying, baking, soaking · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9708493B2 cover?
- In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred…
- Who is the assignee on this patent?
- Rohm & Haas Elect Mat
- What technology area does this patent fall under?
- Primary CPC classification C09D5/006. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jul 18 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).