Apparatus for electrochemical additive manufacturing

Patent metadata

Field	Value
Publication number	US-10465307-B2
Application number	US-201615356210-A
Country	US
Kind code	B2
Filing date	Nov 18, 2016
Priority date	Nov 19, 2015
Publication date	Nov 5, 2019
Grant date	Nov 5, 2019

Abstract

An apparatus for stereo-electrochemical deposition of metal layers consisting of an array of anodes, a cathode, a positioning system, a fluid handling system for an electrolytic solution, communications circuitry, control circuitry and software control. The anodes are electrically operated to promote deposition of metal layers in any combination on the cathode to fabricate a structure.

First claim

We claim:

1. An apparatus comprising:
a reaction chamber configured to retain an electrolyte;
an anode array containing a plurality of anodes stationary with respect to one another, the anode array disposed in the reaction chamber and configured to be immersed in the electrolyte such that the plurality of anodes are in fluid contact with one another through the electrolyte, and such that the plurality of anodes cause a deposition of a unitary layer structure or a series of unitary layer structures;
a cathode disposed in the reaction chamber and configured such that the cathode is in fluid and in contact with the plurality of anodes through the electrolyte;
a system for electro-mechanically positioning either the anode array the cathode, or both to control the distance between the anode array and the cathode;
at least one sensor for individually measuring an electrical current and or voltage of one of the plurality of anodes; and
a microcontroller, coupled to the system for electro-mechanically positioning either the anode array, the cathode, or both, coupled to the at least one sensor, and coupled to a source of layer slice information, programmed with instructions that when executed by the microcontroller cause the microcontroller to:
(i) control the current or voltage applied to each anode of the plurality of anodes; and
(ii) control the electro-mechanical positioning of the anode array, or the cathode, or both to control the distance between the anode array and the cathode during an electrochemical deposition to cause the deposition of the unitary layer structure or the series of unitary layer structures.

2. The apparatus of claim 1 , wherein the anode array has a geometrical shape that is chosen from the group consisting of hexagonal, rectangular, square, or circular geometrical shapes.

3. The apparatus of claim 2 , wherein the anode array is constructed upon a printed circuit board, doped or undoped semiconductor, or other means of separating conductive elements from one another and aligning them in a pre-determined pattern.

4. The apparatus of claim 2 , wherein the anode array is connected electrically to, or disposed upon an integrated circuit, semiconductor, or combination of conductive and insulative elements meant for biasing the plurality of anodes.

5. The apparatus of claim 1 , wherein each of the anodes in the anode array has an exposed surface having a geometric shape chosen from the group consisting of a hexagon, a rectangle, a triangle, a square, or a circle.

6. The apparatus of claim 1 , wherein the anode array is arranged in rows.

7. The apparatus of claim 1 , wherein each of the anodes in the anode array is insulated from one another and is biased individually.

8. The apparatus of claim 1 , wherein each of the anodes in the anode array is insulated from one another and the anodes are biased in groups.

9. The apparatus of claim 1 , wherein each of the anodes in the anode array is constructed out of a material resistant to physical depletion through electrolysis.

10. The apparatus of claim 1 , wherein the electro-mechanical positioning system includes an actuator and a control system in communication with the microcontroller.

11. In a reaction chamber configured to retain an electrolyte, the reaction chamber having an anode array containing a plurality of anodes stationary with respect to one another, and a cathode disposed in the reaction chamber such that the plurality of anodes and the cathode are all in fluid contact through the electrolyte, a method comprising:
a) at a microcontroller programmed with instructions that when executed by the microcontroller cause the microcontroller to control the current or voltage applied to each anode of the plurality of anodes as defined by layer slice information about a structure to be fabricated layer by layer in the reaction chamber;
b) under the control of the microcontroller, providing to the reaction chamber the electrolyte containing metal ions to be deposited on the cathode;
c) under the control of the microcontroller, adjusting the distance between the anode array and the cathode;
d) under the control of the microcontroller, processing the layer slice information for the layer to be fabricated, depositing the layer to be fabricated on the cathode by providing current or voltage to the anode array thereby causing an electrochemical reaction at the cathode;
e) individually monitoring the electrical current and or voltage at one of the plurality of anodes to detect when the deposit reaches a target layer thickness at each anode to cause a uniform layer deposit; and
f) repeating steps (a) through (e) for each layer of the structure to be fabricated until all layers are deposited.

12. The method of claim 11 , wherein adjusting the relative position of the anode array and the cathode includes moving the anode array relative to the cathode by using an electro-mechanical positioning system under control of the microcontroller.

13. The method of claim 11 , wherein adjusting the relative position of the anode array and the cathode includes moving the cathode relative to the anode array by using an electro-mechanical positioning system under control of microcontroller.

14. The method of claim 11 , wherein adjusting the relative position of the anode array and the cathode includes moving both the cathode and the anode array by using an electro-mechanical positioning system under control of the microcontroller.

15. The method of claim 11 , wherein depositing the layer to be fabricated on the cathode includes depositing at least one material selected from group consisting of gold, silver, zinc, Zn/Fe/Co/Ni alloys, copper, nickel, tin, iron, stainless steel, aluminum, titanium, polypyrrole, silicon, tungsten carbide MMC, PMC, BNNT Reinforced 316L, and SWCNT/Cu matrix.

16. The method of claim 11 , wherein the temperature of the electrolyte is maintained between 0° C. and 300° C.

17. The method of claim 11 , wherein the current applied to the anode array is maintained between 0.1A/dm 2 and 1200 A/dm 2 .

18. The method of claim 11 , wherein the voltage applied between any single anode and the cathode is maintained between 0.2 V and 7.2 V.

19. The method of claim 11 , wherein repeating steps (a) through (e) includes repeated deposits of the same material.

20. The method of claim 11 , wherein repeating steps (a) through (e) includes depositing a different material than the first deposition at least once.

Assignees

• Fabric8Labs Inc

Inventors

• Pain David Forrest
• Wirth David Morgan
• Herman Jeffrey William

Classifications

• C25D1/003 Primary

  3D structures, e.g. superposed patterned layers · CPC title

• C25D5/04

  Electroplating with moving electrodes · CPC title

• C25D3/22

  of zinc · CPC title

• C25D3/12

  of nickel or cobalt · CPC title

• B33Y30/00

  Apparatus for additive manufacturing; Details thereof or accessories therefor · CPC title