Plating solution using ammonium salt

US10450665B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10450665-B2
Application numberUS-201615560300-A
CountryUS
Kind codeB2
Filing dateMar 24, 2016
Priority dateMar 26, 2015
Publication dateOct 22, 2019
Grant dateOct 22, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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A plating solution including a soluble salt containing at least a stannous salt; an acid selected from organic acid and inorganic acid or a salt thereof; and an additive containing a specific ammonium salt is provided.

First claim

Opening claim text (preview).

What is claimed is: 1. A plating solution comprising: (A) a soluble salt containing at least a stannous salt; (B) an acid selected from organic acid and inorganic acid or a salt of the acid; and (C) an additive, wherein the additive comprises a ammonium salt represented by a general formula (1) below, wherein, in the formula (1), R 1 indicates C n H 2n+1 , n being an integer of 10 to 16, R 2 and R 3 are identical or different, and indicate C n H 2n+1 , n being an integer of 1 to 2, X represents a halogen, and Y represents (CH 2 —CH 2 —O) 2 . 2. The plating solution according to claim 1 , wherein the additive further comprises a nonionic surfactant represented by a general formula (2) below, R 3 —Y 1 —Z—Y 2 —R 4   (2) and wherein, in the formula (2), R 3 and R 4 is the group represented by the formula (A) below, —(C n H 2n —O) m —H  (A) and wherein, Y 1 and Y 2 represent a single bond or a group selected from —O—, —COO— and —CONH—; and Z represents a benzene ring or 2,2-diphenylpropane, and in the formula (A), n indicates 2 or 3 and m indicates an integer from 1 to 15. 3. The plating solution according to claim 1 , further comprising an additional additive of a complexing agent, a brightener, or an antioxidant. 4. The plating solution according to claim 2 , further comprising an additional additive of a complexing agent, a brightener, or an antioxidant. 5. The plating solution according to claim 1 , wherein the amount of the ammonium salt in the plating solution is 0.5 to 10 g/L. 6. The plating solution according to claim 1 , wherein the amount of the ammonium salt in the plating solution is 1 to 10 g/L. 7. The plating solution according to claim 1 , wherein the amount of the soluble salt containing at least a stannous salt in the plating solution is 30 to 100 g/L. 8. The plating solution according to claim 1 , wherein the amount of the inorganic acid, the organic acid or the salt thereof (B) in the plating solution is 80 to 300 g/L. 9. The plating solution according to claim 1 , consisting essentially of: (A) a soluble salt containing at least a stannous salt; (B) an acid selected from organic acid and inorganic acid or a salt of the acid; and (C) an additive, wherein the additive consists essentially of: (i) a ammonium salt represented by a general formula (1) below, (ii) a nonionic surfactant represented by a general formula (2) below, and (iii) an additional additive of a complexing agent, a brightener, or an antioxidant, wherein, in the formula (1), R 1 indicates C n H 2n+1 , n being an integer of 10 to 16, R 2 and R 3 are identical or different, and indicate C n H 2n+1 , n being an integer of 1 to 2, X represents a halogen, and Y represents (CH 2 —CH 2 —O) 2 , R 3 —Y 1 —Z—Y 2 —R 4   (2) and wherein, in the formula (2), R 3 and R 4 is the group represented by the formula (A) below, —(C n H 2n —O) m —H  (A) and wherein, Y 1 and Y 2 represent a single bond or a group selected from —O—, —COO— and —CONH—; and Z represents a benzene ring or 2,2-diphenylpropane, and in the formula (A), n indicates 2 or 3 and m indicates an integer from 1 to 15. 10. The plating solution according to claim 1 , consisting of: (A) a soluble salt containing at least a stannous salt; (B) an acid selected from organic acid and inorganic acid or a salt of the acid; and (C) an additive, wherein the additive consists of: (i) a ammonium salt represented by a general formula (1) below, (ii) a nonionic surfactant represented by a general formula (2) below, and (iii) an additional additive of a complexing agent, a brightener, or an antioxidant, wherein, in the formula (1), R 1 indicates C n H 2n+1 , n being an integer of 10 to 16, R 2 and R 3 are identical or different, and indicate C n H 2n+1 , n being an integer of 1 to 2, X represents a halogen, and Y represents (CH 2 —CH 2 —O) 2 , R 3 —Y 1 —Z—Y 2 —R 4   (2) and wherein, in the formula (2), R 3 and R 4 is the group represented by the formula (A) below, —(C n H 2n —O) m —H  (A) and wherein, Y 1 and Y 2 represent a single bond or a group selected from —O—, —COO— and —CONH—; and Z represents a benzene ring or 2,2-diphenylpropane, and in the formula (A), n indicates 2 or 3 and m indicates an integer from 1 to 15.

Assignees

Inventors

Classifications

  • by plating, e.g. electroless plating or electroplating · CPC title

  • comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu · CPC title

  • containing more than 50% by weight of tin · CPC title

  • Surface contacts, e.g. bumps (H05K3/4092 takes precedence; deposition of finish layers on pads H05K3/24; forming solder bumps H05K3/3465) · CPC title

  • C25D3/32Primary

    characterised by the organic bath constituents used · CPC title

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What does patent US10450665B2 cover?
A plating solution including a soluble salt containing at least a stannous salt; an acid selected from organic acid and inorganic acid or a salt thereof; and an additive containing a specific ammonium salt is provided.
Who is the assignee on this patent?
Mitsubishi Materials Corp
What technology area does this patent fall under?
Primary CPC classification C25D3/32. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 22 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).