Ni-plated copper or copper alloy material, connector terminal, connector and electronic component using the same

US10361501B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10361501-B2
Application numberUS-201616082622-A
CountryUS
Kind codeB2
Filing dateNov 29, 2016
Priority dateMar 9, 2016
Publication dateJul 23, 2019
Grant dateJul 23, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In the Ni-plated copper or copper alloy material having, an area ratio of a crystal having <001> plane orientation in a crystal plane parallel to a surface of a Ni plating, measured by an electron backscatter diffraction, is 15 to 35%.

First claim

Opening claim text (preview).

What is claimed is: 1. A Ni-plated copper or copper alloy material, wherein an area ratio of a crystal having <001> plane orientation in a crystal plane parallel to a surface of a Ni plating, measured by an electron backscatter diffraction, is 15 to 35%. 2. The Ni-plated copper or copper alloy material according to claim 1 , wherein the area ratio of the crystal having <001> plane orientation in the crystal plane parallel to the surface of the Ni plating is 15 to 20%. 3. The Ni-plated copper or copper alloy material according to claim 1 , wherein an ultrafine indentation hardness of the surface of the Ni plating is 4500N/mm 2 or more. 4. The Ni-plated copper or copper alloy material according to claim 3 , wherein the ultrafine indentation hardness of the surface of the Ni plating is 4800N/mm 2 or more. 5. A connector terminal comprising a contact part consisting of the Ni-plated copper or copper alloy material according to claim 1 . 6. An FFC terminal comprising a contact part consisting of the Ni-plated copper or copper alloy material according to claim 1 . 7. An FPC terminal comprising a contact part consisting of the Ni-plated copper or copper alloy material according to claim 1 . 8. An electronic component comprising an external connecting electrode consisting of the Ni-plated copper or copper alloy material according to claim 1 . 9. An electronic component comprising a mounting portion to be attached to a housing, wherein a female terminal connection portion and a board connection portion are provided respectively on one side and the other side of a mounting portion, and a push-in type terminal for fixing the board connection portion to a board by pushing the board connection portion into a through hole formed in the board, wherein the push-in type terminal consists of the Ni-plated copper or copper alloy material according to claim 1 .

Assignees

Inventors

Classifications

  • Pretreatment of metallic surfaces to be electroplated · CPC title

  • of nickel or cobalt · CPC title

  • all layers being exclusively metallic {(making layered metal workpieces by pressure cladding B23K20/22; making coatings with a metallic material characterised by its composition C23C30/00)} · CPC title

  • H01R13/03Primary

    characterised by the material, e.g. plating, or coating materials · CPC title

  • Terminals having a press fit or a compliant portion and a shank passing through a hole in the printed circuit board · CPC title

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Frequently asked questions

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What does patent US10361501B2 cover?
In the Ni-plated copper or copper alloy material having, an area ratio of a crystal having <001> plane orientation in a crystal plane parallel to a surface of a Ni plating, measured by an electron backscatter diffraction, is 15 to 35%.
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification H01R13/03. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 23 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).