Advanced in-situ particle detection system for semiconductor substrate processing systems

Patent metadata

Field	Value
Publication number	US-10365216-B2
Application number	US-201715793458-A
Country	US
Kind code	B2
Filing date	Oct 25, 2017
Priority date	Dec 2, 2016
Publication date	Jul 30, 2019
Grant date	Jul 30, 2019

Abstract

An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.

First claim

The invention claimed is:

1. A factory interface, comprising:
a fan for directing air in an airflow direction;
a substrate support positioned downstream from the fan in the airflow direction;
a particle detector coupled to an inner surface of the factory interface and positioned downstream from the substrate support in the airflow direction;
a particle detector tube coupled to the particle detector and open to a location within the factory interface, the particle detector tube being a straight tube aligned in the airflow direction; and
an exhaust outlet positioned downstream from the particle detector in the airflow direction.

2. The factory interface of claim 1 , further comprising one or more load-lock slit doors, wherein the particle detector is positioned downstream from the one or more load-lock slit doors.

3. The factory interface of claim 1 , further comprising a filter, wherein the filter is positioned between the fan and the substrate support.

4. The factory interface of claim 1 , further comprising a first substrate holder and effector robot and a second substrate holder and effector robot.

5. The factory interface of claim 4 , wherein the particle detector is positioned proximate to and between the first substrate holder and effector robot and the second substrate holder and effector robot.

6. The factory interface of claim 1 , wherein the exhaust outlet comprises a baffle plate and a gas outlet.

7. The factory interface of claim 1 , further comprising a plurality of particle detector tubes, wherein each of the plurality of particle detector tubes is open to a different location within the factory interface for particle detection of the respective different location.

8. The factory interface of claim 1 , wherein the particle detector tube includes an opening along an axial length thereof.

9. The factory interface of claim 8 , wherein the opening is at an end of the particle detector tube.

10. The factory interface of claim 9 , wherein the opening is disposed at a position below the substrate support.

11. The factory interface of claim 9 , further comprising one or more load-lock doors, wherein the opening is disposed at a position adjacent to the one or more load-lock doors.

12. The factory interface of claim 9 , further comprising a factory interface door through one or more walls of the factory interface, wherein the opening is disposed at a position adjacent to the factory interface door.

13. The factory interface of claim 1 , wherein the particle detector is configured to detect a particle concentration of the air between the fan and the exhaust outlet.

14. The factory interface of claim 1 , further comprising:
a server connected to the particle detector, the server being connected to one or more sensors positioned in the factory interface and being configured to collect particle concentration data from the particle detector and the one or more sensors in the factory interface; and
a network coupled to the server, the network being configured to communicate particle concentration data and data from the one or more sensors to one or more equipment operators.

15. The factory interface of claim 14 , further comprising a second particle detector positioned downstream from a second substrate support in a second factory interface, the server being connected to the second particle detector.

16. The factory interface of claim 14 , further comprising a plurality of particle detector tubes, wherein each of the plurality of particle detector tubes is open to a different location within the factory interface for particle detection of the respective different location.

17. A factory interface, comprising:
a fan for directing air in an airflow direction;
a substrate support positioned downstream from the fan in the airflow direction;
a particle detector coupled to an inner surface of the factory interface and positioned downstream from the substrate support in the airflow direction;
a particle detector tube coupled to the particle detector and open to a location within the factory interface, the particle detector tube being a straight tube aligned in the airflow direction, the particle detector tube extending upward from an upper surface of the particle detector and towards the fan; and
an exhaust outlet positioned downstream from the particle detector in the airflow direction.

18. The factory interface of claim 17 , wherein the particle detector is disposed at a distance from the substrate support, the distance being from about 1 inch to about 24 inches.

19. The factory interface of claim 17 , wherein the particle detector tube includes one or more bends.

Assignees

• Applied Materials Inc

Inventors

• Zhang Lin
• Lu Xuesong
• Le Andrew V
• Ji Fa
• Oh Jang Seok
• Smith Patrick L
• Jafari Shawyon
• Antonio Ralph Peter

Classifications

• H10P72/3411

  involving loading and unloading of wafers · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• G01N1/2247

  Sampling from a flowing stream of gas · CPC title

• G01N15/0205

  by optical means · CPC title