Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system

Patent metadata

Field	Value
Publication number	US-10437162-B2
Application number	US-201715711678-A
Country	US
Kind code	B2
Filing date	Sep 21, 2017
Priority date	Sep 21, 2017
Publication date	Oct 8, 2019
Grant date	Oct 8, 2019

Abstract

A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with the first volume space is protected from the liquid material in the second volume space by a volume of gas in the first volume space.

First claim

What is claimed is:

1. A photolithography system having a molten target material delivery system, the molten target material delivery system delivering molten target material at least from a first location to a second location, comprising:
a vessel disposed in a fluid path between the first location and the second location and in fluidic communication with both said first location and said second location, said vessel including:
a vessel wall enclosing at least an inner volume space;
a partition disposed within said vessel wall, said partition dividing said inner volume space into at least a first volume space and a second volume space, said partition configured to permit gaseous communication between said first volume space and said second volume space when no molten material is present within said inner volume space, said first volume space configured to trap at least a portion of a gas that exists within said first volume space when molten target material is present in said second volume space;
an inlet port;
an outlet port, said second volume space being in fluidic communication with both said inlet port and said outlet port; and
a seal disposed such that said seal is in gaseous communication with both said first volume space and said second volume space when said molten target material is absent from said second volume space, said seal configured to be in gaseous communication with said trapped gas within said first volume space and not in gaseous communication with said second volume space when said molten target material is present in said second volume space.

2. The photolithography system of claim 1 wherein said molten target material is molten tin.

3. The photolithography system of claim 1 wherein said vessel is a pressure vessel.

4. The photolithography system of claim 1 wherein said seal is formed of an elastomer.

5. The photolithography system of claim 1 wherein said seal is an O-ring.

6. The photolithography system of claim 1 wherein the first volume space has a tapered shape that tapers toward the seal.

7. The photolithography system of claim 1 wherein said partition includes one or more through-holes between said first volume space and said second volume space.

8. The photolithography system of claim 1 wherein at least one of said inlet port and said outlet port is coupled to a fluid line using an anti-rotation insert having protrusions.

9. A photolithography system having a molten target material delivery system, the molten target material delivery system delivering molten target material at least from a first location to a second location, comprising:
a vessel disposed in a fluid path between the first location and the second location and in fluidic communication with both said first location and said second location, said vessel including:
a vessel wall enclosing at least an inner volume space;
a partition that divides said inner volume space into a first volume space and a second volume space, wherein said first volume space and said second volume space are configured to be in gaseous communication when a first quantity of molten target material is present in said second volume space, said first volume space and said second volume space are configured to be not in gaseous communication with one another when a second quantity of molten target material is present in said second volume space and said molten target material blocks said gaseous communication, said second quantity of molten target material being greater than said first quantity of said molten target material; and
a seal in gaseous communication with said first volume space.

10. The photolithography system of claim 9 wherein said molten target material is molten tin.

11. The photolithography system of claim 9 wherein said vessel is a pressure vessel.

12. The photolithography system of claim 9 wherein said seal is formed of an elastomer.

13. The photolithography system of claim 9 wherein said seal is an O-ring.

14. The photolithography system of claim 9 wherein the first volume space has a tapered shape that tapers toward the seal.

15. The photolithography system of claim 9 wherein said partition includes one or more through-holes between said first volume space and said second volume space.

16. The photolithography system of claim 9 wherein at least one of said inlet port and said outlet port is coupled to a fluid line using an anti-rotation insert having protrusions.

17. A photolithography system having a fluid material delivery system, the fluid material delivery system delivering fluid material at least from a first location to a second location, comprising:
a vessel disposed in a fluid path between the first location and the second location and in fluidic communication with both said first location and said second location, said vessel including:
a vessel wall enclosing at least an inner volume space, said inner volume space including a first volume space and a second volume space, wherein said first volume space and said second volume space are configured to be in gaseous communication via a channel when a first quantity of fluid material is present in said second volume space, said first volume space and said second volume space are configured to be not in gaseous communication via said channel when a second quantity of fluid material is present in said second volume space and said fluid material blocks said channel, said second quantity of fluid material being greater than said first quantity of said fluid material; and
a seal in gaseous communication with said first volume space.

18. The photolithography system of claim 17 wherein said seal is not in gaseous communication with said second volume space when said second quantity of said molten.

19. The photolithography system of claim 18 wherein a quantity of trapped gas is disposed between said fluid material and said seal when said second quantity of said molten material is present in said second volume space.

20. The photolithography system of claim 17 wherein said fluid material is molten tin.

21. The photolithography system of claim 17 wherein said seal is an O-ring.

22. The photolithography system of claim 17 wherein the first volume space has a tapered shape that tapers toward the seal.

23. The photolithography system of claim 17 wherein said partition includes one or more through-holes between said first volume space and said second volume space.

24. The photolithography system of claim 17 wherein at least one of said inlet port and said outlet port is coupled to a fluid line using an anti-rotation insert having protrusions.

25. The photolithography system of claim 17 wherein said second volume is greater than a threshold volume, wherein the threshold volume depends on a geometry of the channel.

26. The photolithography system of claim 17 wherein said second volume is greater than a threshold volume, wherein the threshold volume depends on a geometry of the channel and an orientation of the vessel with respect to gravity.

27. A fluid material delivery system, the fluid material delivery system delivering fluid material at least from a first location to a second location, comprising:
a vessel disposed in a fluid path between the first location and the second location and in fluidic communication with both said first location and said second location, said vessel including:
a vessel wall enclosing at leas

Assignees

• Asml Netherlands Bv

Inventors

• Bessems David
• Tedrow Jon David
• Odneal Colin Michael

Classifications

• G03F7/70033 Primary

  by plasma extreme ultraviolet [EUV] sources · CPC title

• G03F7/70841 Primary

  Constructional issues related to vacuum environment, e.g. load-lock chamber · CPC title

• H05G2/002

  Supply of the plasma generating material · CPC title

• F16L27/00 Primary

  Adjustable joints; Joints allowing movement (of the quick-acting type F16L37/50; for double-walled or multi-channel pipes or pipe assemblies F16L39/04 {; specially adapted to be made of plastics or to be used with pipes made of plastics F16L47/18; specially adapted for pipes of brittle material F16L49/08}) · CPC title

• G03F7/70808

  Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus · CPC title