Plasma reactor

US10450916B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10450916-B2
Application numberUS-201716079146-A
CountryUS
Kind codeB2
Filing dateFeb 27, 2017
Priority dateMar 1, 2016
Publication dateOct 22, 2019
Grant dateOct 22, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a plasma reactor capable of reliably generating plasma even in the event of inflow of water. The plasma reactor of the present invention includes a plasma panel stack 20, electrically conductive members 51 and 54, a case, and a mat 71. The plasma panel stack 20 has a structure in which electrode panels 30 are stacked, and generates plasma upon application of voltage between the adjacent electrode panels 30. The electrically conductive members 51 and 54 are electrically connected to discharge electrodes of the electrode panels 30. The case houses the plasma panel stack 20. The mat 71 intervenes between the case and the plasma panel stack 20 and fixes the plasma panel stack 20 to the case. The mat 71 is disposed apart from the electrically conductive members 51 and 54 so that gaps S1 and S2 are formed between the mat 71 and the electrically conductive members 51 and 54, respectively.

First claim

Opening claim text (preview).

What is claimed is: 1. A plasma reactor comprising: a plasma panel stack having a structure in which a plurality of electrode panels each having a discharge electrode are stacked, and generating plasma upon application of voltage between the adjacent electrode panels; an electrically conductive member electrically connected to the discharge electrodes of the plurality of electrode panels, the electrically conductive member including a main body part extending in a stacking direction of the plasma panel stack, and plate parts respectively connected to both ends of the main body part and respectively disposed at upper and lower surfaces of the plasma panel stack; a case housing the plasma panel stack; and a mat intervening between the case and the plasma panel stack and fixing the plasma panel stack to the case; the plasma reactor being characterized in that the mat is disposed apart from the electrically conductive member so that a gap having a size of 2 mm to 30 mm is present between the mat and the electrically conductive member. 2. A plasma reactor according to claim 1 , wherein the mat has a cutout extending therethrough in a thickness direction thereof so as to avoid interference with the electrically conductive member, thereby providing the gap between the mat and the electrically conductive member. 3. A plasma reactor according to claim 1 , wherein a plurality of the mats are disposed apart from one another, and the electrically conductive member is located between the adjacent mats. 4. A plasma reactor comprising: a plasma panel stack having a structure in which a plurality of electrode panels each having a discharge electrode are stacked, and generating plasma upon application of voltage between the adjacent electrode panels with gas passing between the adjacent electrode panels; an electrically conductive member electrically connected to the discharge electrodes of the plurality of electrode panels; a case housing the plasma panel stack; and a plurality of mats intervening between the case and the plasma panel stack and fixing the plasma panel stack to the case; the plasma reactor being characterized in that each of the plurality of the mats are disposed apart from one another along a passing direction of the gas; wherein each of the plurality of mats has a rectangular frame shape as viewed from a side. 5. A plasma reactor according to claim 4 , wherein the mats have the same dimensions.

Assignees

Inventors

Classifications

  • by electrical effects other than those provided for in group B01D61/00 · CPC title

  • Employing electrical discharges or the generation of a plasma · CPC title

  • F01N3/0892Primary

    Electric or magnetic treatment, e.g. dissociation of noxious components · CPC title

  • using microwaves · CPC title

  • Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor (application of shock waves B01J3/08) · CPC title

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Frequently asked questions

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What does patent US10450916B2 cover?
Provided is a plasma reactor capable of reliably generating plasma even in the event of inflow of water. The plasma reactor of the present invention includes a plasma panel stack 20, electrically conductive members 51 and 54, a case, and a mat 71. The plasma panel stack 20 has a structure in which electrode panels 30 are stacked, and generates plasma upon application of voltage between the adja…
Who is the assignee on this patent?
Ngk Spark Plug Co, Tokyo Roki Kk
What technology area does this patent fall under?
Primary CPC classification F01N3/0892. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Oct 22 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).