Atomic layer deposition chamber with counter-flow multi inject

Patent metadata

Field	Value
Publication number	US-10487399-B2
Application number	US-201514752275-A
Country	US
Kind code	B2
Filing date	Jun 26, 2015
Priority date	Jun 26, 2014
Publication date	Nov 26, 2019
Grant date	Nov 26, 2019

Abstract

A chamber lid assembly includes: a central channel having an upper portion and a lower portion and extending along a central axis; a housing at least partially defining a first and a second annular channel, each fluidly coupled to the central channel; a first plurality of apertures disposed along a horizontal plane through the housing to provide a multi-aperture inlet between the first annular channel and the central channel; a second plurality of apertures disposed along a horizontal plane through the housing to provide a multi-aperture inlet between the second annular channel and the central channel, wherein the first and the second plurality of apertures are angled differently with respect to the central axis so as to induce opposing rotational flow of gases about the central axis; and a tapered bottom surface extending from the lower portion of the central channel to a peripheral portion of the chamber lid assembly.

First claim

What is claimed is:

1. A chamber lid assembly for chemical deposition comprising:
a central channel having circular cross-section and having an upper portion and a lower portion and extending along a central axis;
a housing having an inner region and at least partially defining a first annular channel and a second annular channel, wherein the first and second annular channels are fluidly coupled to the central channel;
an insert disposed within the inner region of the housing;
a first plurality of apertures disposed along a first horizontal plane through the insert to provide a multi-aperture inlet between the first annular channel and the central channel, wherein each aperture of the first plurality of apertures is angled with respect to the central axis so as to induce a rotational flow of a gas about the central axis in a first rotational direction;
a second plurality of apertures disposed along a second horizontal plane through the insert to provide a multi-aperture inlet between the second annular channel and the central channel, wherein each aperture of the second plurality of apertures is angled with respect to the central axis so as to induce a conflicting rotational flow of a gas about the central axis in a second rotational direction opposite the first rotational direction, wherein the assembly is configured to provide for turbulent gas flow in the central channel due to the conflicting rotational flow; and
a tapered bottom surface extending from the lower portion of the central channel to a peripheral portion of the chamber lid assembly.

2. The chamber lid assembly of claim 1 , wherein each of the first and second annular channels is coupled with a fluid delivery line and each fluid delivery line is coupled with one or more fluid sources.

3. The chamber lid assembly of claim 1 , wherein the first and second pluralities of apertures each comprise between 2 and 10 apertures.

4. The chamber lid assembly of claim 1 , wherein each aperture in the first plurality of apertures is disposed at an angle of up to about 60° in the first horizontal plane with respect to the central channel and is disposed at an angle of about 0° to about 60° from the first horizontal plane, and wherein each aperture in the second plurality of apertures is disposed at an opposing angle of up to about 60° in the second horizontal plane with respect to the central channel and is disposed at an angle of about 0° to about 60° from the second horizontal plane.

5. The chamber lid assembly of claim 1 , wherein each aperture of the first and second pluralities of apertures comprises a rectangular shape, a cylindrical tube, or a tear drop shape.

6. The chamber lid assembly of claim 1 , wherein the housing at least partially defines a third annular channel fluidly coupled to the central channel, further comprising:
a third plurality of apertures disposed along a third horizontal plane through the insert to provide a multi-aperture inlet between the third annular channel and the central channel, wherein each aperture of the third plurality of apertures is angled with respect to the central axis so as to induce a rotational flow of a gas about the central axis in a third rotational direction.

7. The chamber lid assembly of claim 6 , wherein the second plurality of apertures is disposed between the first plurality of apertures and the third plurality of apertures, and wherein the second rotational direction is opposite the first rotational direction and the third rotational direction.

8. The chamber lid assembly of claim 1 , wherein the insert is formed of quartz.

9. A process chamber, comprising:
a chamber body;
a substrate support disposed within the chamber body; and
a chamber lid assembly disposed on the chamber body above the substrate support defining a reaction zone between the chamber lid assembly and the substrate support, the chamber lid assembly comprising:
a central channel having circular cross-section and having an upper portion and a lower portion and extending along a central axis;
a housing having an inner region and at least partially defining a first annular channel and a second annular channel, wherein the first and second annular channels are fluidly coupled to the central channel;
an insert disposed within the inner region of the housing;
a first plurality of apertures disposed along a first horizontal plane through the insert to provide a multi-aperture inlet between the first annular channel and the central channel, wherein each aperture of the first plurality of apertures is angled with respect to the central axis so as to induce a rotational flow of a gas about the central axis in a first rotational direction;
a second plurality of apertures disposed along a second horizontal plane through the insert to provide a multi-aperture inlet between the second annular channel and the central channel, wherein each aperture of the second plurality of apertures is angled with respect to the central axis so as to induce a conflicting rotational flow of a gas about the central axis in a second rotational direction opposite the first rotational direction, wherein the chamber lid assembly is configured to provide for turbulent gas flow in the central channel due to the conflicting rotational flow; and
a tapered bottom surface extending from the lower portion of the central channel to a peripheral portion of the chamber lid assembly.

10. The process chamber of claim 9 , wherein each of the first and second annular channels is coupled with a fluid delivery line and each fluid delivery line is coupled with one or more fluid sources.

11. The process chamber of claim 9 , wherein the first and second pluralities of apertures each comprise between 2 and 10 apertures.

12. The process chamber of claim 9 , wherein each aperture in the first plurality of apertures is disposed at an angle of up to about 60° in the first horizontal plane with respect to the central channel and is disposed at an angle of about 0° to about 60° from the first horizontal plane, and wherein each aperture in the second plurality of apertures is disposed at an opposing angle of up to about 60° in the second horizontal plane with respect to the central channel and is disposed at an angle of about 0° to about 60° from the second horizontal plane.

13. The process chamber of claim 9 , wherein each aperture of the first and second pluralities of apertures comprises a rectangular shape, a cylindrical tube, or a tear drop shape.

14. The process chamber of claim 9 , wherein the housing at least partially defines a third annular channel fluidly coupled to the central channel, further comprising:
a third plurality of apertures disposed along a third horizontal plane through the insert to provide a multi-aperture inlet between the third annular channel and the central channel, wherein each aperture of the third plurality of apertures is angled with respect to the central axis so as to induce a rotational flow of a gas about the central axis in a third rotational direction.

15. The process chamber of claim 14 , wherein the second plurality of apertures is disposed between the first plurality of apertures and the third plurality of apertures, and wherein the second rotational direction is opposite the first rotational direction and the third rotational direction.

16. The process chamber of claim 9 , wherein a lower surface of the chamber lid assembly is sized and shaped to cover a substrate disposed on the substrate support.

17. The process chamber of claim 9 , wherein the chamber lid assembly comprises a choke disposed at a peripheral po

Assignees

• Applied Materials Inc

Inventors

• Wu Dien-Yeh
• Ma Paul
• Wei Guodan
• Kao Chun-Teh

Classifications

• C23C16/4404

  Coatings or surface treatment on the inside of the reaction chamber or on parts thereof · CPC title

• C23C16/45508 Primary

  Radial flow · CPC title

• C23C16/45544

  characterized by the apparatus · CPC title

• C23C16/45574

  Nozzles for more than one gas · CPC title

• C23C16/45582

  Expansion of gas before it reaches the substrate · CPC title