Deposition substance monitoring device and vacuum pump

US10415577B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10415577-B2
Application numberUS-201715694815-A
CountryUS
Kind codeB2
Filing dateSep 3, 2017
Priority dateSep 6, 2016
Publication dateSep 17, 2019
Grant dateSep 17, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A deposition substance monitoring device of a vacuum pump for rotatably driving a rotor by a motor to exhaust gas, comprises: a state determination section configured to determine whether or not the vacuum pump is in a predetermined exhaust state; and a deposition amount determination section configured to receive a deposition amount indicator for an amount of a deposition substance in the pump to determine as excessive deposition when the deposition amount indicator in the predetermined exhaust state is equal to or greater than an acceptable deposition threshold.

First claim

Opening claim text (preview).

What is claimed is: 1. A deposition substance monitoring device of a vacuum pump for rotatably driving a rotor by a motor to exhaust gas, comprising: a state determination section configured to determine each particular exhaust state, among a plurality of different exhaust states, the vacuum pump is in; and a deposition amount determination section configured to receive a deposition amount indicator for an amount of a deposition substance in the pump to determine as excessive deposition when the deposition amount indicator in the determined each particular exhaust state is equal to or greater than an acceptable deposition threshold. 2. The deposition substance monitoring device according to claim 1 , wherein the plurality of different exhaust states include a gas supply state in which gas flows into the vacuum pump and a gas non-supply state in which no gas flows into the vacuum pump. 3. A deposition substance monitoring device of a vacuum pump for rotatably driving a rotor by a motor to exhaust gas, comprising: a state determination section configured to determine whether or not the vacuum pump is in a predetermined exhaust state; and a deposition amount determination section configured to receive a deposition amount indicator for an amount of a deposition substance in the pump to determine as excessive deposition when the deposition amount indicator in the predetermined exhaust state is equal to or greater than an acceptable deposition threshold, wherein the predetermined exhaust state is any one of a gas supply state in which gas flows into the vacuum pump and a gas non-supply state in which no gas flows into the vacuum pump, any one of a motor current value of the motor and an opening degree of a valve provided on a suction port side of the vacuum pump is used as the deposition amount indicator, and the state determination section determines the gas supply state and the gas non-supply state based on any one of the motor current value and the opening degree of the valve. 4. A deposition substance monitoring device of a vacuum pump for rotatably driving a rotor by a motor to exhaust gas, comprising: an acquiring section configured to acquire a first motor current value in a predetermined gas supply state in which gas flows into the vacuum pump and a second motor current value in a gas non-supply state right before or after the predetermined gas supply state; and a determination section configured to determine that a deposition amount of a deposition substance in the vacuum pump is excessive when a difference between the first motor current value and the second motor current value is equal to or greater than a predetermined threshold. 5. A vacuum pump comprising: a rotor; a motor configured to rotatably drive the rotor; and the deposition substance monitoring device according to claim 1 . 6. A vacuum pump comprising: a rotor; a motor configured to rotatably drive the rotor; and the deposition substance monitoring device according to claim 4 .

Assignees

Inventors

Classifications

  • Turbomolecular vacuum pumps · CPC title

  • F04D19/04Primary

    specially adapted to the production of a high vacuum, e.g. molecular pumps · CPC title

  • Multi-stage pumps · CPC title

  • Pumps specially adapted to produce a vacuum · CPC title

  • characterised by the application · CPC title

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Frequently asked questions

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What does patent US10415577B2 cover?
A deposition substance monitoring device of a vacuum pump for rotatably driving a rotor by a motor to exhaust gas, comprises: a state determination section configured to determine whether or not the vacuum pump is in a predetermined exhaust state; and a deposition amount determination section configured to receive a deposition amount indicator for an amount of a deposition substance in the pump…
Who is the assignee on this patent?
Shimadzu Corp
What technology area does this patent fall under?
Primary CPC classification F04D19/04. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Sep 17 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).