Evaluating an object

Patent metadata

Field	Value
Publication number	US-10504693-B2
Application number	US-201816131289-A
Country	US
Kind code	B2
Filing date	Sep 14, 2018
Priority date	Sep 18, 2017
Publication date	Dec 10, 2019
Grant date	Dec 10, 2019

Abstract

A method for evaluating an object, the method may include acquiring, by a charged particle beam system, an image of an area of a reference object, wherein the area includes multiple instances of a structure of interest, and the structure of interest is of a nanometric scale; determining multiple types of attributes from the image; reducing a number of the attributes to provide reduced attribute information; generating guidelines, based on the reduced attribute information and on reference data, for evaluating the reduced attribute information; and evaluating an actual object by implementing the guidelines.

First claim

We claim:

1. A method for evaluating an object, the method comprising:
acquiring, by a charged particle beam system, an image of an area of a reference object, wherein the area comprises multiple instances of a structure of interest, and the structure of interest is of a nanometric scale;
determining multiple types of attributes from the image;
reducing a number of the attributes to provide reduced attribute information;
generating guidelines, based on the reduced attribute information and on reference data, for evaluating the reduced attribute information; and
evaluating an actual object by implementing the guidelines.

2. The method according to claim 1 , wherein a resolution of the image is at least one hundred times finer than a resolution of the reference data.

3. The method according to claim 1 , wherein the image is a backscattered electron image of nanometric scale resolution.

4. The method according to claim 3 , wherein acquiring the image comprises collecting backscattered electrons by a backscattered electron detector that has a radial angular coverage range of tens of degrees.

5. The method according to claim 4 , wherein acquiring the image comprises rejecting secondary electrons by an energy filter that precedes the backscattered electron detector.

6. The method according to claim 1 , wherein the multiple instances of the structure of interest are positioned in recesses having an aspect ratio that exceeds ten, and wherein acquiring the image comprises scanning the area with a charged particle beam having a focal plane at a height related to a height of the multiple instances of the structure of interest.

7. The method according to claim 1 , wherein generating the guidelines comprises training a neural network to output data that approximates the reference data when fed with the reduced attribute information.

8. The method according to claim 1 , wherein reducing the number of attributes comprises utilizing a neural network.

9. The method according to claim 1 , wherein reducing the number of attributes comprises training a neural network to output data that approximates the reference data regarding a reference object when fed with the reduced attribute information about the reference object, while attempting to reduce the number of attributes that are taken into account during an approximation of the reference data.

10. The method according to claim 9 , wherein training the neural network comprises calculating a cost function related to the number of attributes of the reduced attribute information that are taken into account during the approximation of the reference data.

11. A nontransitory computer program product that stores instructions for evaluating an object, the instructions comprising the steps of:
acquiring an image of an area of a reference object; wherein the area comprises multiple instances of a structure of interest, and the structure of interest is of a nanometric scale;
determining multiple types of attributes from the image;
reducing a number of the attributes to provide reduced attribute information;
generating guidelines, based on the reduced attribute information and on reference data, for evaluating the reduced attribute information; and
evaluating an actual object by implementing the guidelines.

12. A method for measuring depths and/or heights of structures on a substrate, the method comprising:
acquiring, by a charged particle beam system, a backscattered electron image of an area of a reference object, wherein the area comprises multiple instances of a structure of interest, the structure of interest is positioned in a recess having an aspect ratio that exceeds ten, and the structure of interest is of a nanometric scale;
determining multiple types of attributes from the image;
reducing a number of the attributes to provide reduced attribute information;
generating guidelines, based on the reduced attribute information and on reference data, for evaluating the reduced attribute information, wherein generating the guidelines includes training a neural network to output data that approximates the reference data when fed with the reduced attribute information; and
evaluating an actual object by implementing the guidelines.

13. The method according to claim 12 , wherein a resolution of the image is at least one hundred times finer than a resolution of the reference data.

14. The method according to claim 12 , wherein acquiring the backscattered electron image includes collecting backscattered electrons by a backscattered electron detector that has a radial angular coverage range of tens of degrees.

15. The method according to claim 14 , wherein acquiring the backscattered electron image includes rejecting secondary electrons using an energy filter that precedes the backscattered electron detector.

Assignees

• Applied Materials Israel Ltd

Inventors

• Attal Shay
• Cohen Shaul
• Maoz Guy
• Zac Noam
• Baram Mor
• Moldovan Lee
• Schwarzband Ishai
• KATZIR Ron
• Ben-Zikri Kfir
• Girmonsky Doron

Classifications

• H01J2237/24475

  Scattered electron detectors · CPC title

• H01J37/222

  Image processing arrangements associated with the tube · CPC title

• H01J2237/24578

  Spatial variables, e.g. position, distance · CPC title

• G01B15/02

  for measuring thickness · CPC title

• H01J37/29

  Reflection microscopes · CPC title