Alignment control in nanoimprint lithography based on real-time system identification

Patent metadata

Field	Value
Publication number	US-10409178-B2
Application number	US-201715845634-A
Country	US
Kind code	B2
Filing date	Dec 18, 2017
Priority date	Dec 18, 2017
Publication date	Sep 10, 2019
Grant date	Sep 10, 2019

Abstract

An imprint lithography alignment method includes assessing a first alignment error between the template and the substrate, generating a first input signal corresponding to a first relative motion between the template and the substrate, initiating the first relative motion between the template and the substrate via the first input signal, assessing an output signal corresponding to the first relative motion, comparing the first input signal and the output signal to yield a motion control action corresponding to a second relative motion between the template and the substrate, generating a second input signal corresponding to the second relative motion between the template and the substrate, initiating the second relative motion between the template and the substrate via the second input signal, and assessing a second alignment error between the template and the substrate, wherein a magnitude of the first alignment error exceeds a magnitude of the second alignment error.

First claim

What is claimed is:

1. An imprint lithography alignment method comprising:
dispensing an imprint resist on a substrate;
contacting the imprint resist with a template, wherein the imprint resist is a liquid;
assessing a first alignment error between the template and the substrate;
generating a first input signal corresponding to a first relative motion between the template and the substrate;
initiating the first relative motion between the template and the substrate via the first input signal;
assessing an output signal corresponding to the first relative motion;
comparing the first input signal and the output signal to yield a motion control action corresponding to a motion trajectory of a second relative motion between the template and the substrate;
generating a second input signal corresponding to the second relative motion between the template and the substrate;
initiating the second relative motion between the template and the substrate via the second input signal; and
assessing a second alignment error between the template and the substrate, wherein a magnitude of the first alignment error exceeds a magnitude of the second alignment error.

2. The method of claim 1 , wherein the magnitude of the second alignment error is less than or equal to a target alignment error.

3. The method of claim 1 , wherein comparing the first input signal and the output signal comprises:
assessing a ratio of a magnitude of the output signal to a magnitude of the first input signal; and
assessing a phase of the output signal with respect to a phase of the first input signal.

4. The method of claim 1 , wherein the motion trajectory includes a sinusoidal function of time that spans a phase value from −π/2 to π/2.

5. The method of claim 1 , wherein the motion trajectory comprises position, velocity, acceleration, and jerk components, and
wherein the jerk component corresponds to static friction between the template and the imprint resist on the substrate in the first relative motion.

6. The method of claim 5 , wherein the motion control action is a sum of the position, velocity, and acceleration components.

7. The method of claim 1 , wherein generating the second input signal comprises converting the motion control action to an electrical signal through a feed-forward controller.

8. The method of claim 1 , wherein assessing the output signal comprises assessing the output signal using a non-linear state observer.

9. The method of claim 1 , wherein initiating the first relative motion comprises providing the first input signal for a predetermined length of time to a stage on which the substrate is disposed.

10. The method of claim 1 , further comprising:
i) assessing a further alignment error between the template and the substrate;
ii) generating a feedback control signal based on the further alignment error; and
iii) initiating further relative movement between the template and the substrate via the feedback control signal to move the substrate relative to the template.

11. The method of claim 10 , further comprising:
iv) repeating i) through iii) until a mean value of the further alignment error is less than or equal to a target alignment error.

12. An imprint lithography system for controlling alignment of an imprint lithography template with respect to a substrate based on system identification, the system comprising:
a substrate stage configured to retain the substrate; and
a controller in communication with the substrate stage configured to, based on the substrate having a liquid imprint resist contacting the template:
assess a first alignment error between the template and the substrate;
generate a first input signal corresponding to a first relative motion between the template and the substrate;
initiate the first relative motion between the template and the substrate via the first input signal;
assess an output signal corresponding to the first relative motion;
compare the first input signal and the output signal to yield a motion control action corresponding to a motion trajectory of a second relative motion between the template and the substrate;
generate a second input signal corresponding to the second relative motion between the template and the substrate;
initiate the second relative motion between the template and the substrate via the second input signal; and
assess a second alignment error between the template and the substrate, wherein a magnitude of the first alignment error exceeds a magnitude of the second alignment error.

13. The system of claim 12 , wherein the controller comprises a feed-forward controller configured to convert the motion trajectory to an electrical signal and provide the electrical signal to the substrate stage.

14. The system of claim 13 , further comprising a sensor configured to generate a sensor signal corresponding to a relative location of the template with respect to the substrate,
wherein the controller is configured to receive the sensor signal for assessing the output signal and the second alignment error.

15. The system of claim 14 , wherein the controller comprises a state observer configured to assess the output signal based on the electrical signal from the feed-forward controller and the sensor signal to yield the motion control action.

16. The system of claim 12 , wherein the motion trajectory includes a sinusoidal function of time that spans a phase value from −π/2 to π/2.

17. The system of claim 12 , wherein the controller is further configured to:
i) assess a further alignment error between the template and the substrate;
ii) generate a feedback control signal based on the further alignment error; and
iii) initiate further relative movement between the template and the substrate via the feedback control signal to move the substrate relative to the template.

18. The system of claim 17 , wherein the controller is further configured to repeat i) through iii) until a mean value of the further alignment error is less than or equal to a target alignment error.

19. The system of claim 17 , wherein the controller further comprises a feedback controller configured to generate the feedback control signal and provide the feedback control signal to the substrate stage.

20. The system of claim 12 , wherein the substrate stage is configured to translate the substrate about orthogonal axes in a plane of the template and rotate the substrate about a center axis orthogonal to the plane.

Assignees

• Canon Kk

Inventors

• Lu Xiaoming
• Choi Byung-Jin

Classifications

• G03F9/7042

  Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting (non-exposure lithographic processes per se G03F7/0002) · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F9/7088

  Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection · CPC title

• G03F9/7096

  Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus · CPC title

• G03F9/7046 Primary

  Strategy, e.g. mark, sensor or wavelength selection · CPC title