Electron multiplier production method and electron multiplier

US10522334B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10522334-B2
Application numberUS-201716321552-A
CountryUS
Kind codeB2
Filing dateAug 3, 2017
Priority dateAug 31, 2016
Publication dateDec 31, 2019
Grant dateDec 31, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An electron multiplier production method including a main body portion, and a channel provided in the main body portion to open at one end surface and the other end surface of the main body portion and emits secondary electrons includes a first step of preparing a main body member including the one end surface and the other end surface, a communicating hole for the channel through which the one end surface and the other end surface communicate being provided in the main body member, a second step of forming the channel by forming a deposition layer including at least a resistive layer on an outer surface of the main body member and an inner surface of the communicating hole using an atomic layer deposition method, and a third step of forming the main body portion by removing the deposition layer formed on the outer surface of the main body member.

First claim

Opening claim text (preview).

The invention claimed is: 1. An electron multiplier production method including a main body portion, and a channel that is provided in the main body portion to open at one end surface and the other end surface of the main body portion and emits secondary electrons according to incident electrons, the method comprising: a first step of preparing a main body member including the one end surface and the other end surface, a communicating hole for the channel through which the one end surface and the other end surface communicate being provided in the main body member; a second step of forming the channel by forming a deposition layer including at least a resistive layer on an outer surface of the main body member and an inner surface of the communicating hole using an atomic layer deposition method; and a third step of forming the main body portion by removing the deposition layer formed on the outer surface of the main body member. 2. The electron multiplier production method according to claim 1 , wherein the second step includes forming the deposition layer including the resistive layer and a secondary electron multiplication layer stacked on the resistive layer. 3. The electron multiplier production method according to claim 2 , wherein the main body member is formed of an insulating material. 4. The electron multiplier production method according to claim 3 , wherein the third step includes removing the deposition layer through sandblasting. 5. The electron multiplier production method according to claim 4 , wherein the outer surface of the main body member includes the one end surface, the other end surface, and a side surface connecting the one end surface to the other end surface, and the third step includes removing the deposition layer formed on the side surface while maintaining the deposition layer formed on the one end surface and the other end surface. 6. The electron multiplier production method according to claim 3 , wherein the outer surface of the main body member includes the one end surface, the other end surface, and a side surface connecting the one end surface to the other end surface, and the third step includes removing the deposition layer formed on the side surface while maintaining the deposition layer formed on the one end surface and the other end surface. 7. The electron multiplier production method according to claim 2 , wherein the third step includes removing the deposition layer through sandblasting. 8. The electron multiplier production method according to claim 7 , wherein the outer surface of the main body member includes the one end surface, the other end surface, and a side surface connecting the one end surface to the other end surface, and the third step includes removing the deposition layer formed on the side surface while maintaining the deposition layer formed on the one end surface and the other end surface. 9. The electron multiplier production method according to claim 2 , wherein the outer surface of the main body member includes the one end surface, the other end surface, and a side surface connecting the one end surface to the other end surface, and the third step includes removing the deposition layer formed on the side surface while maintaining the deposition layer formed on the one end surface and the other end surface. 10. The electron multiplier production method according to claim 1 , wherein the main body member is formed of an insulating material. 11. The electron multiplier production method according to claim 10 , wherein the third step includes removing the deposition layer through sandblasting. 12. The electron multiplier production method according to claim 11 , wherein the outer surface of the main body member includes the one end surface, the other end surface, and a side surface connecting the one end surface to the other end surface, and the third step includes removing the deposition layer formed on the side surface while maintaining the deposition layer formed on the one end surface and the other end surface. 13. The electron multiplier production method according to claim 10 , wherein the outer surface of the main body member includes the one end surface, the other end surface, and a side surface connecting the one end surface to the other end surface, and the third step includes removing the deposition layer formed on the side surface while maintaining the deposition layer formed on the one end surface and the other end surface. 14. The electron multiplier production method according to claim 1 , wherein the third step includes removing the deposition layer through sandblasting. 15. The electron multiplier production method according to claim 14 , wherein the outer surface of the main body member includes the one end surface, the other end surface, and a side surface connecting the one end surface to the other end surface, and the third step includes removing the deposition layer formed on the side surface while maintaining the deposition layer formed on the one end surface and the other end surface. 16. The electron multiplier production method according to claim 1 , wherein the outer surface of the main body member includes the one end surface, the other end surface, and a side surface connecting the one end surface to the other end surface, and the third step includes removing the deposition layer formed on the side surface while maintaining the deposition layer formed on the one end surface and the other end surface. 17. The electron multiplier production method according to claim 1 , further comprising a fourth step of thermally connecting a heat sink to the outer surface of the main body portion after the third step. 18. The electron multiplier production method according to claim 17 , wherein the heat sink is formed of a metal, and the fourth step includes bringing the heat sink into contact with the outer surface. 19. An electron multiplier comprising: a main body portion including one end surface, the other end surface, and a side surface connecting the one end surface to the other end surface; and a channel provided in the main body portion to be open at the one end surface and the other end surface, wherein the channel includes a deposition layer including a resistive layer and a secondary electron multiplication layer formed on an inner surface of a communicating hole for the channel, the deposition layer is formed on the one end surface and the other end surface, the side surface is exposed at least from the resistive layer, and the deposition layer is formed using an atomic layer deposition method. 20. The electron multiplier according to claim 19 , wherein the secondary electron multiplication layer is formed on the side surface. 21. The electron multiplier according to claim 19 , wherein a heat sink is in contact with the side surface.

Assignees

Inventors

Classifications

  • Dynodes consisting of sheet material, e.g. plane, bent · CPC title

  • Dynodes having potential gradient along their surfaces · CPC title

  • Secondary-electron-emitting electrodes (H01J1/35 takes precedence) · CPC title

  • H01J1/34Primary

    Photo-emissive cathodes (H01J1/35 takes precedence) · CPC title

  • of secondary emission electrodes · CPC title

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What does patent US10522334B2 cover?
An electron multiplier production method including a main body portion, and a channel provided in the main body portion to open at one end surface and the other end surface of the main body portion and emits secondary electrons includes a first step of preparing a main body member including the one end surface and the other end surface, a communicating hole for the channel through which the one…
Who is the assignee on this patent?
Hamamatsu Photonics Kk
What technology area does this patent fall under?
Primary CPC classification H01J1/34. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 31 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).