Microchannel plate and electron multiplier

Patent metadata

Field	Value
Publication number	US-10340129-B2
Application number	US-201615756217-A
Country	US
Kind code	B2
Filing date	Aug 9, 2016
Priority date	Sep 4, 2015
Publication date	Jul 2, 2019
Grant date	Jul 2, 2019

Abstract

A microchannel plate is provided with a substrate including a front surface, a rear surface, and a side surface, a plurality of channels penetrating from the front surface to the rear surface of the substrate, a first film provided on at least an inner wall surface of the channel, a second film provided on the first film, and electrode layers provided on the front surface and the rear surface of the substrate. The first film is made of Al 2 O 3 . The second film is made of SiO 2 . The first film is thicker than the second film.

First claim

The invention claimed is:

1. A microchannel plate comprising:
a substrate including a front surface, a rear surface, and a side surface;
a plurality of channels penetrating from the front surface to the rear surface of the substrate;
a first film provided on at least an inner wall surface of the channel;
a second film provided on the first film; and
electrode layers provided on the front surface and the rear surface of the substrate,
wherein the first film is made of Al 2 O 3 ,
the second film is made of SiO 2 , and
the first film is thicker than the second film.

2. The microchannel plate according to claim 1 , wherein a thickness of the first film is 10 angstroms or more when being calculated using X-ray fluorescence analysis.

3. The microchannel plate according to claim 1 ,
wherein the substrate is made of an insulating material, and
a resistance film is formed between the inner wall surface of the channel and the first film.

4. The microchannel plate according to claim 1 , wherein the substrate is made of a resistant material.

5. The microchannel plate according to claim 1 ,
wherein the first film and the second film are formed on the front surface, the rear surface, and the side surface of the substrate, and
the electrode layers are formed on the second film.

6. The microchannel plate according to claim 1 ,
wherein the electrode layers are formed so as to be in contact with the front surface and the rear surface of the substrate, and
the first film and the second film are formed on the electrode layers, and the front surface, the rear surface, and the side surface of the substrate.

7. The microchannel plate according to claim 3 ,
wherein the resistance film, the first film, and the second film are formed on the front surface, the rear surface, and the side surface of the substrate, and
the electrode layers are formed on the second film.

8. The microchannel plate according to claim 3 ,
wherein the electrode layers are formed so as to be in contact with the front surface and the rear surface of the substrate, and
the resistance film, the first film, and the second film are formed on the front surface, the rear surface, and the side surface of the substrate.

9. The microchannel plate according to claim 1 ,
wherein the first film and the second film are layers formed by atomic layer deposition.

10. The microchannel plate according to claim 1 , wherein the second film is an outermost film.

11. An electron multiplier comprising:
a main body including a front surface, a rear surface, and a side surface;
a channel penetrating from the front surface to the rear surface of the main body;
a first film provided on at least an inner wall surface of the channel;
a second film provided on the first film; and
electrode layers provided on the front surface and the rear surface of the main body,
wherein the first film is made of Al 2 O 3 ,
the second film is made of SiO 2 , and
the first film is thicker than the second film.

12. The electron multiplier according to claim 11 , wherein a thickness of the first film is 10 angstroms or more when being calculated using X-ray fluorescence analysis.

13. The electron multiplier according to claim 11 ,
wherein the main body is made of an insulating material, and
a resistance film is formed between the inner wall surface of the channel and the first film.

14. The electron multiplier according to claim 11 , wherein the main body is made of a resistant material.

15. The electron multiplier according to claim 11 ,
wherein the first film and the second film are formed on the front surface, the rear surface, and the side surface of the main body, and
the electrode layers are formed on the second film.

16. The electron multiplier according to claim 11 ,
wherein the electrode layers are formed so as to be in contact with the front surface and the rear surface of the main body, and
the first film and the second film are formed on the electrode layers, and the front surface, the rear surface, and the side surface of the main body.

17. The electron multiplier according to claim 13 ,
wherein the resistance film, the first film, and the second film are formed on the front surface, the rear surface, and the side surface of the main body, and
the electrode layers are formed on the second film.

18. The electron multiplier according to claim 13 ,
wherein the electrode layers are formed so as to be in contact with the front surface and the rear surface of the main body, and
the resistance film, the first film, and the second film are formed on the front surface, the rear surface, and the side surface of the main body.

19. The electron multiplier according to claim 11 , wherein the first film and the second film are layers formed by atomic layer deposition.

20. The electron multiplier according to claim 11 , wherein the second film is an outermost film.

Assignees

• Hamamatsu Photonics Kk

Inventors

• Nagata Takaaki
• Hamana Yasumasa
• Nishimura Hajime
• Nakamura Kimitsugu

Classifications

• H01J9/12

  of photo-emissive cathodes; of secondary-emission electrodes · CPC title

• H01J43/246 Primary

  Microchannel plates [MCP] (image amplification tubes using MCP H01J31/507) · CPC title

• H01J43/24

  Dynodes having potential gradient along their surfaces · CPC title

• H01J9/125

  of secondary emission electrodes · CPC title

• H01J2201/32

  Secondary emission electrodes · CPC title