Method for illuminating an object field of a projection exposure system

Patent metadata

Field	Value
Publication number	US-10409167-B2
Application number	US-201615226189-A
Country	US
Kind code	B2
Filing date	Aug 2, 2016
Priority date	Feb 21, 2014
Publication date	Sep 10, 2019
Grant date	Sep 10, 2019

Abstract

A method for illuminating an object field of a projection exposure apparatus includes providing a subset of first facets to be positioned in park positions, which are each spaced apart from an associated target position, but at most by a maximum distance.

First claim

What is claimed is:

1. A method of illuminating an object field of a projection exposure apparatus, the projection exposure apparatus comprising an illumination device configured to generate illumination radiation and an illumination optical unit configured to guide the illumination radiation from the illumination device to the object field, the illumination optical unit comprising a first facet mirror comprising a multiplicity of first facets and a second facet mirror comprising a multiplicity of second facets, each first facet comprising a multiplicity of displaceable individual mirrors, each first facet being assignable to at least one of the second facets to define at least one illumination channel, the method comprising:
for each individual mirror of each first facet, determining:
a target position in a manner dependent on a predetermined intended illumination of the object field;
a maximum, non-zero spacing from the target position; and
at least one park position which is spaced from the target position by at most the maximum, non-zero spacing from the target position; and

positioning the individual mirrors of the first facets so that, for each individual mirror of a subset of the individual mirrors of the first facets, the individual mirror is positioned in one of the at least one park positions;
using the illumination optical unit to illuminate structures of a reticle located in the object plane;
using a projection optical unit to project illuminated structures of the reticle onto a light sensitive material in an image plane of the projection optical unit; and
at least one of the following:
displacing at least some of the individual mirrors of the first facets from a park position into an associated target position while illuminating structures of the reticle;
displacing at least some of the individual mirrors of the first facets from target position into a park position while illuminating structures of the reticle; and
displacing at least some of the individual mirrors of the first facets from a first target position into a second target position while illuminating structures of the reticle, wherein the first target position is different from the second target position,

wherein the method further comprises at least one of the following:
displacing at least some of the individual mirrors of the first facet to achieve a y-ReMa functionality;
using different switching times for different subsets of the individual mirrors of the first facets; and
displacing subset of the individual mirrors of the first facets which are not employed for illuminating the object field into Previously Presented park positions during the illumination of the object field, between two illuminations of the object field or both.

2. The method of claim 1 , further comprising, for the individual mirrors of the first facets positioned in the park positions, displacing the individual mirrors from the park position into the associated target position within a switching time of at most 200 milliseconds.

3. The method of claim 1 , wherein the subset of the individual mirrors of the first facets positioned in the park positions comprises from 0.1% to 10% of an overall number of the individual mirrors of the first facets.

4. The method of claim 1 , wherein each target position is completely surrounded by park positions.

5. The method of claim 1 , further comprising determining forbidden positions for at least some of the first facets, wherein, for the at least some of the first facets, the individual mirrors of the first facets may not be displaced into the forbidden positions.

6. The method of claim 5 , further comprising determining the target positions so that each target position has a minimum distance from a closest forbidden position.

7. The method of claim 1 , further comprising determining an actual illumination of the object field while illuminating the object field.

8. The method of claim 7 , further comprising, when the determined actual illumination deviates from the intended illumination, displacing first facets to reduce the deviation.

9. The method of claim 1 , wherein the maximum, non-zero spacing is one facet diameter.

10. The method of claim 1 , further comprising, between the illumination of two dies, modulating a dose of illumination of the image plane of the projection optical unit by displacing at least some of the individual mirrors of the first facet.

11. The method of claim 1 , further comprising, during illumination of the light sensitive material, adapting a dose of illumination of the image plane of the projection optical unit by displacing at least some of the individual mirrors of the first facet.

12. The method of claim 1 , further comprising displacing at least some of the individual mirrors of the first facet to achieve a y-ReMa functionality.

13. The method of claim 1 , further comprising using different switching times for different subsets of the individual mirrors of the first facets.

14. The method of claim 1 , further comprising displacing a subset of the individual mirrors of the first facets which are not employed for illuminating the object field into Previously Presented park positions during the illumination of the object field, between two illuminations of the object field or both.

15. The method of claim 1 , further comprising, during the illumination of the object field, displacing at least some of the individual mirrors of the first facets to correct at least one member selected from the group consisting of overall intensity of the object filed, a specific intensity profile of the object field, a specific angle distribution and uniformity of the illumination of the object field.

16. The method of claim 15 , comprising correcting the illumination of the object field between the exposure of two successive fields, during the exposure of one field or both.

17. The method of claim 1 , further comprising, during illumination of the light sensitive material, modifying illumination the exposure of the light sensitive material according to a correction protocol determined in a manner dependent on a heterogeneity of the light sensitive material.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Endres Martin
• Eisenmenger Johannes
• Bieling Stig
• Hauf Markus
• Wischmeier Lars
• Haacker Fabian

Classifications

• G03F7/70116

  Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets · CPC title

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• G02B19/0095

  for use with ultraviolet radiation · CPC title

• G02B19/0019

  having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) · CPC title

• G03F7/70075 Primary

  Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection · CPC title