Manufacturing method of display panel and wire-grating polarizer and manufacturing method thereof

Patent metadata

Field	Value
Publication number	US-10509258-B2
Application number	US-201715541334-A
Country	US
Kind code	B2
Filing date	May 12, 2017
Priority date	Mar 9, 2017
Publication date	Dec 17, 2019
Grant date	Dec 17, 2019

Abstract

A manufacturing method of a display panel includes: arranging a plurality of wire-grating structures at intervals on a first substrate, wherein a plurality of transparent zones of the first substrate are defined among the plurality of wire-grating structures; adopting the wire-grating structure as a mask plate to form a black matrix on the transparent zone; providing a second substrate and a liquid crystal layer; and arranging the first substrate, the second substrate, and the liquid crystal layer to form the display panel. The present disclosure can save cost and simplifies processes.

First claim

What is claimed is:

1. A manufacturing method of a display panel, comprising:
arranging a plurality of wire-grating structures at intervals on a first substrate, wherein a plurality of transparent zones of the first substrate are defined among the plurality of wire-grating structures;
adopting the wire-grating structure as a mask plate to form a black matrix on the transparent zone;
providing a second substrate and a liquid crystal layer;
arranging the first substrate, the second substrate, and the liquid crystal layer to form the display panel,
wherein a step of arranging the plurality of wire-grating structures at intervals on the first substrate comprises:
forming a wire-grating material layer on the first substrate;
coating a photoresist material on the wire-grating material layer to form a photoresist layer;
imprinting the photoresist layer to expose a portion of the wire-grating material layer;
etching the exposed portion of the wire-grating material layer; and
removing the photoresist layer,
wherein the wire-grating structure comprises a plurality of wire gratings; the plurality of wire gratings are arranged at intervals; an interval of between the wire-grating structures ranges from 50 micrometers (μm) to 1000 μm; an interval between two wire gratings ranges from 50 nanometers (nm) to 1000 nm.

2. The manufacturing method of claim 1 , wherein a step of imprinting the photoresist layer to expose a portion of the wire-grating material layer comprises:
imprinting the photoresist layer by applying nano-imprint lithography.

3. The manufacturing method of claim 2 , wherein a step of imprinting the photoresist layer by applying the nano-imprint lithography comprises:
heating the photoresist layer;
imprinting the photoresist layer with a nano-imprint mold;
removing the nano-imprint mold from the photoresist layer;
etching and removing the photoresist material on a recess of the imprinted photoresist layer to expose the portion of the wire-grating material layer.

4. The manufacturing method of claim 1 , wherein a width of the wire grating ranges from 50 nm to 200 nm; a height of the wire grating ranges from 50 nm to 500 nm; a cycle of the wire grating ranges from 100 nm to 300 nm.

5. The manufacturing method of claim 1 , wherein a step of adopting the wire-grating structure as the mask plate to form the black matrix on the transparent zone comprises:
forming a black matrix material layer on the wire-grating structure and the transparent zone;
illuminating one side of the first substrate away from the wire-grating structure to solidify the black matrix material distributed on the transparent zone;
removing the black matrix material distributed on the wire-grating structure where light is blocked.

6. A manufacturing method of a display panel, comprising:
arranging a plurality of wire-grating structures at intervals on a first substrate, wherein a plurality of transparent zones of the first substrate are defined among the plurality of wire-grating structures;
adopting the wire-grating structure as a mask plate to form a black matrix on the transparent zone;
providing a second substrate and a liquid crystal layer;
arranging the first substrate, the second substrate, and the liquid crystal layer to form the display panel;
wherein the wire-grating structure comprises a plurality of wire gratings; the plurality of wire gratings are arranged at intervals; an interval of between the wire-grating structures ranges from 50 micrometers (μm) to 1000 μm; an interval between two wire gratings ranges from 50 nanometers (nm) to 1000 nm.

7. The manufacturing method of claim 6 , wherein a step of arranging the plurality of wire-grating structures at intervals on the first substrate comprises:
forming a wire-grating material layer on the first substrate;
coating a photoresist material on the wire-grating material layer to form a photoresist layer;
imprinting the photoresist layer to expose a portion of the wire-grating material layer;
etching the exposed portion of the wire-grating material layer; and
removing the photoresist layer.

8. The manufacturing method of claim 7 , wherein a step of imprinting the photoresist layer to expose a portion of the wire-grating material layer comprises:
imprinting the photoresist layer by applying nano-imprint lithography.

9. The manufacturing method of claim 8 , wherein a step of imprinting the photoresist layer by applying the nano-imprint lithography comprises:
heating the photoresist layer;
imprinting the photoresist layer with a nano-imprint mold;
removing the nano-imprint mold from the photoresist layer;
etching and removing the photoresist material on a recess of the imprinted photoresist layer to expose the portion of the wire-grating material layer.

10. The manufacturing method of claim 6 , wherein a width of the wire grating ranges from 50 nm to 200 nm; a height of the wire grating ranges from 50 nm to 500 nm; a cycle of the wire grating ranges from 100 nm to 300 nm.

11. The manufacturing method of claim 6 , wherein a step of adopting the wire-grating structure as the mask plate to form the black matrix on the transparent zone comprises:
forming a black matrix material layer on the wire-grating structure and the transparent zone;
illuminating one side of the first substrate away from the wire-grating structure to solidify the black matrix material distributed on the transparent zone;
removing the black matrix material distributed on the wire-grating structure where light is blocked.

Assignees

• Shenzhen China Star Optoelect

Inventors

• Li Minghui
• Chen Hsiao Hsien
• Chen Lixuan

Classifications

• G02B5/3058

  comprising electrically conductive elements, e.g. wire grids, conductive particles · CPC title

• G02F1/133512

  Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title

• G02F1/133528 Primary

  Polarisers · CPC title

• G02F1/133516

  Methods for their manufacture, e.g. printing, electro-deposition or photolithography · CPC title

• G02F1/1333 Primary

  Constructional arrangements; {Manufacturing methods}(G02F1/135, G02F1/136 take precedence) · CPC title