Optical system

US10386733B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10386733-B2
Application numberUS-201715835922-A
CountryUS
Kind codeB2
Filing dateDec 8, 2017
Priority dateJun 18, 2015
Publication dateAug 20, 2019
Grant dateAug 20, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components and methods are also provided.

First claim

Opening claim text (preview).

What is claimed is: 1. An optical system, comprising: optical elements; actuators; a holding frame holding the optical elements so that the optical elements are positionable and/or spatially orientable via the actuators; a sensor frame mechanically decoupled from the holding frame; sensors configured to capture a position and/or spatial orientation of a respective optical element relative to the sensor frame; and an interferometer comprising a measurement section along which electromagnetic radiation is sent and which extends via two reflection points on the sensor frame, wherein: the holding frame encloses a volume; the sensor frame is arranged partially or entirely within the volume; and the interferometer is configured to capture a change in position, a change in spatial orientation, and/or a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 2. The optical system of claim 1 , wherein the sensor frame comprises a plurality of arms projecting from a base body, and each of at least two of the arms comprises one of the sensors. 3. The optical system of claim 2 , wherein the base body and the projecting arms are configured in one part or in one piece. 4. An inspection system, comprising: an optical system according to claim 1 , wherein the inspection system is configured to inspect a photomask. 5. The inspection system of claim 4 , wherein the interferometer is configured to capture a change in position of the sensor frame or parts thereof with respect to a reference outside the holding frame. 6. The inspection system of claim 4 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 7. The inspection system of claim 4 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 8. A projection system, comprising: an optical system according to claim 1 , wherein the projection system is a lithography projection system. 9. The projection system of claim 8 , wherein the interferometer is configured to capture a change in position of the sensor frame or parts thereof with respect to a reference outside the holding frame. 10. The projection system of claim 8 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 11. The projection system of claim 8 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 12. An apparatus, comprising: an optical system according to claim 1 , wherein the apparatus is a lithography apparatus. 13. The apparatus of claim 12 , wherein the interferometer is configured to capture a change in position of the sensor frame or parts thereof with respect to a reference outside the holding frame. 14. The apparatus of claim 12 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 15. The apparatus of claim 12 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 16. The optical system of claim 1 , wherein the interferometer is configured to capture a change in position of the sensor frame or parts thereof with respect to a reference outside the holding frame. 17. The optical system of claim 16 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 18. The optical system of claim 17 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 19. The optical system of claim 1 , wherein the interferometer is configured to capture a change in spatial orientation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 20. The optical system of claim 19 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame. 21. The optical system of claim 1 , wherein the interferometer is configured to capture a deformation of the sensor frame or parts thereof with respect to a reference outside the holding frame.

Assignees

Inventors

Classifications

  • Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system · CPC title

  • G02B7/1828Primary

    using magnetic means · CPC title

  • Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title

  • Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground · CPC title

  • Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements · CPC title

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Frequently asked questions

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What does patent US10386733B2 cover?
The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components…
Who is the assignee on this patent?
Zeiss Carl Smt Gmbh
What technology area does this patent fall under?
Primary CPC classification G02B7/1828. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 20 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).