Imprinting bulk amorphous alloys at room temperature

US10370752B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10370752-B2
Application numberUS-201615093536-A
CountryUS
Kind codeB2
Filing dateApr 7, 2016
Priority dateApr 8, 2015
Publication dateAug 6, 2019
Grant dateAug 6, 2019

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Abstract

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A technique is disclosed for straining an amorphous alloy at ambient temperature to plastically and homogeneously deform the amorphous alloy, such that at least an exterior surface of the deformed amorphous alloy is substantially free of shear bands. An amorphous alloy may be strained at a rate of less than about 9×10−5 s−1 or by multiple passes of cold rolling. A pattern from a die may be imprinted into the amorphous alloy when strained, and the amorphous alloy may be used as a die to plastically strain other materials.

First claim

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The invention claimed is: 1. A method comprising: straining an amorphous alloy at about 25° C. to plastically and homogeneously deform at least a portion of the amorphous alloy to form a deformed amorphous alloy, wherein at least an exterior surface of the deformed amorphous alloy is substantially free of shear bands, wherein the amorphous alloy is strained at a strain rate of less than about 9×10 −5 s −1 , wherein the amorphous alloy is strained by applying a force to the amorphous alloy to achieve a stress corresponding to between about 50% and about 95% of the yield strength of the amorphous alloy, and wherein the amorphous alloy is strained with a patterned die to form one or more cavities in the amorphous alloy. 2. The method of claim 1 , wherein the amorphous alloy is strained by uniaxial compressive loading or uniaxial cyclic loading. 3. The method of claim 1 , wherein the patterned die comprises a pattern selected from at least one of a square, rectangle, circle, diamond or wave. 4. The method of claim 1 , wherein the patterned die comprises at least one of tungsten (W), molybdenum (Mo), ruthenium (Ru), carbon (C), carbon nanotubes, carbon fiber, or graphene. 5. The method of claim 1 , wherein the amorphous alloy comprises a metallic glass with a glass transition temperature greater than about 100° C. 6. The method of claim 5 , wherein the metallic glass comprises at least one of Cu, Ni, hafnium (Hf), or zirconium (Zr). 7. The method of claim 5 , wherein the metallic glass comprises about 44.5 atomic percent (at. %) Hf, about 27 at. % Cu, about 13.5 at. % Ni, about 5 at. % Ti, and about 10 at. % Al (Hf 44.5 Cu 27 Ni 13.5 Ti 5 Al 10 ). 8. The method of claim 1 , wherein the amorphous alloy lacks a glass transition. 9. The method of claim 8 , wherein the amorphous alloy comprises at least one of iron (Fe) or aluminum (Al). 10. The method of claim 1 , further comprising plastically deforming a second material with a die of the deformed amorphous alloy, wherein the second material comprises at least one of a metal or an amorphous alloy.

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Classifications

  • Making amorphous alloys · CPC title

  • all layers being exclusively metallic {(making layered metal workpieces by pressure cladding B23K20/22; making coatings with a metallic material characterised by its composition C23C30/00)} · CPC title

  • of copper or alloys based thereon · CPC title

  • C22F1/186Primary

    of zirconium or alloys based thereon · CPC title

  • with molybdenum, tungsten, niobium, tantalum, titanium, or zirconium {or Hf} as the major constituent · CPC title

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What does patent US10370752B2 cover?
A technique is disclosed for straining an amorphous alloy at ambient temperature to plastically and homogeneously deform the amorphous alloy, such that at least an exterior surface of the deformed amorphous alloy is substantially free of shear bands. An amorphous alloy may be strained at a rate of less than about 9×10−5 s−1 or by multiple passes of cold rolling. A pattern from a die may be impr…
Who is the assignee on this patent?
Univ Iowa State Res Found Inc
What technology area does this patent fall under?
Primary CPC classification C22F1/186. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 06 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).