Thin-film transistor (tft), manufacturing method thereof, array substrate and display device
US-2018301565-A1 · Oct 18, 2018 · US
US10374074B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10374074-B2 |
| Application number | US-201615200293-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 1, 2016 |
| Priority date | Jul 2, 2015 |
| Publication date | Aug 6, 2019 |
| Grant date | Aug 6, 2019 |
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A flexible bimodal sensor includes a gate electrode; a flexible substrate; a source electrode disposed on the flexible substrate; a drain electrode disposed on the flexible substrate apart from the source electrode; a channel layer disposed on the source electrode and the drain electrode and a portion of the flexible substrate between the source electrode and the drain electrode; and a gate insulating layer comprising a plurality of protrusions, the gate insulating layer being disposed on the channel layer and arranged between the channel layer and the gate electrode. The drain electrode outputs a current signal simultaneously indicating a temperature value and a pressure value sensed by the flexible bimodal sensor.
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What is claimed is: 1. A flexible bimodal sensor comprising: a gate electrode; a flexible substrate; a source electrode disposed on the flexible substrate; a drain electrode disposed on the flexible substrate apart from the source electrode; a channel layer disposed on the source electrode and the drain electrode and a portion of the flexible substrate between the source electrode and the drain electrode; and a gate insulating layer comprising a plurality of protrusions, the gate insulating layer being disposed on the channel layer and arranged between the channel layer and the gate electrode and, wherein the drain electrode outputs a current signal simultaneously indicating a temperature value and a pressure value sensed by the flexible bimodal sensor, and the gate insulating layer comprises a base having a predetermined thickness and the plurality of protrusions extends from a first surface of the base towards the channel layer. 2. The flexible bimodal sensor of claim 1 , wherein the channel layer comprises one of silicon, an organic semiconductor, and a semiconductor oxide. 3. The flexible bimodal sensor of claim 2 , further comprising an encapsulating layer that covers the channel layer and is disposed between the channel layer and the gate insulating layer. 4. The flexible bimodal sensor of claim 3 , wherein the encapsulating layer comprises one of an organic material comprising tetratetracontane (TTC) or methylcycloheane (MCH), an inorganic oxide comprising Al 2 O 3 or HfO 2 , and a stack structure in which the organic material and the inorganic oxide are stacked. 5. The flexible bimodal sensor of claim 1 , wherein the plurality of protrusions further comprise a plurality of first protrusions formed on a second surface of the base facing the first surface of the base. 6. The flexible bimodal sensor of claim 4 , wherein the gate insulating layer comprises a first material selected from the group consisting of P(VDF_TrFE), P(VDF-TrFE-CFE), P(VDF-TrFE-CtFE), polydimethylsiloxane (PDMS), and polyurethane (PU). 7. The flexible bimodal sensor of claim 6 , wherein the gate insulating layer further comprises inorganic nano-particles distributed in the first material. 8. The flexible bimodal sensor of claim 1 , wherein the plurality of protrusions of the gate insulating layer has a pyramid shape or a truncated pyramid shape. 9. The flexible bimodal sensor of claim 1 , wherein the flexible bimodal sensor includes a plurality of bimodal sensors arranged in a matrix shape on the flexible substrate. 10. A flexible bimodal sensor comprising: a flexible substrate; a gate electrode disposed on the flexible substrate; a gate insulating layer covering the gate electrode on the flexible substrate; a channel layer disposed on the gate insulating layer; and a source electrode disposed on the channel layer; and a drain electrode disposed on the channel layer apart from the source electrode; wherein the gate insulating layer comprises a plurality of protrusions, and wherein the drain electrode outputs a current signal simultaneously indicating a temperature value and a pressure value measured by the flexible bimodal sensor, and the gate insulating layer comprises a base having a predetermined thickness and the plurality of protrusions extends from a first surface of the base towards the channel layer. 11. The flexible bimodal sensor of claim 10 , wherein the channel layer comprises silicon, an organic semiconductor, or a semiconductor oxide. 12. The flexible bimodal sensor of claim 11 , further comprising an encapsulating layer that covers the channel layer, the drain electrode, and the source electrode. 13. The flexible bimodal sensor of claim 12 , wherein the encapsulating layer comprises one an organic material comprising tetratetracontane (TTC) or methylcycloheane (MCH), an inorganic oxide comprising Al 2 O 3 or HfO 2 , and a stack structure in which the organic material and the inorganic oxide are stacked. 14. The flexible bimodal sensor of claim 10 , wherein the plurality of protrusions further comprise a plurality of protrusions on a second surface of the base facing the first surface of the base. 15. The flexible bimodal sensor of claim 13 , wherein the gate insulating layer comprises a first material selected from the group consisting of P(VDF_TrFE), P(VDF-TrFE-CFE), P(VDF-TrFE-CtFE), polydimethylsiloxane (PDMS), and polyurethane (PU). 16. The flexible bimodal sensor of claim 15 , wherein the gate insulating layer further comprises inorganic nano-particles distributed in the first material. 17. The flexible bimodal sensor of claim 10 , wherein the plurality of protrusions of the gate insulating layer has a pyramid shape or a truncated pyramid shape. 18. The flexible bimodal sensor of claim 10 , wherein the flexible bimodal sensor includes a plurality of bimodal sensors arranged in a matrix type on the flexible substrate.
from analysis of pulse wave characteristics · CPC title
in a matrix array · CPC title
Microscale sensors, e.g. electromechanical sensors [MEMS] · CPC title
Details of sensor (A61B5/02427 takes precedence) · CPC title
Pressure sensors · CPC title
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