Optical pattern projection
US-2017322424-A1 · Nov 9, 2017 · US
US10386706B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10386706-B2 |
| Application number | US-201715706060-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 15, 2017 |
| Priority date | Sep 15, 2017 |
| Publication date | Aug 20, 2019 |
| Grant date | Aug 20, 2019 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A structured-light projector includes a diffractive optical element (DOE) that receives a collimated light and generates a plurality of light tiles. The DOE includes a plurality of optical components disposed on a substrate, wherein the optical components of the DOE are randomly arranged on the substrate.
Opening claim text (preview).
What is claimed is: 1. A structured-light projector, comprising: a diffractive optical element (DOE) that receives a collimated light and generates a plurality of light tiles, the DOE including a plurality of optical components disposed on a substrate; wherein the optical components of the DOE are randomly arranged on the substrate; and wherein arrangement of the optical components of the DOE is subjected to a correction that is inverse to optical distortion near an edge of a projected image on a far-field object, thereby compensating the distortion. 2. The structured-light projector of claim 1 , wherein the optical components are aperiodic or uncorrelated along at least one direction. 3. The structured-light projector of claim 1 , wherein the light tiles generated by the DOE are partially overlapped between adjacent light tiles. 4. The structured-light projector of claim 1 , wherein a density of the optical components disposed on an edge of the DOE is higher than other portions of the DOE. 5. A structured-light projector, comprising: a light source that emits an emitted light with a predetermined pattern; a beam limiting device that receives the emitted light and generates a collimated light; and a diffractive optical element (DOE) that receives the collimated light and generates a plurality of light tiles, the DOE including a plurality of optical components randomly disposed on a substrate; wherein arrangement of the optical components of the DOE is subjected to a correction that is inverse to optical distortion near an edge of a projected image on a far-field object, thereby compensating the distortion. 6. The structured-light projector of claim 5 , wherein the light source comprises an array of semiconductor diodes arranged according to the predetermined pattern. 7. The structured-light projector of claim 6 , wherein the semiconductor diode comprises a vertical-cavity surface-emitting laser (VCSEL) diode. 8. The structured-light projector of claim 6 , wherein the semiconductor diodes are grouped into a plurality of groups that turn on in sequence. 9. The structured-light projector of claim 8 , wherein the semiconductor diodes of different groups have different shape or size. 10. The structured-light projector of claim 5 , wherein the beam limiting device comprises a collimating lens. 11. The structured-light projector of claim 5 , wherein the light tiles generated by the DOE are partially overlapped between adjacent light tiles. 12. The structured-light projector of claim 5 , wherein a density of the optical components disposed on an edge of the DOE is higher than other portions of the DOE. 13. A structured-light projector, comprising: a point light source that emits an emitted light; a beam limiting device that receives the emitted light and generates a collimated light; a patterning device that receives the collimated light and generates a patterned light; and a diffractive optical element (DOE) that receives the patterned light and generates a plurality of light tiles, the DOE including a plurality of optical components randomly disposed on a substrate; wherein arrangement of the optical components of the DOE is subjected to a correction that is inverse to optical distortion near an edge of a projected image on a far-field object, thereby compensating the distortion. 14. The structured-light projector of claim 13 , wherein the light source comprises an edge-emitting laser diode. 15. The structured-light projector of claim 13 , wherein the light tiles generated by the DOE are partially overlapped between adjacent light tiles. 16. The structured-light projector of claim 13 , wherein a density of the optical components disposed on an edge of the DOE is higher than other portions of the DOE. 17. A structured-light projector, comprising: a point light source that emits an emitted light; a beam limiting device that receives the emitted light and generates a collimated light; a diffractive optical element (DOE) that receives the collimated light and generates a plurality of light tiles, the DOE including a plurality of optical components randomly disposed on a substrate; and a patterning device that receives the light tiles and generates patterned light tiles; wherein arrangement of the optical components of the DOE is subjected to a correction that is inverse to optical distortion near an edge of a projected image on a far-field object, thereby compensating the distortion. 18. The structured-light projector of claim 17 , wherein the patterned light tiles are partially overlapped between adjacent patterned light tiles. 19. The structured-light projector of claim 17 , wherein a density of the optical components disposed on an edge of the DOE is higher than other portions of the DOE.
in illumination systems (mask illumination systems in photolithographic systems G03F7/70158) · CPC title
LED or laser light sources · CPC title
in projection exposure systems, e.g. microlithographic systems · CPC title
Optical correction of image distortions, e.g. keystone · CPC title
Adjusting of projection optics · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.