Defect reviewing method and device

US10436576B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10436576-B2
Application numberUS-201515126391-A
CountryUS
Kind codeB2
Filing dateMar 19, 2015
Priority dateApr 18, 2014
Publication dateOct 8, 2019
Grant dateOct 8, 2019

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

To review minute defects that were buried in roughness scattered light with an observation device provided with a dark-field microscope, a scanning electron microscope (SEM), and a control unit, the present invention configures the dark-field microscope by installing a filter for blocking a portion of the scattered light, an imaging lens for focusing the scattered light that has passed through the filter, and a detector for dividing the image of the scattered light focused by the imaging lens into the polarization directions converted by a wavelength plate and detecting the resulting images, and the control has a calculation unit for determining the position of a defect candidate detected by another inspection device using the plurality of images separated into polarization directions and detected by the detector.

First claim

Opening claim text (preview).

The invention claimed is: 1. A defect reviewing device comprising: a dark-field microscope that includes: an illumination light source that illuminates a sample with illumination light, an objective lens that collects scattered light generated from the sample illuminated with the illumination light from the illumination light source, a wavelength plate that converts polarization directions of the scattered light from the sample, the scattered light being collected by the objective lens, a filter that selectively blocks part of the scattered light transmitted through the wavelength plate and transmits a remaining portion of the scattered light, an imaging lens that forms an image of the scattered light transmitted through the filter, and a detector that captures the image of the scattered light formed by the imaging lens; a scanning electron microscope (SEM); a table that carries the sample between the dark-field microscope and the SEM; and a control unit that is communicatively coupled to the dark-field microscope, the SEM, and the table, wherein a processor of the control unit: causes the table to move the sample to the dark-field microscope, removes the filter to allow radially polarized light and azimuthally polarized light to be transmitted, captures, using the detector, first images formed by the radially polarized light and the azimuthally polarized light with the filter removed, replaces the filter, captures, using the detector, second images formed by the radially polarized light and the azimuthally polarized light with the filter replaced, determines a position of the defect on the sample by comparing the first images and the second images, causes the table to move to the sample to the SEM, and captures, using the SEM, SEM images of the defect based on the position of the defect determined. 2. The defect reviewing device according to claim 1 , wherein the detector includes two-dimensionally arrayed pixels; and wherein neighboring pixels of the two-dimensionally arrayed pixels detect light beams polarized in different directions. 3. The defect reviewing device according to claim 1 , wherein the wavelength plate further: converts the radially polarized light and the azimuthally polarized light to different beams of linearly polarized light. 4. The defect reviewing device according to claim 1 , wherein the processor further: calculates a defect candidate by performing a threshold value process on a brightness values of images in different polarization directions.

Assignees

Inventors

Classifications

  • affording dark-field illumination (G02B21/14 {and G02B21/125} take precedence) · CPC title

  • Birefringent or phase retarding elements (G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001) · CPC title

  • Polarisation microscopes · CPC title

  • Polarisation of light · CPC title

  • G01B11/14Primary

    for measuring distance or clearance between spaced objects or spaced apertures (G01B11/26 takes precedence; rangefinders G01C3/00) · CPC title

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What does patent US10436576B2 cover?
To review minute defects that were buried in roughness scattered light with an observation device provided with a dark-field microscope, a scanning electron microscope (SEM), and a control unit, the present invention configures the dark-field microscope by installing a filter for blocking a portion of the scattered light, an imaging lens for focusing the scattered light that has passed through …
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification G01B11/14. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 08 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).