Radiation-sensitive compositions and patterning and metallization processes

Patent metadata

Field	Value
Publication number	US-10527935-B2
Application number	US-201715848006-A
Country	US
Kind code	B2
Filing date	Dec 20, 2017
Priority date	Dec 31, 2016
Publication date	Jan 7, 2020
Grant date	Jan 7, 2020

Abstract

A patterning process, comprises: (i) forming a radiation-sensitive film on a substrate, wherein the radiation-sensitive film comprises: (a) a resin, (b) a photoacid generator, (c) a first quencher, and (d) a second quencher; (ii) patternwise exposing the radiation-sensitive film to activating radiation; and (iii) contacting the radiation-sensitive film with an alkaline developing solution to form a resist pattern; wherein the resin comprises the following repeat units:

wherein: R 1 is selected from a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a cyano group or a trifluoromethyl group; Z is a non-hydrogen substituent that provides an acid-labile moiety; n is from 40 to 90 mol %; m is from 10 to 60 mol %; and the total combined content of the two repeat units in the resin is 80 mol % or more based on all repeat units of the resin; and the first quencher is selected from benzotriazole or a derivative thereof.

First claim

What is claimed is:

1. A patterning process, comprising:
(i) forming a radiation-sensitive film on a substrate, wherein the radiation-sensitive film comprises: (a) a resin, (b) a photoacid generator, (c) a first quencher, and (d) a second quencher;
(ii) patternwise exposing the radiation-sensitive film to activating radiation; and
(iii) contacting the radiation-sensitive film with an alkaline developing solution to form a resist pattern;
wherein the resin comprises the following repeat units:

wherein: R 1 is selected from a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a cyano group or a trifluoromethyl group; Z is a non-hydrogen substituent that provides an acid-labile moiety; n is from 40 to 90 mol %; m is from 10 to 60 mol %; and the total combined content of the two repeat units in the resin is 80 mol % or more based on all repeat units of the resin;
the first quencher is selected from benzotriazole or a derivative thereof; and
the second quencher is selected from N,N-diethyldodecanamide, 2,8-dimethyl-6H,12H-5,11-methanodibenzo[b,f][1,5]diazocine, 1,1-dimethylethyl 4-hydroxypiperidine-1-carboxylate and N-allylcaprolactam.

2. The process of claim 1 , wherein the activating radiation has a wavelength of 365 nm.

3. The patterning process of claim 1 , further comprising depositing a metal on the substrate in regions defined by the resist pattern.

4. A process for depositing a metal on a metal layer, comprising the steps of:
(i) forming a radiation-sensitive film on a metal layer, wherein the film comprises: (a) a resin, (b) a photoacid generator, (c) a first quencher, and (d) a second quencher;
(ii) patternwise exposing the radiation-sensitive film to activating radiation; and
(iii) contacting the radiation-sensitive film with an alkaline developing solution to remove exposed portions of the radiation-sensitive film; and
(iv) immersing the metal layer in a metal plating solution and depositing a metal on the metal layer in the exposed portions of the radiation-sensitive film;
wherein the resin comprises the following two repeat units:

wherein: R 1 is selected from a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a cyano group or a trifluoromethyl group; Z is a non-hydrogen substituent that provides an acid-labile moiety; n is from 40 to 90 mol %; m is from 10 to 60 mol %; and the total combined content of the two repeat units in the resin is 80 mol % or more based on all repeat units of the resin;
the first quencher is selected from benzotriazole or a derivative thereof; and
the second quencher is selected from N,N-diethyldodecanamide, 2,8-dimethyl-6H,12H-5,11-methanodibenzo[b,f][1,5]diazocine, 1,1-dimethylethyl 4-hydroxypiperidine-1-carboxylate and N-allylcaprolactam.

5. The process of claim 4 , wherein the resin has a weight average molecular weight of from 10,000 to 30,000 Daltons.

6. The process of claim 4 , wherein the photoacid generator of the radiation-sensitive film is selected from one or more of N-hydroxynaphthalimide trifluoromethanesulfonate, N-hydroxynaphthalimide perfluoro-1-butanesulfonate, N-hydroxynaphthalimide camphor-10-sulfonate, N-hydroxynaphthalimide 2-trifluoromethylphenylsulfonate, N-hydroxy-5-norbornene-2,3-dicarboximide perfluoro-1-butanesulfonate, N-(trifluoromethylsulfonyloxy)phthalimide and N-hydroxysuccinimide perfluorobutanesulfonate.

7. The process of claim 4 , wherein the amount of the first quencher is from 0.001 to 1.0 wt % based on the weight of the resin.

8. The process of claim 4 , wherein the amount of the second quencher is from 0.001 to 1.0 wt % based on the weight of the resin.

9. The process of claim 4 , wherein the metal deposition is in the form of a pillar having a diameter of 200 microns or less and a height of 20 micron or more.

10. The process of claim 4 , wherein the metal layer comprises copper.

11. The process of claim 4 , wherein the activating radiation has a wavelength of 365 nm.

Assignees

• Rohm & Haas Elect Mat

Inventors

• Haga Mitsuru
• Kushida Shugaku
• Kainuma Kunio
• Cameron James F

Classifications

• H10P14/40

  of conductive or resistive materials · CPC title

• G03F7/0035

  Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface · CPC title

• G03F7/004 Primary

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

• C23C18/1689

  After-treatment · CPC title

• C23C18/1612

  through irradiation means · CPC title