Halogen doped phosphorus nanoparticles and manufacturing method thereof

US10384942B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10384942-B2
Application numberUS-201815865637-A
CountryUS
Kind codeB2
Filing dateJan 9, 2018
Priority dateAug 25, 2017
Publication dateAug 20, 2019
Grant dateAug 20, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Halogen-doped phosphorous nanoparticles and a manufacturing method thereof are provided. The manufacturing method includes a mixing process and a centrifugation or filtration process. The mixing process has the step of mixing a precursor with a reducing agent solution to form a mixed solution, the precursor is a halogen-based phosphide. Then, the mixed solution is centrifuged or filtrated to obtain the halogen-doped phosphorous nanoparticles.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for manufacturing halogen-doped phosphorous nanoparticles, comprising steps of: providing a precursor and a reducing agent, wherein the precursor is a halogen-based phosphide compound; mixing the precursor with the reducing agent to form a mixed solution in which the precursor is reduced by the reducing agent; and centrifuging or filtering the mixed solution to obtain a halogen-doped phosphorous nanoparticle dispersion including the halogen-doped phosphorous nanoparticles. 2. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 1 , wherein the precursor is a precursor solution, the precursor solution is formed by mixing a first solvent with the precursor, and the first solvent is a solvent which is miscible with the precursor and inactive with the precursor. 3. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 2 , wherein the first solvent is selected from the group consisting of benzene, toluene, dichlorobenzene, fluorobenzene, chlorobenzene, bromobenzene, iodobenzene, and trimethylbenzene. 4. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 1 , wherein the precursor are precursor particles, and the precursor particles are added into the reducing agent to form the mixed solution. 5. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 1 , wherein the reducing agent comprises a second solvent, the second solvent has a reducing property to the halogen-based phosphide compound, and the second solvent is selected from the group consisting of polar aprotic solvents, diols, triols, ketone solvents, carboxylic acid ester solvents. 6. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 5 , wherein the second solvent is selected from the group consisting of ethylene glycol, glycerol, acetone, butanone, pentanone, ethyl acetate, tetrahydrofuran. 7. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 6 , wherein the precursor is mixed with the reducing agent at a room temperature. 8. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 1 , wherein the reducing agent comprises a second solvent, the second solvent is selected from the group consisting of long chain carbon solvents, and oil solvents. 9. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 8 , wherein the second solvent is selected from the group consisting of N-methyl pyrrolidone, 1,3-dimethyl-2-imidazolidinone, squalane, squalene, triphenylphosphine, trioctyl phosphate, dichlorobenzene, iodobenzene, and trimethylbenzene. 10. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 9 , wherein before mixing the precursor with the reducing agent, the second solvent is preheated to a temperature between 100° C. to 250° C. 11. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 1 , wherein the reducing agent comprises a second solvent the second solvent has no reducing property to the halogen-based phosphide compound, the second solvent is selected from the group consisting of methanol, propanol and isopropanol, and wherein the reducing agent further comprises an organic reducing agent, and the organic reducing agent is selected from the group consisting of lithium borohydride solution, sodium borohydride solution, potassium borohydride solution and lithium aluminum hydride solution. 12. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 11 , wherein the precursor is mixed with the reducing agent at a room temperature. 13. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 1 , wherein the reducing agent further comprises a surfactant containing at least one lipophilic group and at least one hydrophilic group, and the surfactant is selected from the group consisting of cetyl trimethy ammonium bromide (CTAB), oleic acid, hexadecane thiol, triphenylphosphine, trioctyl phosphate, and polyvinylpyrrolidone. 14. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 1 , wherein the halogen-based phosphide compound is phosphorus halide and a formula of the phosphorus halide is PaXb, wherein P is phosphorus, X is halogen, “a” represents an integer of 1 to 2, and “b” represents an integer of 3 to 5. 15. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 14 , wherein the phosphorus halide is selected from the group consisting of phosphorus trichloride, phosphorus pentachloride, phosphorus tribrornide, phosphorus pentabromide, phosphorus triiodide, and phosphorus tetraiodide. 16. The method for manufacturing halogen-doped phosphorous nanoparticles according to claim 1 , wherein the halogen-doped phosphorous nanoparticles have a particle size within a range of 50 nm to 100 nm.

Assignees

Inventors

Classifications

  • containing halogen {(completely halogenated alkali metal phosphates C01D, e.g. lithium hexafluorophosphate C01D15/005)} · CPC title

  • Electric conductive fillers · CPC title

  • Other phosphides · CPC title

  • Nanometer sized, i.e. from 1-100 nanometer · CPC title

  • one element only · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10384942B2 cover?
Halogen-doped phosphorous nanoparticles and a manufacturing method thereof are provided. The manufacturing method includes a mixing process and a centrifugation or filtration process. The mixing process has the step of mixing a precursor with a reducing agent solution to form a mixed solution, the precursor is a halogen-based phosphide. Then, the mixed solution is centrifuged or filtrated to ob…
Who is the assignee on this patent?
Univ Nat Tsing Hua
What technology area does this patent fall under?
Primary CPC classification C01B25/003. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 20 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).