Method of preferential silicon nitride etching using sulfur hexafluoride

Patent metadata

Field	Value
Publication number	US-10446407-B2
Application number	US-201815874703-A
Country	US
Kind code	B2
Filing date	Jan 18, 2018
Priority date	Jan 18, 2017
Publication date	Oct 15, 2019
Grant date	Oct 15, 2019

Abstract

Embodiments of the invention describe substrate processing methods using non-polymerizing chemistry to preferentially etch silicon nitride relative to other materials found in semiconductor manufacturing. According to one embodiment, a processing method includes providing in a plasma processing chamber a substrate containing a first material containing silicon nitride and a second material that is different from the first material, forming a plasma-excited process gas containing SF6, and exposing the substrate to the plasma-excited process gas to preferentially etch the first material relative to the second material. In one example, the process gas can contain or consist of SF6 and Ar. In another example, the second material is selected from the group consisting of Si and SiO2.

First claim

What is claimed is:

1. A substrate processing method, comprising:
providing in a plasma processing chamber a substrate containing a first material containing SiN and a second material that is different from the first material;
forming a plasma-excited process gas containing SF 6 , wherein forming the plasma-excited process gas includes generating a plasma using a capacitively coupled plasma source containing an upper plate electrode and a lower plate electrode supporting the substrate, and wherein the upper plate electrode is grounded or not powered and radio frequency (RF) power is applied to the lower plate electrode to generate the plasma in a processing region between the upper plate electrode and the lower plate electrode; and
exposing the substrate to the plasma-excited process gas to preferentially etch the first material relative to the second material, wherein the exposing includes exposing the substrate to ions having kinetic energy that is below a sputtering threshold of the first and second materials, and wherein the kinetic energy of the ions is supplied by the RF power applied to the lower plate electrode.

2. The method of claim 1 , wherein the second material is selected from the group consisting of Si and SiO 2 .

3. The method of claim 1 , wherein the second material includes SiO 2 and a SiN/SiO 2 etch selectivity is greater than 30.

4. The method of claim 1 , wherein, during the exposing, a gas pressure greater than about 300 mTorr is maintained in the plasma processing chamber.

5. The method of claim 1 , wherein, during the exposing, a gas pressure of about 500 mTorr, or greater, is maintained in the plasma processing chamber.

6. The method of claim 1 , wherein the RF power applied to the lower plate electrode is about 100 W, or less.

7. The method of claim 1 , wherein a frequency of the RF power applied to the lower plate electrode is 13.56 MHz.

8. The method of claim 1 , wherein the plasma-excited process gas further contains Ar.

9. The method of claim 1 , wherein the plasma-excited process gas consists of SF 6 and Ar.

10. The method of claim 1 , wherein the second material includes raised features on the substrate, the first material forms sidewall spacers on vertical portions of the raised features, and the exposing removes the sidewall spacers from the raised features.

11. The method of claim 1 , wherein the first material includes raised features on the substrate, the second material forms sidewall spacers on vertical portions of the raised features, and the exposing removes the raised features but not the sidewall spacers.

12. The method of claim 1 , wherein the second material includes raised features on the substrate, the first material forms a conformal film on the raised features, and the exposing isotropically thins the conformal film.

13. A substrate processing method, comprising:
providing in a plasma processing chamber a substrate containing a first material containing SiN and a second material containing SiO 2 ;
forming a plasma-excited process gas containing SF 6 and Ar, wherein forming the plasma-excited process gas includes generating a plasma using a capacitively coupled plasma source containing an upper plate electrode and a lower plate electrode supporting the substrate, and wherein the upper plate electrode is grounded or not powered and radio frequency (RF) power is applied to the lower plate electrode; and
exposing the substrate to the plasma-excited process gas to preferentially etch the first material relative to the second material with a SiN/SiO 2 etch selectivity greater than 30, wherein the exposing includes exposing the substrate to ions with kinetic energy that is below a sputtering threshold of the first and second materials, and wherein the kinetic energy of the ions is supplied by the RF power applied to the lower plate electrode.

14. The method of claim 13 , wherein, during the exposing, a gas pressure of about 500 mTorr, or greater, is maintained in the plasma processing chamber.

Assignees

• Tokyo Electron Ltd

Inventors

• Sherpa Sonam D
• Ranjan Alok

Classifications

• H10P72/0421

  for drying etching · CPC title

• H10P50/283 Primary

  by chemical means · CPC title

• H01J2237/334

  Etching · CPC title

• H01J37/3244

  Gas supply means · CPC title

• H01J37/32091

  the radio frequency energy being capacitively coupled to the plasma · CPC title