Plasma erosion resistant rare-earth oxide based thin film coatings

Patent metadata

Field	Value
Publication number	US-10501843-B2
Application number	US-201715814601-A
Country	US
Kind code	B2
Filing date	Nov 16, 2017
Priority date	Jun 20, 2013
Publication date	Dec 10, 2019
Grant date	Dec 10, 2019

Abstract

An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Y4Al2O9, Er2O3, Gd2O3, Er3Al5O12, Gd3Al5O12 and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

First claim

What is claimed is:

1. A method of manufacturing an article comprising:
performing at least one of ion assisted deposition (IAD) or physical vapor deposition (PVD) to deposit a first protective layer on at least one surface of an article, wherein the first protective layer is a thin film that comprises a first ceramic selected from a group consisting of:
Y 3 Al 5 O 12 having at least two of a volume resistivity of 11.3E16 Ω·cm +/−up to 30%, a dielectric constant of 9.76 +/− up to 30%, a thermal conductivity of 20.1 W/m·K +/− up to 30%, a hardness of 8.5 Gpa +/− up to 30%, or a hermiticity of 4.4E-10 cm 3 /s +/− up to 30%,
Er 2 O 3 having a hardness of 5 Gpa +/− up to 30%,
Er 3 Al 5 O 12 having a hardness of 9 Gpa +/− up to 30%, and
a ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 —ZrO 2 , the ceramic compound having at least one of a dielectric constant of 9.83 +/− up to 30%, a thermal conductivity of 19.9 W/m·K +/− up to 30%, or a hermiticity of 1.2E-9 cm 3 /s +/− up to 30%.

2. The method of claim 1 , wherein the first protective layer comprises Er 2 O 3 , the first protective layer further having at least one of a dielectric constant of 9.67 +/− up to 30%, a thermal conductivity of 19.4 W/m·K +/− up to 30%, or a hermiticity of 5.5E-9 cm 3 /s +/− up to 30%.

3. The method of claim 1 , wherein the first protective layer comprises Er 3 Al 5 O 12 , the first protective layer further having at least one of a dielectric constant of 9.54 +/− up to 30%, a thermal conductivity of 19.2 W/m·K +/− up to 30%, or a hermiticity of 9.5E-10 cm 3 /s +/− up to 30%.

4. The method of claim 1 , wherein:
the article comprises a chamber component selected from a group consisting of a chamber lid, a nozzle, a showerhead base, a showerhead gas distribution plate (GDP), a chamber viewport, a process kit ring, a shield, a plasma screen, a flow equalizer, a chamber wall, and a liner kit; and
the article comprises at least one of Al 2 O 3 , AlN, Al, anodized Al, Titanium, stainless steel, quartz, sapphire, Si, or SiC.

5. The method of claim 1 , further comprising:
performing at least one of IAD or PVD to deposit a second protective layer on at least a portion of the first protective layer, wherein the second protective layer is a thin film that comprises a second ceramic different from the first ceramic, the second ceramic selected from a group consisting of: Y 3 Al 5 O 12 , Y 4 Al 2 O 9 , Er 2 O 3 , Gd 2 O 3 , Er 3 Al 5 O 12 , Gd 3 Al 5 O 12 , and the ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 —ZrO 2 .

6. The method of claim 5 , wherein:
the first protective layer has an amorphous structure and comprises Y 3 Al 5 O 12 or Er 3 Al 5 O 12 ; and
the second protective layer has a crystalline or nano-crystalline structure and comprises Er 2 O 3 , Gd 2 O 3 , or the ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 —ZrO 2 .

7. The method of claim 5 , wherein the article has a first coefficient of thermal expansion value, the first protective layer has a second coefficient of thermal expansion value, and the second protective layer has a third coefficient of thermal expansion value, wherein the second coefficient of thermal expansion value is between the first coefficient of thermal expansion value and the third coefficient of thermal expansion value.

8. The method of claim 5 , further comprising:
prior to depositing the first protective layer on the article, performing a thermal spraying process to deposit an additional protective layer on the at least one surface of the article, wherein the additional protective layer is a thick film that comprises a second ceramic selected from a group consisting of Y 3 Al 5 O 12 , Y 4 Al 2 O 9 , Y 2 O 3 , and the ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 —ZrO 2 , wherein the first protective layer covers at least a portion of the additional protective layer.

9. The method of claim 1 , further comprising:
forming features in the first protective layer by masking the article and performing at least one of thin-film deposition or etching of specific areas that are not masked after performing at least one of the IAD or the PVD.

10. The method of claim 1 , wherein a first roughness of the first protective layer is approximately the same as a second roughness of the article, and wherein the first protective layer has a thickness of less than approximately 20 microns.

11. The method of claim 1 , wherein the first ceramic is the Y 3 Al 5 O 12 , and wherein the Y 3 Al 5 O 12 has an amorphous structure and an erosion rate of about 1 nm/hr +/− up to 30% when exposed to a CH 4 /Cl 2 plasma chemistry.

12. The method of claim 1 , wherein the first ceramic is the Er 3 Al 5 O 12 , and wherein the Er 3 Al 5 O 12 has an amorphous structure and an erosion rate of about 70 nm/hr +/− up to 30% when exposed to a H 2 /NF 3 plasma chemistry.

13. The method of claim 1 , wherein the first ceramic is the ceramic compound comprising the Y 4 Al 2 O 9 and the solid-solution of Y 2 O 3 —ZrO 2 , and wherein the ceramic compound comprising the Y 4 Al 2 O 9 and the solid-solution of Y 2 O 3 —ZrO 2 further has an amorphous structure and an erosion rate of about 3 nm/hr +/− up to 30% when exposed to a CH 4 /Cl 2 plasma chemistry.

14. The method of claim 1 , wherein the first ceramic is Y 3 Al 5 O 12 , and wherein the first ceramic has a hardness of 8.5 GPa +/− up to 30%, a dielectric constant of 9.76 +/− up to 30%, a volume resistivity of 11.3E16 Ω·cm +/−up to 30%, and a thermal conductivity of 20.1 W/m·K +/− up to 30% 10%.

15. The method of claim 1 , wherein the first ceramic is the Er 2 O 3 , and wherein the first ceramic has a hardness of 5 GPa +/− up to 30%, a dielectric constant of 9.67 +/− up to 30%, and a thermal conductivity of 19.4 W/m·K +/− up to 30%.

16. The method of claim 1 , wherein the first ceramic is the Er 3 Al 5 O 12 , and wherein the first ceramic has a hardness of 9 GPa +/− up to 30%, a dielectric constant of 9.54 +/− up to 30%, and a thermal conductivity of 19.2 W/m·K +/− up to 30%.

17. The method of claim 1 , wherein the first ceramic is the ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 —ZrO 2 , and wherein the first ceramic has a hardness of 7.8 GPa +/− up to 30%, a dielectric constant of 9.83 +/− up to 30%, a volume resistivity of 4.1E16 Ω·cm +/− up to 30%, and a thermal conductivity of 19.9 W/m·K +/− up to 30%.

18. A method of manufacturing an article comprising:
performing at least one of ion assisted deposition (IAD) or physical vapor deposition (PVD) to deposit a first protective layer on at least one surface of an article, wherein the first protective layer is a thin film that comprises a first ceramic selected from a group consisting of:
Y 3 Al 5 O 12 having at least two of a volume resistivity of 11.3E16 Ω·cm +/−up to 30%, a dielectric constant of 9.76 +/− up to 30%, a thermal conductivity of 20.1 W/m·K +/− up to 30%, a hardness of 8.5 Gpa +/− up to 30%, or a hermiticity of 4.4E-10 cm 3 /s +/− up to 30%,
Er 2 O 3 having a hardness of 5 Gpa +/− up to 30%,
Er 3 Al 5 O 12 having a hardness of 9 Gpa +/− up to 30%, and
a ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 —ZrO 2 , the ceramic compound having at least two of a volume resistivity of 4.1E16 Ω·cm +/− up to 30%, a dielectric constant of 9.83 +/− up to 30%, a thermal conductivity of 19.9 W/m·K +/− up to 30%, a hardness of 7.8 Gpa +/− up to 30%, or a hermiticity of 1.2E-9 cm 3 /s +/− up to 30%; and
forming a plurality

Assignees

• Applied Materials Inc

Inventors

• Sun Jennifer Y
• Kanungo Biraja P
• Firouzdor Vahid
• Cho Tom

Classifications

• C23C14/22

  characterised by the process of coating · CPC title

• C23C14/083

  of refractory metals or yttrium · CPC title

• Y10T428/265

  1 mil or less · CPC title

• Y10T428/24355

  Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.] · CPC title

• Y10T428/24975

  No layer or component greater than 5 mils thick · CPC title