Microelectromechanical device and a method of manufacturing a microelectromechanical device
US-2017355591-A1 · Dec 14, 2017 · US
US10424441B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10424441-B2 |
| Application number | US-201715803155-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 3, 2017 |
| Priority date | Jul 5, 2017 |
| Publication date | Sep 24, 2019 |
| Grant date | Sep 24, 2019 |
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An ultra-high charge density electret is disclosed. The ultra-high charge density electret includes a three-dimensional structure having a plurality of sidewalls. A porous silicon dioxide film is formed on the plurality of sidewalls, and the porous silicon dioxide film is charged with a plurality of positive or negative ions.
Opening claim text (preview).
What is claimed is: 1. A transmitter system, comprising: an ultra-high charge density electret comprising: a three-dimensional structure; a plurality of sidewalls on the three-dimensional structure; and a porous silicon dioxide film formed on the plurality of sidewalls, wherein the porous silicon dioxide film is charged with a plurality of positive or negative ions a modulator comprising the ultra-high charge density electret: and a signal processor coupled to the modulator, wherein circuitry within the modulator physically moves the ultra-high charge density electret to generate a signal in response to receiving a signal from the signal processor. 2. The transmitter system of claim 1 , wherein the three-dimensional structure is a pyramid-shaped silicon structure. 3. The transmitter system of claim 1 , wherein the three-dimensional structure is formed on a surface of a silicon wafer. 4. The transmitter system of claim 1 , wherein the three-dimensional structure is at least one of a trench-shaped, pillar-shaped, or spike-shaped silicon structure. 5. The transmitter system of claim 1 , further comprising a plurality of three-dimensional structures. 6. The transmitter system of claim 5 , wherein the plurality of three-dimensional structures comprises an array of three-dimensional structures. 7. A system, comprising: a text message processor; a broadcast processor coupled to an output of the text message processor; a signal processor coupled to an output of the broadcast processor; a modulator coupled to an output of the signal processor; a power amplifier coupled to an output of the modulator; an antenna coupled to an output of the power amplifier, wherein the modulator includes a plurality of ultra-high charge density electrets, comprising: a plurality of three-dimensional structures; a plurality of sidewalls on each one of the plurality of three-dimensional structures; and a porous silicon dioxide film formed on the plurality of sidewalls, wherein the porous silicon dioxide film is charged with a plurality of positive or negative ions; and wherein circuitry within the modulator physically moves the ultra-high charge density electrets to generate a signal in response to the output of the signal processor. 8. The system of claim 7 , wherein each one of the plurality of three-dimensional structures is a pyramid-shaped silicon structure. 9. The system of claim 7 , wherein the plurality of three-dimensional structures are formed on a surface of a silicon wafer or die. 10. The system of claim 7 , wherein each one of the plurality of three-dimensional structures is at least one of a trench-shaped, pillar-shaped, or spike-shaped silicon structure. 11. The system of claim 7 , wherein the plurality of three-dimensional structures comprises an array of three-dimensional structures. 12. The system of claim 7 , wherein the plurality of ultra-high charge density electrets are components of an electromechanical circuit configured to generate a Very Low Frequency (VLF) signal.
Bulk micromachining techniques not provided for in B81C1/00507 · CPC title
Porous silicon · CPC title
Circuits · CPC title
having an inorganic dielectric · CPC title
with conductive charge carrier, i.e. capacitor machines · CPC title
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