Projection exposure system for microlithography with a measurement device
US-2015212431-A1 · Jul 30, 2015 · US
US10386733B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10386733-B2 |
| Application number | US-201715835922-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 8, 2017 |
| Priority date | Jun 18, 2015 |
| Publication date | Aug 20, 2019 |
| Grant date | Aug 20, 2019 |
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The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components and methods are also provided.
Opening claim text (preview).
What is claimed is: 1. An optical system, comprising: optical elements; actuators; a holding frame holding the optical elements so that the optical elements are positionable and/or spatially orientable via the actuators; a sensor frame mechanically decoupled from the holding frame; sensors configured to capture a position and/or spatial orientation of a respective optical element relative to the sensor frame; and an interferometer comprising a measurement section along which electromagnetic radiation is sent and which extends via two reflection points on the sensor frame, wherein: the holding frame encloses a volume; the sensor frame is arranged partially or entirely within the volume; and the interferometer is configured to capture a change in position, a change in spatial orientation, and/or a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 2. The optical system of claim 1 , wherein the sensor frame comprises a plurality of arms projecting from a base body, and each of at least two of the arms comprises one of the sensors. 3. The optical system of claim 2 , wherein the base body and the projecting arms are configured in one part or in one piece. 4. An inspection system, comprising: an optical system according to claim 1 , wherein the inspection system is configured to inspect a photomask. 5. The inspection system of claim 4 , wherein the interferometer is configured to capture a change in position of the sensor frame or parts thereof with respect to a reference outside the holding frame. 6. The inspection system of claim 4 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 7. The inspection system of claim 4 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 8. A projection system, comprising: an optical system according to claim 1 , wherein the projection system is a lithography projection system. 9. The projection system of claim 8 , wherein the interferometer is configured to capture a change in position of the sensor frame or parts thereof with respect to a reference outside the holding frame. 10. The projection system of claim 8 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 11. The projection system of claim 8 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 12. An apparatus, comprising: an optical system according to claim 1 , wherein the apparatus is a lithography apparatus. 13. The apparatus of claim 12 , wherein the interferometer is configured to capture a change in position of the sensor frame or parts thereof with respect to a reference outside the holding frame. 14. The apparatus of claim 12 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 15. The apparatus of claim 12 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 16. The optical system of claim 1 , wherein the interferometer is configured to capture a change in position of the sensor frame or parts thereof with respect to a reference outside the holding frame. 17. The optical system of claim 16 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 18. The optical system of claim 17 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 19. The optical system of claim 1 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 20. The optical system of claim 19 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 21. The optical system of claim 1 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame.
Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system · CPC title
using magnetic means · CPC title
Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title
Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground · CPC title
Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements · CPC title
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