Method for producing a reflection-reducing layer system and reflection-reducing layer system

US10539716B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10539716-B2
Application numberUS-201815921339-A
CountryUS
Kind codeB2
Filing dateMar 14, 2018
Priority dateJan 27, 2015
Publication dateJan 21, 2020
Grant dateJan 21, 2020

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A reflection-reducing layer system is disclosed. In an embodiment, the system includes a refractive index gradient layer including an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface including a nanostructure.

First claim

Opening claim text (preview).

What is claimed is: 1. A reflection-reducing layer system comprising: a refractive index gradient layer comprising an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction; and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface comprising a nanostructure. 2. The reflection-reducing layer system according to claim 1 , wherein the nanostructure has a plurality of structure elements whose heights are on average between 80 nm and 130 nm and whose spacings are on average less than 100 nm. 3. The reflection-reducing layer system according to claim 1 , wherein the refractive index of the refractive index gradient layer at an interface with a substrate of the reflection-reducing layer system is matched to a refractive index of the substrate. 4. The reflection-reducing layer system according to claim 1 , wherein a total thickness of the reflection-reducing layer system is between 250 nm and 450 nm. 5. The reflection-reducing layer system according to claim 1 , wherein the inorganic material of the refractive index gradient layer has a refractive index n1 where 1.37≤n1≤1.46, and wherein the organic material of the refractive index gradient layer has a refractive index n2>n1 where 1.6≤n2≤1.9. 6. The reflection-reducing layer system according to claim 1 , wherein the organic material is a UV-absorbing material. 7. The reflection-reducing layer system according to claim 1 , wherein the organic layer has at least regionally an effective refractive index of between 1.05 and 1.38. 8. The reflection-reducing layer system according to claim 1 , further comprising an inorganic intermediate layer arranged between the organic layer and the refractive index gradient layer. 9. The reflection-reducing layer system according to claim 1 , further comprising a protective layer disposed on the nanostructure, wherein the protective layer has a thickness of between 10 nm and 50 nm. 10. The reflection-reducing layer system according to claim 1 , wherein the organic layer comprises melamine.

Assignees

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Classifications

  • affecting the surface properties of the coating · CPC title

  • Plasma-deposition of organic layers (plasma deposition in general C23C14/00, C23C16/00) · CPC title

  • Organic material · CPC title

  • by plasma treatment {(plasma tubes per se H01J)} · CPC title

  • G02B1/118Primary

    having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures · CPC title

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What does patent US10539716B2 cover?
A reflection-reducing layer system is disclosed. In an embodiment, the system includes a refractive index gradient layer including an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction and an organic layer arranged above the refractive index gradient layer, the or…
Who is the assignee on this patent?
Fraunhofer Ges Forschung
What technology area does this patent fall under?
Primary CPC classification G02B1/118. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 21 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).