Transparent conductive laminate, transparent electrode including transparent conductive laminate, and method for manufacturing transparent conductive laminate
US-9750131-B2 · Aug 29, 2017 · US
US10490317B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10490317-B2 |
| Application number | US-201615559247-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 13, 2016 |
| Priority date | May 15, 2015 |
| Publication date | Nov 26, 2019 |
| Grant date | Nov 26, 2019 |
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The present specification relates to a conductive laminate and a transparent electrode including the same.
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The invention claimed is: 1. A conductive laminate comprising: a first metal oxide layer; a metal layer provided on the first metal oxide layer; and a second metal oxide layer provided on the metal layer, wherein the metal layer includes a silver-aluminum alloy, the Al atom content of the metal layer is more than 1% and 10% or less with respect to Ag atoms of the metal layer, and a light transmittance of the conductive laminate is 80% or more in light having a wavelength of 550 nm, wherein R/R 0 of the conductive laminate is 1.2 or less, the R 0 is an initial surface resistance value of the conductive laminate, and R is a surface resistance value of the conductive laminate after 312 hours elapse at an atmosphere of 85° C. and 85 RH %, wherein the first metal oxide is Nb oxide, and wherein the second metal oxide is Ga-doped zinc oxide. 2. The conductive laminate of claim 1 , wherein the thickness of the metal layer is 5 nm or more and 20 nm or less. 3. The conductive laminate of claim 1 , wherein the second metal oxide layer is doped with aluminum. 4. The conductive laminate of claim 3 , wherein the concentration of the doped aluminum is 0.1 wt % or more and 10 wt % or less with respect to the second metal oxide layer. 5. The conductive laminate of claim 1 , wherein the thickness of the first metal oxide layer and the thickness of the second metal oxide layer are 20 nm or more and 80 nm or less, respectively. 6. The conductive laminate of claim 1 , wherein refractive indexes of the first metal oxide layer and the second metal oxide layer are 1.2 or more and 3 or less in the light having a wavelength of 550 nm, respectively. 7. The conductive laminate of claim 1 , further comprising: a transparent supporter, wherein the first metal oxide layer is provided on the transparent supporter. 8. The conductive laminate of claim 1 , wherein H/H 0 of the conductive laminate is 14 or less, the H 0 is an initial haze value of the conductive laminate, and H is a haze value of the conductive laminate after 312 hours elapse at an atmosphere of 85° C. and 85 RH %. 9. The conductive laminate of claim 1 , wherein a surface resistance value of the conductive laminate is 20 Ω/sq or less. 10. The conductive laminate of claim 1 , wherein a haze value of the conductive laminate is 1 or less. 11. The conductive laminate of claim 1 , wherein the entire thickness of the conductive laminate is 50 nm or more and 300 nm or less. 12. A transparent electrode comprising the conductive laminate of claim 1 . 13. An electronic device comprising the transparent electrode of claim 12 .
mainly consisting of metals or alloys · CPC title
Alloys based on aluminium · CPC title
Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal · CPC title
oxides · CPC title
Details · CPC title
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