Gas sensor element
US-9933382-B2 · Apr 3, 2018 · US
US10379095B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10379095-B2 |
| Application number | US-201615360790-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 23, 2016 |
| Priority date | Nov 25, 2015 |
| Publication date | Aug 13, 2019 |
| Grant date | Aug 13, 2019 |
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Described herein are devices for detecting the concentration of acetone gas. Some gas sensor devices comprise: a gas sensor element that includes a boron-doped the polycrystalline n-type semiconductor epsilon WO3. In addition, multi-detector gas sensor elements are also described including at least one based on the aforementioned gas sensor element where the other elements differ in material properties. In addition, methods for detecting acetone gas based on the disclosed elements are also described.
Opening claim text (preview).
What is claimed is: 1. A gas sensor element comprising a first sensor comprising: a first electrode, a second electrode, and a first polycrystalline n-type semiconductor material; wherein the first electrode and the second electrode are separated by a gap of about 1 mil to about 10 mils; and wherein the first polycrystalline n-type semiconductor material comprises boron-doped WO 3 that is doped or loaded with Pt, V, Sm, CuO, or a combination thereof; and the first polycrystalline n-type semiconductor material is in physical contact with both the first electrode and the second electrode. 2. A gas sensor element of claim 1 , further comprising: a second sensor comprising: a third electrode, a fourth electrode, and a second polycrystalline n-type semiconductor material; wherein the third electrode and the fourth electrode are separated by a gap of about 1 mil to about 10 mils; wherein the second polycrystalline n-type semiconductor material comprises boron-doped WO 3 ; and wherein the second polycrystalline n-type semiconductor material is in physical contact with both the third electrode and the fourth electrode. 3. The gas sensor element of claim 2 , wherein the second polycrystalline n-type semiconductor material is further doped or loaded with a noble metal. 4. The gas sensor element of claim 3 , wherein the noble metal is palladium, gold, platinum, or a combination thereof. 5. The gas sensor element of claim 2 , wherein the second polycrystalline n-type semiconductor material is further doped or loaded with V, Sm, CuO, or a combination thereof. 6. The gas sensor element of claim 2 , wherein the second polycrystalline n-type semiconductor material is further doped with Ti, Ce, or a combination thereof. 7. The gas sensor element of claim 2 , wherein the WO 3 of the first and second polycrystalline n-type semiconductor material is epsilon-phase WO 3 . 8. The gas sensor element of claim 1 , wherein the first polycrystalline n-type semiconductor material is doped or loaded with V, Sm, or a combination thereof. 9. The gas sensor element of claim 1 , wherein the first polycrystalline n-type semiconductor material is further doped or loaded with a noble metal other than Pt. 10. The gas sensor element of claim 9 , wherein the noble metal is palladium, gold, or a combination thereof. 11. The gas sensor element of claim 1 , wherein the first polycrystalline n-type semiconductor material is further doped with Ti, Ce, or a combination thereof. 12. The gas sensor element of claim 1 , wherein the WO 3 is epsilon-phase WO 3 .
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