Gas sensor and sensor apparatus

US10371658B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10371658-B2
Application numberUS-201715682867-A
CountryUS
Kind codeB2
Filing dateAug 22, 2017
Priority dateMar 10, 2015
Publication dateAug 6, 2019
Grant dateAug 6, 2019

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A gas sensor includes a p-type semiconductor layer that contains copper or silver cations and contacts with detection target gas, a first electrode that is a Schottky electrode to the p-type semiconductor layer, a high-resistance layer that is provided between the p-type semiconductor layer and the first electrode such that the p-type semiconductor layer and the first electrode partly contact with each other and has resistance higher than that of each of the p-type semiconductor layer and the first electrode, and a second electrode that is an ohmic electrode to the p-type semiconductor layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A gas sensor, comprising: a p-type semiconductor layer that contains copper or silver cations and contacts with detection target gas; a first electrode that is a Schottky electrode to the p-type semiconductor layer; a high-resistance layer that is provided between the p-type semiconductor layer and the first electrode and has resistance higher than that of each of the p-type semiconductor layer and the first electrode; and a second electrode that is an ohmic electrode to the p-type semiconductor layer, wherein the high-resistance layer has intermittent defects through which the first electrode directly contacts the p-type semiconductor layer. 2. The gas sensor according to claim 1 , wherein the p-type semiconductor layer and the first electrode are coupled such that a capacitor and Schottky junction are parallel to each other. 3. The gas sensor according to claim 1 , wherein the high-resistance layer is an insulating layer. 4. The gas sensor according to claim 1 , wherein the high-resistance layer is an n-type semiconductor layer having a work function lower than those of the p-type semiconductor layer and the first electrode. 5. The gas sensor according to claim 1 , wherein, when reducing detection target gas contacts with the p-type semiconductor layer, a potential of the second electrode varies in a positive direction. 6. The gas sensor according to claim 1 , wherein the p-type semiconductor layer contains one selected from a group consisting of cuprous bromide, cuprous oxide, silver bromide and silver sulfide. 7. A sensor apparatus, comprising: the gas sensor according to claim 1 ; and a detection unit that is coupled to the gas sensor and detects a potential difference between the first electrode and the second electrode of the gas sensor. 8. The sensor apparatus according to claim 7 , wherein the detection unit is a field effect transistor. 9. A gas sensor, comprising: a p-type semiconductor layer that contains copper or silver cations and contacts with detection target gas; a first electrode that is a Schottky electrode to the p-type semiconductor layer; a high-resistance layer that is provided between the p-type semiconductor layer and the first electrode such that the p-type semiconductor layer and the first electrode partly contact with each other and has resistance higher than that of each of the p-type semiconductor layer and the first electrode; and a second electrode that is an ohmic electrode to the p-type semiconductor layer, wherein the first electrode and the second electrode contain a metal material having an ionization tendency lower than that of a metal element contained in the p-type semiconductor layer.

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Classifications

  • specially adapted for gases · CPC title

  • G01N27/12Primary

    of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid {, for detecting components in the fluid} · CPC title

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What does patent US10371658B2 cover?
A gas sensor includes a p-type semiconductor layer that contains copper or silver cations and contacts with detection target gas, a first electrode that is a Schottky electrode to the p-type semiconductor layer, a high-resistance layer that is provided between the p-type semiconductor layer and the first electrode such that the p-type semiconductor layer and the first electrode partly contact w…
Who is the assignee on this patent?
Fujitsu Ltd
What technology area does this patent fall under?
Primary CPC classification G01N27/4141. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 06 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).