Method for cutting substrate of irregular pattern and display device

US10414683B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10414683-B2
Application numberUS-201615206880-A
CountryUS
Kind codeB2
Filing dateJul 11, 2016
Priority dateJun 26, 2013
Publication dateSep 17, 2019
Grant dateSep 17, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for cutting a substrate of irregular pattern comprises: forming a cutting line on the substrate, wherein the closed region enclosed by the cutting line is the irregular pattern that is required; forming a trough line at the cutting line; and applying an external force to the substrate so as to divide the substrate at the trough line. The method can remarkably improve accuracy and efficiency of cutting a substrate of irregular pattern.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for cutting a substrate into an irregular pattern, comprising: forming a cutting line on the substrate, wherein the cutting line encloses a region having the irregular pattern, the substrate is a glass substrate or a quartz substrate; cutting the substrate along the cutting line by using a laser beam to form a trough line at the cutting line; and applying an external force onto the substrate so as to divide the substrate at the trough line, wherein forming the cutting line on the substrate comprises: coating the substrate with photoresist to cover the entire substrate; and performing exposure by means of a mask plate and development, such that the photoresist generates an entirely-retained region and a completely-removed region, wherein a boundary line of the photoresist entirely-retained region coincides with the cutting line. 2. The method according to claim 1 , wherein applying the external force on the substrate so as to divide the substrate at the trough line comprises: applying the external force on the substrate so as to divide the substrate at the trough line through ultrasonic wave. 3. The method according to claim 2 , wherein a frequency range for the ultrasonic wave is between 20 KHz to 500 MHz. 4. The method according to claim 1 , after applying the external force on the substrate so as to divide the substrate at the trough line, further comprising: performing a corner-trimming and/or edge-grinding process on an edge of the substrate comprising the irregular pattern.

Assignees

Inventors

Classifications

  • Inorganic materials other than metals or composite materials · CPC title

  • Successive distinct removal operations · CPC title

  • Glass products comprising an outer layer or surface coating of non-glass material · CPC title

  • Cutting or splitting in curves, especially for making spectacle lenses · CPC title

  • taking account of the properties of the material involved · CPC title

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What does patent US10414683B2 cover?
A method for cutting a substrate of irregular pattern comprises: forming a cutting line on the substrate, wherein the closed region enclosed by the cutting line is the irregular pattern that is required; forming a trough line at the cutting line; and applying an external force to the substrate so as to divide the substrate at the trough line. The method can remarkably improve accuracy and effic…
Who is the assignee on this patent?
Boe Technology Group Co Ltd, Beijing Boe Display Tech Co
What technology area does this patent fall under?
Primary CPC classification C03B33/0222. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 17 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).