Flexible bimodal sensor

US10374074B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10374074-B2
Application numberUS-201615200293-A
CountryUS
Kind codeB2
Filing dateJul 1, 2016
Priority dateJul 2, 2015
Publication dateAug 6, 2019
Grant dateAug 6, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A flexible bimodal sensor includes a gate electrode; a flexible substrate; a source electrode disposed on the flexible substrate; a drain electrode disposed on the flexible substrate apart from the source electrode; a channel layer disposed on the source electrode and the drain electrode and a portion of the flexible substrate between the source electrode and the drain electrode; and a gate insulating layer comprising a plurality of protrusions, the gate insulating layer being disposed on the channel layer and arranged between the channel layer and the gate electrode. The drain electrode outputs a current signal simultaneously indicating a temperature value and a pressure value sensed by the flexible bimodal sensor.

First claim

Opening claim text (preview).

What is claimed is: 1. A flexible bimodal sensor comprising: a gate electrode; a flexible substrate; a source electrode disposed on the flexible substrate; a drain electrode disposed on the flexible substrate apart from the source electrode; a channel layer disposed on the source electrode and the drain electrode and a portion of the flexible substrate between the source electrode and the drain electrode; and a gate insulating layer comprising a plurality of protrusions, the gate insulating layer being disposed on the channel layer and arranged between the channel layer and the gate electrode and, wherein the drain electrode outputs a current signal simultaneously indicating a temperature value and a pressure value sensed by the flexible bimodal sensor, and the gate insulating layer comprises a base having a predetermined thickness and the plurality of protrusions extends from a first surface of the base towards the channel layer. 2. The flexible bimodal sensor of claim 1 , wherein the channel layer comprises one of silicon, an organic semiconductor, and a semiconductor oxide. 3. The flexible bimodal sensor of claim 2 , further comprising an encapsulating layer that covers the channel layer and is disposed between the channel layer and the gate insulating layer. 4. The flexible bimodal sensor of claim 3 , wherein the encapsulating layer comprises one of an organic material comprising tetratetracontane (TTC) or methylcycloheane (MCH), an inorganic oxide comprising Al 2 O 3 or HfO 2 , and a stack structure in which the organic material and the inorganic oxide are stacked. 5. The flexible bimodal sensor of claim 1 , wherein the plurality of protrusions further comprise a plurality of first protrusions formed on a second surface of the base facing the first surface of the base. 6. The flexible bimodal sensor of claim 4 , wherein the gate insulating layer comprises a first material selected from the group consisting of P(VDF_TrFE), P(VDF-TrFE-CFE), P(VDF-TrFE-CtFE), polydimethylsiloxane (PDMS), and polyurethane (PU). 7. The flexible bimodal sensor of claim 6 , wherein the gate insulating layer further comprises inorganic nano-particles distributed in the first material. 8. The flexible bimodal sensor of claim 1 , wherein the plurality of protrusions of the gate insulating layer has a pyramid shape or a truncated pyramid shape. 9. The flexible bimodal sensor of claim 1 , wherein the flexible bimodal sensor includes a plurality of bimodal sensors arranged in a matrix shape on the flexible substrate. 10. A flexible bimodal sensor comprising: a flexible substrate; a gate electrode disposed on the flexible substrate; a gate insulating layer covering the gate electrode on the flexible substrate; a channel layer disposed on the gate insulating layer; and a source electrode disposed on the channel layer; and a drain electrode disposed on the channel layer apart from the source electrode; wherein the gate insulating layer comprises a plurality of protrusions, and wherein the drain electrode outputs a current signal simultaneously indicating a temperature value and a pressure value measured by the flexible bimodal sensor, and the gate insulating layer comprises a base having a predetermined thickness and the plurality of protrusions extends from a first surface of the base towards the channel layer. 11. The flexible bimodal sensor of claim 10 , wherein the channel layer comprises silicon, an organic semiconductor, or a semiconductor oxide. 12. The flexible bimodal sensor of claim 11 , further comprising an encapsulating layer that covers the channel layer, the drain electrode, and the source electrode. 13. The flexible bimodal sensor of claim 12 , wherein the encapsulating layer comprises one an organic material comprising tetratetracontane (TTC) or methylcycloheane (MCH), an inorganic oxide comprising Al 2 O 3 or HfO 2 , and a stack structure in which the organic material and the inorganic oxide are stacked. 14. The flexible bimodal sensor of claim 10 , wherein the plurality of protrusions further comprise a plurality of protrusions on a second surface of the base facing the first surface of the base. 15. The flexible bimodal sensor of claim 13 , wherein the gate insulating layer comprises a first material selected from the group consisting of P(VDF_TrFE), P(VDF-TrFE-CFE), P(VDF-TrFE-CtFE), polydimethylsiloxane (PDMS), and polyurethane (PU). 16. The flexible bimodal sensor of claim 15 , wherein the gate insulating layer further comprises inorganic nano-particles distributed in the first material. 17. The flexible bimodal sensor of claim 10 , wherein the plurality of protrusions of the gate insulating layer has a pyramid shape or a truncated pyramid shape. 18. The flexible bimodal sensor of claim 10 , wherein the flexible bimodal sensor includes a plurality of bimodal sensors arranged in a matrix type on the flexible substrate.

Assignees

Inventors

Classifications

  • from analysis of pulse wave characteristics · CPC title

  • in a matrix array · CPC title

  • Microscale sensors, e.g. electromechanical sensors [MEMS] · CPC title

  • Details of sensor (A61B5/02427 takes precedence) · CPC title

  • Pressure sensors · CPC title

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Frequently asked questions

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What does patent US10374074B2 cover?
A flexible bimodal sensor includes a gate electrode; a flexible substrate; a source electrode disposed on the flexible substrate; a drain electrode disposed on the flexible substrate apart from the source electrode; a channel layer disposed on the source electrode and the drain electrode and a portion of the flexible substrate between the source electrode and the drain electrode; and a gate ins…
Who is the assignee on this patent?
Samsung Electronics Co Ltd, Research & Business Found Sungkyunkwan Univ
What technology area does this patent fall under?
Primary CPC classification H01L29/78. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 06 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).