Method and apparatus for metering and vaporizing a fluid

US10334879B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10334879-B2
Application numberUS-201514976053-A
CountryUS
Kind codeB2
Filing dateDec 21, 2015
Priority dateDec 21, 2015
Publication dateJul 2, 2019
Grant dateJul 2, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A vaporization device, including a fluid supply containing a vaporizable fluid; a bubble pump operative to pump fluid from the fluid supply to an outlet of the bubble pump; and a fluid vaporization heater located adjacent the outlet of the bubble pump to receive fluid from the bubble pump.

First claim

Opening claim text (preview).

The invention claimed is: 1. A vaporization device, comprising: a fluid supply containing a vaporizable fluid; a bubble pump having an inlet in flow communication with the fluid supply for receiving the vaporizable fluid therefrom, a fluid flow path, flow sequencing heaters located within the fluid flow path, and an outlet, wherein the bubble pump is operative to pump the vaporizable fluid from the fluid supply to the outlet of the bubble pump; and a planar fluid vaporization heater made of a thin film resistor material, the vaporization heater being separate from the bubble pump located adjacent to the outlet of the bubble pump, wherein the fluid supply and the bubble pump are incorporated onto a printed circuit board, the fluid vaporization heater having a heated fluid contact surface to receive the vaporizable fluid from the outlet of the bubble pump and to heat and thereby vaporize the received fluid into the atmosphere. 2. The vaporization device of claim 1 , wherein the bubble pump and the fluid vaporization heater are located on parallel planes. 3. The vaporization device of claim 1 , wherein the bubble pump and the fluid vaporization heater are located on perpendicular planes. 4. The vaporization device of claim 1 , wherein an angular position of the bubble pump relative to the fluid vaporization heater is variable. 5. The vaporization device of claim 1 , wherein the bubble pump and the fluid vaporization heater are fabricated on a common substrate. 6. The vaporization device of claim 1 , wherein the bubble pump and the fluid vaporization heater are fabricated on different substrates. 7. The vaporization device of claim 1 , wherein the fluid supply is located vertically above the bubble pump. 8. The vaporization device of claim 1 , wherein the fluid vaporization heater is incorporated onto the printed circuit board. 9. The vaporization device of claim 8 , wherein the fluid supply has an inlet located at an end of the printed circuit board opposite the fluid vaporization heater. 10. A vaporization device, comprising: a fluid supply containing a vaporizable fluid; a bubble pump operative to pump the vaporizable fluid from the fluid supply to an outlet of the bubble pump; and a planar fluid vaporization heater made of a thin film resistor material, the vaporization heater being separate from the bubble pump located adjacent to the outlet of the bubble pump to receive the vaporizable fluid from the bubble pump, wherein the fluid supply and the bubble pump are incorporated onto a printed circuit board, the fluid vaporization heater being operative to heat and thereby vaporize the received fluid into the atmosphere. 11. The vaporization device of claim 10 , wherein the bubble pump and the fluid vaporization heater are located on parallel planes. 12. The vaporization device of claim 10 , wherein the bubble pump and the fluid vaporization heater are located on perpendicular planes. 13. The vaporization device of claim 10 , wherein an angular position of the bubble pump relative to the fluid vaporization heater is variable. 14. The vaporization device of claim 10 , wherein the bubble pump and the fluid vaporization heater are fabricated on a same substrate. 15. The vaporization device of claim 10 , wherein the bubble pump and the fluid vaporization heater are fabricated on different substrates. 16. The vaporization device of claim 10 , wherein the fluid supply is located vertically above the bubble pump. 17. The vaporization device of claim 10 , wherein the fluid vaporization heater is incorporated onto the printed circuit board. 18. The vaporization device of claim 17 , wherein the fluid supply has an inlet located at an end of the printed circuit board opposite the fluid vaporization heater. 19. A method of vaporizing fluid, comprising the steps of: providing a fluid supply containing a vaporizable fluid; providing a bubble pump in fluid communication with the fluid supply and operating the bubble pump to pump the vaporizable fluid from the fluid supply to an outlet of the bubble pump; providing a planar fluid vaporization heater made of a thin film resistor material, the vaporization heater being separate from the bubble pump adjacent to the outlet of the bubble pump to receive the vaporizable fluid from the bubble pump, wherein the fluid supply and the bubble pump are incorporated onto a printed circuit board, and operating the fluid vaporization heater to heat and thereby vaporize the received fluid into the atmosphere.

Assignees

Inventors

Classifications

  • F22B1/287Primary

    with water in sprays or in films · CPC title

  • Pumping by heat expansion of pumped fluid · CPC title

  • A24F47/008Primary

    Human Necessities · mapped topic

  • Micropumps (F04B43/043 and F04B43/095 take precedence) · CPC title

  • Heating of fluids for non specified applications · CPC title

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Frequently asked questions

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What does patent US10334879B2 cover?
A vaporization device, including a fluid supply containing a vaporizable fluid; a bubble pump operative to pump fluid from the fluid supply to an outlet of the bubble pump; and a fluid vaporization heater located adjacent the outlet of the bubble pump to receive fluid from the bubble pump.
Who is the assignee on this patent?
Funai Electric Co
What technology area does this patent fall under?
Primary CPC classification F22B1/287. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jul 02 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).