Display Substrate

Patent metadata

Field	Value
Publication number	US-2017261806-A1
Application number	US-201615126020-A
Country	US
Kind code	A1
Filing date	Jan 29, 2016
Priority date	Aug 25, 2015
Publication date	Sep 14, 2017
Grant date	—

Abstract

Disclosed is a display substrate, which includes a base substrate and a polarization layer, wherein the polarization layer includes grid polarizer (GPs) and light-shielding matrixes arranged in a same layer and made from a same material. The display substrate simplifies the production process, reduces the cost and reduces the thickness of a liquid crystal display (LCD) device.

First claim

1 . A display substrate, comprising a base substrate and a polarization layer, wherein
the polarization layer comprises grid polarizers (GPs) and light-shielding matrixes arranged in a same layer and made from a same material.

2 . The display substrate according to claim 1 , wherein the display substrate is a color filter (CF) substrate; and the CF substrate further comprises a quantum dot layer and a planarization layer disposed between the quantum dot layer and the polarization layer.

3 . The display substrate according to claim 1 , wherein the display substrate is an array substrate, and the array substrate further comprises thin-film transistors (TFTs) arranged in an array.

4 . The display substrate according to claim 1 , wherein the GPs and the light-shielding matrixes in the polarization layer are made from a same metallic material.

5 . The display substrate according to claim 4 , wherein the metallic material is any one selected from the group consisting of: Al, Cu, Au, Ag and Cr.

6 . The display substrate according to claim 2 , wherein the planarization layer is made from a resin material containing polar bonds.

7 . The display substrate according to claim 6 , wherein the polar bonds are selected from the group consisting of: hydroxyls, carboxyls, carbonyls, ether bonds, isocyanate groups and urethanos.

8 . The display substrate according to claim 7 , wherein the resin material containing the polar bonds is any one selected from the group consisting of: epoxy resins, phenolic resins, urea resins, acrylic resins, polyvinyl alcohol, polyurethane, rubber, vinyl acetate and copolymers thereof, polystyrene and copolymers thereof, organo-silicon compounds and epoxy phenolic resins.

9 . The display substrate according to claim 2 , wherein an adhesive layer is disposed between the polarization layer and the planarization layer.

10 . The display substrate according to claim 9 , wherein a material of the adhesive layer includes at least one of indium tin oxide (ITO) and indium zinc oxide (IZO).

11 . The display substrate according to claim 2 , wherein a material of the quantum dot layer is any one selected from the group consisting of: CdS, CdSe, CdTe, ZnO, ZnS, ZnSe, ZnTe, GaAs, GaP, GaSb, HgS, HgSe, HgTe, InAs, InP, InSb, AlAs, AlP, CuInS, CuInSe and AlSb.

12 . The display substrate according to claim 2 , further comprising: spacers, wherein the spacers are arranged on one side of the display substrate opposite to the base substrate.

13 . The display substrate according to claim 2 , wherein the quantum dot layer includes a plurality of quantum dot CF units.

14 . A liquid crystal display (LCD) device, comprising the display substrate according to claim 1 .

15 . A method for manufacturing a display substrate, comprising:
providing a base substrate and depositing a metal film on the base substrate; and processing the metal film to form grid polarizers (GPs) and light-shielding matrixes.

16 . The method according to claim 15 , comprising:
providing the base substrate; forming a patterned quantum dot layer on the base substrate; forming a planarization layer on the patterned quantum dot layer; depositing the metal film on the planarization layer; and processing the metal film to form the GPs and light-shielding matrixes.

17 . The method according to claim 15 , wherein processing the metal film to form the GPs and the light-shielding matrixes includes:
coating photoresist on the metal film; impressing a mask on the photoresist to form a structure corresponding to the GPs and the light-shielding matrixes; demoulding and removing residual photoresist, and exposing the metal film; and etching the metal film and to form the GPs and the light-shielding matrixes.

18 . (canceled)

19 . The method according to claim 15 , wherein a material of the metal film is selected from the group consisting of Al, Cu, Au, Ag and Cr.

20 . The method according to claim 16 , after forming the planarization layer on the patterned quantum dot layer and before depositing the metal film, further comprising:
forming an adhesive layer and depositing the metal film on the adhesive layer.

21 . The method according to claim 20 , wherein a material of the adhesive layer is selected from ITO or IZO.

Assignees

• Boe Technology Group Co Ltd

Inventors

• Niu Jing
• Qi Yonglian
• Sun Shuang
• Zhang Fangzhen

Classifications

• G02B5/3058

  comprising electrically conductive elements, e.g. wire grids, conductive particles · CPC title

• G02F2001/133357

  Physics · mapped topic

• G03F7/2043

  with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists · CPC title

• G02F1/136209

  Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element · CPC title

• G02F1/1368

  in which the switching element is a three-electrode device {(G02F1/136277 takes precedence)} · CPC title